Patents by Inventor Michel Dubois
Michel Dubois has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7931829Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: GrantFiled: August 17, 2010Date of Patent: April 26, 2011Assignee: International Business Machines CorporationInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Patent number: 7927664Abstract: The present invention relates to a method for using compositions comprising poly-oxycarbosilane in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer and a pore generator.Type: GrantFiled: August 28, 2006Date of Patent: April 19, 2011Assignee: International Business Machines CorporationInventors: Richard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
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Patent number: 7919225Abstract: A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.Type: GrantFiled: May 23, 2008Date of Patent: April 5, 2011Assignee: International Business Machines CorporationInventors: Robert D. Allen, Phillip Joe Brock, Blake W. Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Sampath Purushothaman, Ratnam Sooriyakumaran
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Publication number: 20100311895Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: ApplicationFiled: August 17, 2010Publication date: December 9, 2010Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Patent number: 7820242Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: GrantFiled: March 24, 2008Date of Patent: October 26, 2010Assignee: International Business Machines CorporationInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Publication number: 20100055307Abstract: A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.Type: ApplicationFiled: December 18, 2008Publication date: March 4, 2010Applicant: International Business Machines CorporationInventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
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Publication number: 20090291389Abstract: A method and a composition. The composition includes at least one carbosilane-substituted silsesquioxane polymer which crosslinks in the presence of an acid. The at least one carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The method includes forming a coating on a substrate. The coating includes one or more carbosilane-substituted silsesquioxane polymers. The carbosilane-substituted silsesquioxane polymer is soluble in aqueous base. The coating is exposed to radiation, resulting in generating a latent pattern in the coating. The exposed coating is baked at a first temperature less than about 150° C. The baked coating is developed, resulting in forming a latent image from the latent pattern in the baked coating. The latent image is cured at a second temperature less than about 500° C.Type: ApplicationFiled: May 23, 2008Publication date: November 26, 2009Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Robert D. Allen, Phillip Joe Brock, Blake W. Davis, Geraud Jean-Michel Dubois, Qinghuang Lin, Robert D. Miller, Alshakim Nelson, Sampath Purushothaman, Ratnam Sooriyakumaran
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Publication number: 20090098273Abstract: The present invention relates to a process for skinning wheat grains and to the products obtained with said process, namely skinned wheat grains and the separated outer skin fragments. It also concerns a specific installation to implement this process. The wheat grain skinning process of the invention notably comprises the following steps: a) cleaning the raw wheat grains; b) moistening the cleaned wheat grains; c) contacting the wheat grains with ozone, after or at the time as their moistening at step b); d) separating the detached outer skin fragments from the mass of grains partly or wholly skinned at step c).Type: ApplicationFiled: March 19, 2007Publication date: April 16, 2009Applicant: GREEN TECHNOLOGIESInventors: Christian Coste, Michel Dubois, Anne-Gaëlle Pernot
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Patent number: 7482389Abstract: A nanoporous material exhibiting a lamellar structure is disclosed. The material comprises three or more substantially parallel sheets of an organosilicate material, separated by highly porous spacer regions. The distance between the centers of the sheets lies between 1 nm and 50 nm. The highly porous spacer regions may be substantially free of condensed material. For the manufacture of such materials, a process is disclosed in which matrix non-amphiphilic polymeric material and templating polymeric material are dispersed in a solvent, where the templating polymeric material includes a polymeric amphiphilic material. The solvent with the polymeric materials is distributed onto a substrate. Organization is induced in the templating polymeric material. The solvent is removed, leaving the polymeric materials in place. The matrix polymeric material is cured, forming a lamellar structure.Type: GrantFiled: April 20, 2005Date of Patent: January 27, 2009Assignee: International Business Machines CorporationInventors: Jennifer Nam Cha, Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Willi Volksen
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Patent number: 7468330Abstract: A method of forming a structure. The method including: forming a layer of a polymerizable composition including one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, one or more polymerizable diluents, one or more photoacid generators and/or one or more photoinitiators; pressing a surface of a template having a relief pattern into the layer, the template, the layer filling voids in the relief pattern; polymerizing the layer to have thick and thin regions corresponding to the relief pattern; removing the template; removing the thin regions of the dielectric layer; and either curing the layer to create a porous dielectric layer followed by filling spaces between the thick regions of the porous dielectric layer with an electrically conductive material or filling spaces between the thick regions of the dielectric layer with an electrically conductive material followed by curing the dielectric layer to create a porous dielectric layer.Type: GrantFiled: April 5, 2006Date of Patent: December 23, 2008Assignee: International Business Machines CorporationInventors: Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert Dennis Miller, Ratnam Sooriyakumaran
