Patents by Inventor Michael Ru

Michael Ru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8697334
    Abstract: An encoded microparticle having a spatial code is provided; and a set of encoded microparticles possessing subsets each provided with a distinguishable spatial code, wherein the codes comply with a pre-determined coding scheme. Presented are also methods of using the encoded microparticles in various biological assays, such as various multiplex assays and visualizing them by creating a digital image of the encoded microparticles and determining whether false positives are present. Further are provided methods of manufacture of the encoded microparticles which employ ferromagnetic nanoparticles applied using spin-on-glass techniques.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: April 15, 2014
    Assignee: Affymetrix, Inc.
    Inventors: Randall J. True, Martin J. Goldberg, Michael Ru, Michael P. Mittmann
  • Publication number: 20120196381
    Abstract: An encoded microparticle having a spatial code is provided; and a set of encoded microparticles possessing subsets each provided with a distinguishable spatial code, wherein the codes comply with a pre-determined coding scheme. Presented are also methods of using the encoded microparticles in various biological assays, such as various multiplex assays and visualizing them by creating a digital image of the encoded microparticles and determining whether false positives are present. Further are provided methods of manufacture of the encoded microparticles which employ ferromagnetic nanoparticles applied using spin-on-glass techniques.
    Type: Application
    Filed: December 23, 2011
    Publication date: August 2, 2012
    Applicant: Affymetrix, Inc.
    Inventors: Randall J. True, Martin J. Goldberg, Michael Ru, Michael P. Mittmann
  • Publication number: 20070228002
    Abstract: First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second radicals combine to form a polymer layer on the layer in the center of the space, and substantially simultaneously, another portion of thee first radicals remove the underlying layer near the base of the photoresists. The first radicals may be fluorine-rich and the second radicals may be carbon-rich.
    Type: Application
    Filed: March 31, 2006
    Publication date: October 4, 2007
    Inventors: Qiquan Geng, Jeff Xu, Everett Lee, Michael Ru, Hsu-en Yang, Chung Hui