Patents by Inventor Michael Veith

Michael Veith has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040136057
    Abstract: The invention relates to an illuminating device (1), preferably for a microscope, particularly for a UV microscope (2), comprising a light source (3) and a reflecting filter system (4, 14). The beam of light from the light source (3) passes through a number of reflections in the reflecting filter system (4, 14). In order to minimize the spatial dimensions of the inventive illuminating device (1), the entering beam (11) of the reflecting filter system (4, 14) has an optical beam offset (13) and/or a different direction with regard to the exit beam (12) of said filter system.
    Type: Application
    Filed: October 21, 2003
    Publication date: July 15, 2004
    Inventors: Michael Veith, Lambert Danner
  • Patent number: 6713746
    Abstract: An arrangement for illuminating a specimen field in an optical instrument for specimen viewing includes: an illumination device, arranged in a housing, including a light source and an illuminating optical system, where a position of the light source or illuminating optical system is adjustable within the illumination device; a setting device including at least one drive system and configured to positionally adjust the light source or illuminating optical system; at least one linkage member connected to the light source or illuminating optical system, where the linkage member includes a coupling member accessible by the setting device from outside the housing; at least one measurement device configured to sense parameters of the light generated by the illumination device; and a control device that is configured to generate positioning commands for positional adjustment of the light source or illuminating optical system by the drive system as a function of the sensed parameters.
    Type: Grant
    Filed: July 12, 2002
    Date of Patent: March 30, 2004
    Assignee: Leica Microsystems Jena GmbH
    Inventors: Michael Veith, Uwe Graf, Joachim Wienecke
  • Patent number: 6633375
    Abstract: A method and an apparatus are described for the optical examination of structured surfaces of objects, especially of wafers and/or masks. The optical apparatus has an observation beam path (6) whose central axis (42) is directed vertically against the surface of the object (16), an illumination beam (2) whose central ray (40) falls vertically on the surface of the object, and an illumination beam (3) whose central ray (41) falls obliquely onto the surface of the object (16). In the observation beam path (6) the image of the surface of the object (6) is observed and/or detected. In the observation beam path (6) a filter device (38) and/or detector device (18) is disposed. The optical system has an illumination device (39) for the simultaneous production of a dark field illumination, a device for the coding (11) of the illumination beams (2, 3) being associated with the bright field (2) and/or the dark field illumination beam (3).
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: October 14, 2003
    Assignee: Leica Microsystems Semiconductor GmbH
    Inventors: Michael Veith, Volker Knorz, Edgar Maehringer-Kunz
  • Patent number: 6624930
    Abstract: An illumination device for a DUV microscope has an illumination beam path, proceeding from a DUV light source in which are arranged a condenser and a reflection filter system which generates a DUV wavelength band and comprises four reflection filters. At these, the illumination beam is reflected in each case at the same reflection angle &agr;, the illumination beam path extending coaxially in front of and behind the reflection filter system. According to the present invention, the reflection angle &agr;=30° and the DUV wavelength band &lgr;DUV+&Dgr;&lgr; has a half-value width of max. 20 nm and a peak with a maximum value S of more than 90% of the incoming light intensity. The resulting very narrow half-value width of the DUV wavelength band makes it possible for the DUV objectives of the DUV microscope to be very well-corrected.
    Type: Grant
    Filed: June 8, 2000
    Date of Patent: September 23, 2003
    Assignee: Leica Microsystems Wetzlar GmbH
    Inventors: Lambert Danner, Frank Eisenkrämer, Michael Veith, Wolfgang Vollrath, Martin Osterfeld
  • Publication number: 20030147134
    Abstract: An autofocus module for a microscope-based system includes at least two light sources, each of which generates a light beam for focusing. An optical directing device is provided that directs a respective portion of each light beam onto an incoupling means, which couples each of the light beams into the illuminating light beam of the microscope-based system and directs the light beams onto a specimen. A first and a second detector receive the light beams of the first and second light source reflected from the surface of the specimen, and ascertain the intensities on the first and second detector in time-multiplexed fashion.
    Type: Application
    Filed: January 31, 2003
    Publication date: August 7, 2003
    Applicant: Leica Microsystems Semiconductor GmbH
    Inventors: Franz Cemic, Lambert Danner, Robert Mainberger, Michael Veith, Martin Osterfeld, Uwe Graf
  • Publication number: 20030144553
    Abstract: The catalyst can be prepared by reduction of a precursor of a hydrogenation-active metal, which may be present on an oxidic support, by reaction with at least one compound of the formula (I)
    Type: Application
    Filed: January 2, 2003
    Publication date: July 31, 2003
    Inventors: Dominic Vanoppen, Michael Veith, Kroum Valtchev
  • Publication number: 20030015643
    Abstract: According to the present invention, an arrangement for illuminating a specimen field in an optical instrument (40) comprises an illumination device (41) having a light source (42) and an illuminating optical system (43), at least the position of the light source (42) being adjustable; a setting device (44) having at least one motorized drive system (45, 46) for automatic positional adjustment of the light source (42) and/or the illuminating optical system (43); at least one measurement device (55) for sensing parameters of the light generated by the illumination device (41); and a control device (56) that, from a comparison of the measured parameters with predefined reference parameters, generates positioning commands for the motorized drive systems (45, 46) for positional adjustment of the light source (42) and/or the illuminating optical system (43). A corresponding method is also described.
    Type: Application
    Filed: July 12, 2002
    Publication date: January 23, 2003
    Applicant: LEICA MICROSYSTEMS JENA GmbH
    Inventors: Michael Veith, Uwe Graf, Joachim Wienecke
  • Publication number: 20030011882
    Abstract: The invention refers to a setting module for an illumination apparatus (2) of an optical instrument (1), in particular of a microscope, in which the illumination apparatus (2) comprises a light source (4), an illuminating optical system, and positioning elements (7, 8, 9, 16) with which the position of the light source (4) and/or of the illuminating optical system within the illumination apparatus (2) can be modified. The setting module (17) comprises a module housing (18) having at least one drive device (19, 20, 21, 22) and coupling members (27, 28, 29, 30) for the transfer of a drive motion to the positioning elements (7, 8, 9, 16).
    Type: Application
    Filed: July 11, 2002
    Publication date: January 16, 2003
    Applicant: LEICA MICROSYSTEMS JENA GmbH
    Inventors: Michael Veith, Uwe Graf, Joachim Wienecke
  • Patent number: 6187390
    Abstract: The invention concerns the use of hydride-containing aluminium oxide for producing optically detectable markings and inscriptions.
    Type: Grant
    Filed: June 16, 1999
    Date of Patent: February 13, 2001
    Assignee: BASF Aktiengesellschaft
    Inventors: Oliver Seeger, Stefan Faber, Michael Veith, Eckehard Fritscher, Wilma M. Dausch, Raimund Schmid