Patents by Inventor Michael Steigerwald
Michael Steigerwald has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240155228Abstract: A vehicular vision system includes an electronic control unit (ECU) disposed at a vehicle and a camera having a CMOS imaging sensor operable to capture image data. Image data captured by the camera is conveyed from the camera to the ECU via a 50 ohm coaxial cable. The camera is in bidirectional communication with the ECU over the 50 ohm coaxial cable. The 50 ohm coaxial cable commonly carries (i) image data captured by the camera for processing at a data processor of the ECU and (ii) power from a DC power supply of the ECU to the camera. Image data captured by the camera is serialized at a data serializer of the camera and is conveyed to the ECU via the 50 ohm coaxial cable and is deserialized at the ECU by a data deserializer of the ECU.Type: ApplicationFiled: January 12, 2024Publication date: May 9, 2024Inventors: Joern Ihlenburg, Jens Steigerwald, Michael Dominik Schöppner
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Publication number: 20240153737Abstract: A system and method of a tilt-column electron beam imaging system is disclosed. The system may include an imaging sub-system. The imaging sub-system may include a plurality of electron beam sources configured to generate a plurality of beamlets. The imaging sub-system may further include a plurality of tilt-illumination columns, where a respective tilt-illumination column is configured to receive a respective beamlet from a respective electron beam source. For the system and method, a first tilt axis of a first tilt-illumination column may be orientated along a first angle and at least one additional tilt axis of at least one additional tilt-illumination column may be orientated along at least one additional angle different from the first angle, where each of the plurality of beam lets pass through a first common crossover volume.Type: ApplicationFiled: November 4, 2022Publication date: May 9, 2024Inventors: Xinrong Jiang, Youfei Jiang, Ralph Nyffenegger, Michael Steigerwald
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Publication number: 20240096586Abstract: A multi-electron beam system that forms hundreds of beamlets can focus the beamlets, reduce Coulomb interaction effects, and improve resolutions of the beamlets. A Wien filter with electrostatic and magnetic deflection fields can separate the secondary electron beams from the 5 primary electron beams and can correct the astigmatism and source energy dispersion blurs for all the beamlets simultaneously.Type: ApplicationFiled: May 31, 2022Publication date: March 21, 2024Inventors: Xinrong JIANG, Christopher SEARS, Youfei JIANG, Sameet K. SHRIYAN, Jeong Ho LEE, Michael STEIGERWALD, Ralph NYFFENEGGER
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Publication number: 20230395349Abstract: An electron-beam device includes a laser and a photocathode film. The photocathode film has a front side and a back side and emits a plurality of electron beamlets when illuminated from the back side using the laser. The electron-beam device also includes electrodes to extract the plurality of electron beamlets from the front side of the photocathode film and to control shapes of the plurality of electron beamlets.Type: ApplicationFiled: June 1, 2022Publication date: December 7, 2023Inventors: Xinrong Jiang, Youfei Jiang, Michael Steigerwald, Ralph Nyffenegger
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Patent number: 11749495Abstract: Methods and systems for detecting charged particles from a specimen are provided. One system includes a first repelling mesh configured to repel charged particles from a specimen having an energy lower than a first predetermined energy and a second repelling mesh configured to repel the charged particles that pass through the first repelling mesh and have an energy that is lower than a second predetermined energy. The system also includes a first attracting mesh configured to attract the charged particles that pass through the first repelling mesh, are repelled by the second repelling mesh, and have an energy that is higher than the first predetermined energy and lower than the second predetermined energy. The system further includes a first detector configured to generate output responsive to the charged particles that pass through the first attracting mesh.Type: GrantFiled: October 5, 2021Date of Patent: September 5, 2023Assignee: KLA Corp.Inventors: Youfei Jiang, Michael Steigerwald
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Publication number: 20230245933Abstract: The dual focused ion beam and scanning electron beam system includes an electron source that generates an electron beam and an ion source that generates an ion beam. The electron beam column directs an electron beam at a normal angle relative to a top surface of the stage. An ion beam column directs the ion beam at the stage. The ion beam is at an angle relative to the electron beam. A detector receives the electron beam reflected from the wafer on the stage.Type: ApplicationFiled: February 2, 2022Publication date: August 3, 2023Inventors: Youfei JIANG, Michael STEIGERWALD, Christopher SEARS
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Publication number: 20230104558Abstract: Methods and systems for detecting charged particles from a specimen are provided. One system includes a first repelling mesh configured to repel charged particles from a specimen having an energy lower than a first predetermined energy and a second repelling mesh configured to repel the charged particles that pass through the first repelling mesh and have an energy that is lower than a second predetermined energy. The system also includes a first attracting mesh configured to attract the charged particles that pass through the first repelling mesh, are repelled by the second repelling mesh, and have an energy that is higher than the first predetermined energy and lower than the second predetermined energy. The system further includes a first detector configured to generate output responsive to the charged particles that pass through the first attracting mesh.Type: ApplicationFiled: October 5, 2021Publication date: April 6, 2023Inventors: Youfei Jiang, Michael Steigerwald
