Abstract: Disclosed herein are rubber compositions comprising: (a) natural rubber, polyisoprene, or a combination thereof; (b) at least one conjugated diene monomer containing polymer or polymer; (c) a first silica filler having a BET surface area of at least 220 m2/g; (d) a second silica filler having a BET surface area lower than that of the first silica filler and greater than 135 m2/g; and (e) optionally carbon black filler.

Abstract: Provided herein are organic solvent-based processes for the removal of rubber from non-Hevea plants such as TKS. By the use of the processes, solid purified rubber can be obtained that contains 0.05-0.5 weight % dirt, 0.2-1.5 weight % ash, and 0.1-4 weight % resin (when it has been dried so as to contain 0.8 weight % volatile matter).

Abstract: The present disclosure is directed to additive manufacturing cartridges having an oxygen impermeable layer and to processes for producing cured polymeric products by additive manufacturing wherein the oxygen content during additive manufacturing is limited such as by use of the cartridge and/or by use of an inert gas.

Abstract: The present disclosure is directed to actinic radiation curable polymeric mixtures, cured polymeric mixtures, tires and tire components made from the foregoing, and related processes.

Abstract: Provided herein are organic solvent-based processes for the removal of rubber from non-Hevea plants such as TKS. By the use of the processes, solid purified rubber can be obtained that contains 0.05-0.5 weight % dirt, 0.2-1.5 weight % ash, and 0.1-4 weight % resin (when it has been dried so as to contain 0.8 weight % volatile matter).

Abstract: Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder material, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a suitable pattern on to the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and suitably joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed.