Patents by Inventor Michael Satterfield

Michael Satterfield has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phosphoric acid treatment of carbonaceous material prior to activation
    Patent number: 9108186
    Abstract: A method of producing an activated carbon, comprising selecting a raw material for direct-activation, applying a solution of at least 50% phosphoric acid by weight at a ratio of from 0.01 pounds to 0.3 pounds of phosphoric acid solution per pound to the raw material selected for direct activation to produce a phosphoric acid treated raw material, and direct-activating the phosphoric acid treated raw material via a gas activation process to produce an activated carbon.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: August 18, 2015
    Assignee: Cabot Corporation
    Inventor: John Michael Satterfield
  • PHOSPHORIC ACID TREATMENT OF CARBONACEOUS MATERIAL PRIOR TO ACTIVATION
    Publication number: 20140208945
    Abstract: A method of producing an activated carbon, comprising selecting a raw material for direct-activation, applying a solution of at least 50% phosphoric acid by weight at a ratio of from 0.01 pounds to 0.3 pounds of phosphoric acid solution per pound to the raw material selected for direct activation to produce a phosphoric acid treated raw material, and direct-activating the phosphoric acid treated raw material via a gas activation process to produce an activated carbon.
    Type: Application
    Filed: March 8, 2013
    Publication date: July 31, 2014
    Applicant: CABOT CORPORATION
    Inventor: John Michael Satterfield
  • Purge process conducted in the presence of a purge plasma
    Publication number: 20060172545
    Abstract: The present invention provides, in one embodiment, a method for reducing defects associated with a plasma deposition or etching process. In this particular embodiment, the method includes creating a plasma in a deposition or etching chamber (140) and purging undesirable species from the deposition or etching chamber (150) in the presence of the plasma.
    Type: Application
    Filed: February 2, 2005
    Publication date: August 3, 2006
    Applicant: Texas Instruments, Inc.
    Inventors: Kenneth Hewes, Mark Odom, Michael Satterfield, Sirisha Kuchimanchi, Sean Collins, Zaid Nahas