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Publication number: 20210002536Abstract: Ionic superatomic materials that can be solution-processed into completely amorphous and homogeneous thin films are disclosed herein. The amorphous materials disclosed herein have tunable compositions and have electrical conductivities of up to 300 siemens per meter, thermal conductivities of 0.05 watt per meter per degree Kelvin, and optical transparencies of up to 92%. Application of these thin-films are also provided herein.Type: ApplicationFiled: June 30, 2020Publication date: January 7, 2021Applicants: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK, CARNEGIE MELLON UNIVERSITYInventors: Colin Nuckolls, Jingjing Yang, Alexander D. Christodoulides, Boyuan Zhang, Qizhi Xu, Amirali Zangiabadi, Christine McGinn, Samuel Peurifoy, Lingyun Dai, Elena Meirzadeh, Michael Steigerwald, Xavier Roy, Ioannis Kymissis, Jonathan A. Malen
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Patent number: 8816303Abstract: A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.Type: GrantFiled: June 20, 2011Date of Patent: August 26, 2014Assignee: Carl Zeiss Microscopy GmbHInventors: Josef Biberger, Ralph Pulwey, Jaroslaw Paluszynski, Dietmar Doenitz, Hans Mathèe, Michael Steigerwald
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Patent number: 8304750Abstract: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size f at the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least d in the first direction, and a ratio d/f being 2 or more.Type: GrantFiled: December 12, 2008Date of Patent: November 6, 2012Assignee: Carl Zeiss NTS GmbHInventors: Dirk Preikszas, Michael Steigerwald, Joerg Ackermann
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Patent number: 8283641Abstract: A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side.Type: GrantFiled: May 14, 2009Date of Patent: October 9, 2012Assignee: Carl Zeiss NTS GmbHInventors: Dietmar Dönitz, Dirk Preixszas, Michael Steigerwald
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Publication number: 20120145895Abstract: A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.Type: ApplicationFiled: June 20, 2011Publication date: June 14, 2012Applicant: CARL ZEISS NTS GMBHInventors: Josef BIBERGER, Ralph Pulwey, Jaroslaw Paluszynski, Dietmar Doenitz, Hans Mathèe, Michael Steigerwald
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Patent number: 8063364Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: GrantFiled: December 22, 2009Date of Patent: November 22, 2011Assignee: Carl Zeiss NTS GmbHInventors: Dirk Preikszas, Michael Steigerwald, Daniel Tobias, Andreas Eisele, Momme Mommsen, Dietmar Doenitz, Christian Hendrich
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Publication number: 20100294930Abstract: Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size fat the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least din the first direction, and a ratio d/f being 2 or more.Type: ApplicationFiled: December 12, 2008Publication date: November 25, 2010Applicant: CARL ZEISS NTS GMBHInventors: Dirk Preikszas, Michael Steigerwald, Joerg Ackermann
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Publication number: 20100155597Abstract: A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface.Type: ApplicationFiled: December 22, 2009Publication date: June 24, 2010Applicant: CARL ZEISS NTS GMBHInventors: Dirk PREIKSZAS, Michael STEIGERWALD, Daniel TOBIAS, Andreas EISELE, Momme MOMMSEN, Dietmar DOENITZ, Christian HENDRICH
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Publication number: 20100044566Abstract: A positioning device and a particle beam apparatus including a positioning device ensure reliable positioning of a holder for holding an object at any working distance. The positioning device includes a positionable holder for holding the object. A light source generates a light beam which is guided in the direction of the positionable holder. A detector detects the light beam. An injection area injects particles of a particle beam such that they are guided in the direction of the positionable holder. The light beam passes the injection area. The injection area has an output side for the light beam and the particle beam, which is directed toward the holder. The detector includes a detector element situated in an area between the output side and the holder. The light source includes a light source element situated in an area which extends away from the holder, starting from the output side.Type: ApplicationFiled: May 14, 2009Publication date: February 25, 2010Inventors: Dietmar DONITZ, Dirk PREIKSZAS, Michael STEIGERWALD
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Patent number: 7518122Abstract: Ion sources, systems and methods are disclosed.Type: GrantFiled: November 15, 2006Date of Patent: April 14, 2009Assignee: ALIS CorporationInventors: Billy W. Ward, John A. Notte, IV, Louis S. Farkas, III, Randall G. Percival, Raymond Hill, Ulrich Mantz, Michael Steigerwald
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Publication number: 20070187621Abstract: Ion sources, systems and methods are disclosed.Type: ApplicationFiled: November 15, 2006Publication date: August 16, 2007Inventors: Billy Ward, John Notte, Louis Farkas, Randall Percival, Raymond Hill, Ulrich Mantz, Michael Steigerwald
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Publication number: 20070120071Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.Type: ApplicationFiled: November 8, 2006Publication date: May 31, 2007Inventors: Michael Steigerwald, Dirk Preikszas, Volker Drexel
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Patent number: 7022987Abstract: There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one particle beam passing the beam splitter. The beam splitter is, in first order, free of dispersion, astigmatism and distortion.Type: GrantFiled: August 6, 2003Date of Patent: April 4, 2006Assignee: Carl Zeiss NIS GmbHInventors: Dirk Preikszas, Michael Steigerwald