Abstract: This disclosure relates generally to polymeric networks of fullerene compounds, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: This disclosure relates generally to networks of polymers in fullerene compounds and polymers, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: This disclosure relates generally to polymeric networks of fullerene compounds, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: This disclosure relates generally to polymeric networks of fullerene compounds, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: This invention provides a process for making a polyfunctional starburst-shaped fullerene derivative for use as a matrix-reinforcing agent for mesoporous and other porous materials. This invention can include the formation of a highly soluble example of such a derivative from a fullerene and a bifunctional coupling agent. A solution of said agent can be delivered to the surface of a porous solid during, or after, the solids formation. Porous films and bodies containing such a matrix-reinforcing agent can exhibit improved mechanical properties, and can be produced using equipment and techniques common and available to those skilled in the art of porous materials preparations.

Abstract: This invention provides a process for making a polyfunctional starburst-shaped fullerene derivative for use as a matrix-reinforcing agent for mesoporous and other porous materials. This invention can include the formation of a highly soluble example of such a derivative from a fullerene and a bifunctional coupling agent. A solution of said matrix-reinforcing agent can be prepared and then applied to a material while the material is still in a process of formation, or the agent can be applied to an already formed solid material. Porous films and bodies containing such a matrix-reinforcing agent can exhibit improved mechanical properties, and can be produced using equipment and techniques common and available to those skilled in the art of porous materials preparations.

Abstract: This disclosure relates generally to polymeric networks of fullerene compounds, to methods of preparing precursors for such networks, and to their subsequent use as low dielectric constant materials in microelectronic devices.

Abstract: This invention provides a process for making an insulation layer for use in microelectronic devices, whereby capacitive coupling and propagation delay in the microelectronic devices are reduced. This invention can include the formation of a stable solution of nanometer-scale particles consisting of an inorganic core 10 that is decorated with a known number of fullerene molecules 20, and including a soluble component that can act to bind the particles together into an integral structure. This solution can be applied to a microelectronic substrate, and dried to form a continuous, porous layer. Porous layers formed by the process of this invention possess a very low dielectric constant, and can be produced using equipment and techniques common and available to those skilled in the art of microelectronic fabrication.