Patents by Inventor Michael W. Quillen

Michael W. Quillen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning processes through the use of solvents and systems
    Patent number: 8021490
    Abstract: A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters combined with particular co-solvents. The cleaning method may be utilized in a variety of cleaning processes or process steps and offers economic and performance advantages.
    Type: Grant
    Filed: January 4, 2007
    Date of Patent: September 20, 2011
    Assignee: Eastman Chemical Company
    Inventors: Michael W. Quillen, L Palmer Holbrook, John Cleaon Moore
  • Substrate cleaning processes through the use of solvents and systems
    Publication number: 20080163893
    Abstract: A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters combined with particular co-solvents. The cleaning method may be utilized in a variety of cleaning processes or process steps and offers economic and performance advantages.
    Type: Application
    Filed: January 4, 2007
    Publication date: July 10, 2008
    Inventors: Michael W. Quillen, L. Palmer Holbrook, John Cleaon Moore