Abstract: Crosslinked polyether siloxane block copolymers are obtained by reacting an alpha-omega hydrogen siloxane with at least one higher-order hydrogen siloxane and at least one polyether in the presence of a hydrosilylation catalyst. These are described, and also use thereof as additives for producing polyurethane foams, particularly mechanically foamed polyurethane foams.

Abstract: The present application relates to a device for imaging and processing a sample using a focused particle beam, comprising: (a) at least one particle source which is configured to create a particle beam in an ultrahigh vacuum environment; (b) at least one sample chamber which serves to accommodate the sample and which is configured to image the sample in a high vacuum environment and process the sample in a medium vacuum environment; (c) at least one column which is arranged in a high vacuum environment and which has at least one particle-optical component configured to shape a focused particle beam from the particle beam and direct said focused particle beam at the sample; (d) at least one detection unit which is arranged within the at least one column and which is configured to detect particles emanating from the sample; (e) at least one gas line system which terminates at the outlet of the focused particle beam from the column and which is configured to locally provide at least one process gas at the sample

Abstract: An example mounting system includes an anchor and a support. The anchor has an anchor main body and a first magnet. The anchor main body has a first end, a first surface, a second surface, and defines a projection. The projection extends from the first surface of the anchor main body and away from the second surface of the anchor main body. The support is releasably attachable to the anchor. The support has a support main body and a first magnet. The support main body has a first end, a first surface, a second surface, and defines a notch. The notch extends from the first surface of the support main body toward the second surface of the support main body. The projection of the anchor is disposed within the notch of the support when the support is releasably attached to the anchor.

Abstract: A device for producing plastic containers (10) by means of a molding, filling and sealing process is disclosed, at least consisting of a molding device (16) having individual molding tools (18), which can be moved repeatedly relative to one another from an open receiving position into a molding sealing position, and an extrusion unit (12), which can be used to insert at least one extruded plastic hose (14) into the open receiving position of the molding tools (18), which is characterized in that a traversing unit (20) can be used to move the extrusion unit (12) in conjunction with each extruded plastic hose (14) in opposite directions with respect to the molding device (16), which is stationary in every position of the molding tools (18).

Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

Abstract: Impact tools are described herein. An example of an impact tool includes a first elongate member and an impact member. The impact member is attached to the first elongate member and has a first end, a second end, a length that extends from the first end to the second end, a first side, a second side, and a plurality of projections disposed on the second side. Each projection of the plurality of projections has a first end attached to the impact member and a second end. The plurality of projections are configured on the impact member such that at least two projections of the plurality of projections intersect a first hypothetical plane disposed between the impact member second end and the second end of each projection of the plurality of projections.

Abstract: An illuminated address number assembly. The illuminated address number assembly includes a housing having a light source therein and fasteners disposed on an outer surface thereof, wherein the fastener secures the housing to an object, such as a mailbox or fence post. The housing further includes one or more cutouts disposed on opposing lateral sides of the housing wherein the cutouts take the shape of letters and/or numbers. The cutouts allow the light source to shine through, such that the cutouts are illuminated. The light source is operably connected to a power source, such as a solar panel or a battery, or hardwired electrical circuit. A wireless transceiver is disposed within the housing and operably connected to the light source, such that the light source can be selectively actuated via wireless communication. The device may further include a wall mounted switch, such that a user can manually actuate the lights.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: An illuminated address number assembly. The illuminated address number assembly includes a housing having a light source therein and fasteners disposed on an outer surface thereof, wherein the fastener secures the housing to an object, such as a mailbox or fence post. The housing further includes one or more cutouts disposed on opposing lateral sides of the housing wherein the cutouts take the shape of letters and/or numbers. The cutouts allow the light source to shine through, such that the cutouts are illuminated. The light source is operably connected to a power source, such as a solar panel or a battery, or hardwired electrical circuit. A wireless transceiver is disposed within the housing and operably connected to the light source, such that the light source can be selectively actuated via wireless communication. The device may further include a wall mounted switch, such that a user can manually actuate the lights.

Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Abstract: A device (DV) for damping pressure fluctuations in a pressure medium (DM) comprises the following features. It has a base body (GK) in which an intake chamber (AK11) is provided, which has an intake-chamber opening (OA1) which is located at a first side (S1) of the base body. A first expansion chamber (EK11) is furthermore provided in the base body, which has a first expansion-chamber opening (OE1), which is likewise located at the first side of the base body. A partition wall (T1) separates the intake chamber from the first expansion chamber. A cover element (AD) for positioning on a contact surface (AF) of the first side of the base body is furthermore provided in order to close the intake chamber and the first expansion chamber to the outside.

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Abstract: A pneumatic element including: a first, a second, and a third air chamber which are coupled to one another, the first air chamber being coupled to the second air chamber by a weld joint and the second air chamber being coupled to the third air chamber by another weld joint; and an overflow area, which is arranged within the weld joints along a longitudinal axis of the pneumatic element, for a pneumatic communication between the air chambers. Each of the air chambers has a first state in which a pressure inside the air chambers corresponds to a pressure outside of the air chambers and a second state in which the pressure inside the air chambers is greater than the pressure outside of the air chambers. Furthermore, a flow opening is provided for a pneumatic communication between the overflow region and the second air chamber in the first state.

Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.

Abstract: The system described herein relates to a high-voltage supply unit for providing an output voltage for a particle beam apparatus, wherein the particle beam apparatus is embodied as, for example, an electron beam apparatus and/or an ion beam apparatus. The system described herein is based on the fact that it was recognized that a bipolar voltage supply unit can be formed by means of a unipolar first current source and a unipolar second current source, said bipolar voltage supply unit enabling a load current in two directions. The high-voltage supply unit according to the system described herein can be operated in the 4-quadrant operation. In the 4-quadrant operation, a first voltage source for supplying the first current source and a second voltage source for supplying the second current source are embodied as different voltage sources.

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.