Patents by Inventor Michael Switkes

Michael Switkes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9316593
    Abstract: A detection system includes a retroreflector and a layer of material over the retroreflector, the material being subject to change in transmission with respect to an optical property of radiation, e.g. wavelength or polarization, with exposure to a phenomenon. The retroreflector and layer are illuminated from a radiation source of multiple aspects of the optical property. A sensor senses radiation retroreflected back through the layer. The retroreflector may, for example, be an array of or individual prisms or an array of or individual cat's eye microspheres. The layer of material above the retroreflector can include a colorimetric dye. In an embodiment, the retroreflector and layer are on the surface of a carrier that moves through a medium, e.g. a projectile or vehicle moving through the air. In a method of detecting a phenomenon, retroreflective elements are distributed in an array, as in the atmosphere or across a region of ground.
    Type: Grant
    Filed: November 16, 2011
    Date of Patent: April 19, 2016
    Assignee: Massachusetts Institutes of Technology
    Inventors: Michael Switkes, Mordechai Rothschild
  • Publication number: 20120140224
    Abstract: A detection system includes a retroreflector and a layer of material over the retroreflector, the material being subject to change in transmission with respect to an optical property of radiation, e.g. wavelength or polarization, with exposure to a phenomenon. The retroreflector and layer are illuminated from a radiation source of multiple aspects of the optical property. A sensor senses radiation retroreflected back through the layer. The retroreflector may, for example, be an array of or individual prisms or an array of or individual cat's eye microspheres. The layer of material above the retroreflector can include a colorimetric dye. In an embodiment, the retroreflector and layer are on the surface of a carrier that moves through a medium, e.g. a projectile or vehicle moving through the air. In a method of detecting a phenomenon, retroreflective elements are distributed in an array, as in the atmosphere or across a region of ground.
    Type: Application
    Filed: November 16, 2011
    Publication date: June 7, 2012
    Inventors: Michael Switkes, Mordechai Rothschild
  • Publication number: 20050164522
    Abstract: In part, the present invention is directed towards a fluid composition, and systems and methods of making and using the same, wherein the fluid composition has an absorbance of less than about 2 cm?1.
    Type: Application
    Filed: March 24, 2003
    Publication date: July 28, 2005
    Inventors: Roderick Kunz, Michael Switkes, Roger Sinta
  • Patent number: 6641268
    Abstract: An interference projection system for use with lithography using quasi-coherent sources, which has a non-diffractive beam splitting module and a non-diffractive module to cause interference of two or more beams, the modules combining to form interfering beams having the same orientation on a target surface. Two etalons are used to split a beam, to form two beams of the same orientation, strength and polarization. One or more pairs of mirrors cause the beam to interfere.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: November 4, 2003
    Assignee: Massachusetts Institute of Technology
    Inventors: Theodore M. Bloomstein, Michael Switkes, Mordechai Rothschild
  • Publication number: 20020163629
    Abstract: A perfluoropolyether (PFPE) index matching medium. The medium may be used with electromagnetic radiation having a wavelength below 220 nm. The medium may be used between two optical surfaces or between an optical surface and an object. The medium may be used as an immersion fluid in an immersion lithographic system.
    Type: Application
    Filed: May 7, 2002
    Publication date: November 7, 2002
    Inventors: Michael Switkes, Mordechai Rothschild
  • Publication number: 20020149751
    Abstract: An interference projection system for use with lithography using quasi-coherent sources, which has a non-diffractive beam splitting module and a non-diffractive module to cause interference of two or more beams, the modules combining to form interfering beams having the same orientation on a target surface. Two etalons are used to split a beam, to form two beams of the same orientation, strength and polarization. One or more pairs of mirrors cause the beam to interfere.
    Type: Application
    Filed: November 26, 2001
    Publication date: October 17, 2002
    Inventors: Theodore M. Bloomstein, Michael Switkes, Mordechai Rothschild