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Patent number: 7459183Abstract: A method of forming a structure. The method including: forming a precursor layer on a substarte, the precursor layer including a resin and, polymeric nano-particles dispersed in the resin, and a solvent, each the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the milti-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscuble with the resin; heating the precursor layer to cross-link at least about 90% of the resin thereby converting the pre-baked precursor layer to a dielectric layer; forming trenches in the dielectric layer and filling the trenches with an electrical conductor; heating the dielectric layer to thermally decompose at least acout 99.5% of the polymeric nano-particles into decomposition products and to drive the decomposition products out of the dielectric layer.Type: GrantFiled: July 27, 2005Date of Patent: December 2, 2008Assignee: International Business Machines CorporationInventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Publication number: 20080171136Abstract: A composition of matter and a structure fabricated using the composition. The composition comprising: a resin; polymeric nano-particles dispersed in the resin, each of the polymeric nano-particle comprising a multi-arm core polymer and pendent polymers attached to the multi-arm core polymer, the multi-arm core polymer immiscible with the resin and the pendent polymers miscible with the resin; and a solvent, the solvent volatile at a first temperature, the resin cross-linkable at a second temperature, the polymeric nano-particle decomposable at a third temperature, the third temperature higher than the second temperature, the second temperature higher than the first temperature, wherein a thickness of a layer of the composition shrinks by less than about 3.5% between heating the layer from the second temperature to the third temperature.Type: ApplicationFiled: March 24, 2008Publication date: July 17, 2008Inventors: Geraud Jean-Michel Dubois, James Lupton Hedrick, Ho-Cheol Kim, Victor Yee-Way Lee, Teddie Peregrino Magbitang, Robert Dennis Miller, Muthumanickam Sankarapandian, Linda Karin Sundberg, Willi Volksen
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Publication number: 20080166871Abstract: A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.Type: ApplicationFiled: March 24, 2008Publication date: July 10, 2008Inventors: Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert Dennis Miller, Ratnam Sooriyakumaran
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Publication number: 20080050530Abstract: The present invention relates to compositions comprising poly-oxycarbosilane and methods for using the compositions in step and flash imprint lithography. The imprinting compositions comprise a poly-oxycarbosilane polymer, a silanol, a reaction initiator and optionally a pore generator.Type: ApplicationFiled: August 28, 2006Publication date: February 28, 2008Inventors: Richard Anthony Dipietro, Geraud Jean-Michel Dubois, Robert Dennis Miller, Ratnam Sooriyakumaran
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Publication number: 20080044519Abstract: The object of the present invention is a new method for kneading dough containing soft wheat flour, conducted in the presence of ozone and using at least one mechanical agitator (“fraser”). The dough so produced may be used to manufacture finished cereal bakery products such as loaves or related products (raised pizza dough for example). A further object of the invention is new kneading devices adapted for kneading in the presence of ozone.Type: ApplicationFiled: March 16, 2005Publication date: February 21, 2008Applicant: GREEN TECHNOLOGIES SARLInventors: Christian Coste, Michel Dubois
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Publication number: 20070238317Abstract: A method of forming low dielectric contrast structures by imprinting a silsesquioxane based polymerizable composition. The imprinting composition including: one or more polyhedral silsesquioxane oligomers each having one or more polymerizable groups, wherein each of the one or more polymerizable group is bound to a different silicon atom of the one or more polyhedral silsesquioxane oligomers; and one or more polymerizable diluents, the diluents constituting at least 50% by weight of the composition.Type: ApplicationFiled: April 5, 2006Publication date: October 11, 2007Applicant: International Business Machines CorporationInventors: Robert David Allen, Richard Anthony DiPietro, Geraud Jean-Michel Dubois, Mark Whitney Hart, Robert Dennis Miller, Ratnam Sooriyakumaran
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Publication number: 20060040040Abstract: The present invention relates to a novel process for the ozone treatment of unground plant materials such as wheat grains. According to the invention, this process consists in allowing the plant material to stand for at least one day after a prehumidification followed by an ozonization involving a complementary humidification that adds from 3 to 10% by weight of water, based on the dry weight of the plant material. This process is applied especially to wheat grains. In this case, a process according to the invention that enables the ozone to reach the core of the grains is carried out in order to manufacture so-called “technological” flours. The physical and chemical properties of such flours, observed as a function of the parameters of the ozonization process, are presented.Type: ApplicationFiled: September 26, 2003Publication date: February 23, 2006Inventors: Christian Coste, Alain Bailli, Michel Dubois
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Publication number: 20040188044Abstract: The invention relates to a process for the preparation of lignocellulosic substrates having a high digestibility. This process consists in bringing said lignocellulosic substrates, which have been ground beforehand and optionally moistened in the case of dry substrates, in a stirred reactor, into contact with ozone produced from a carrier gas, the ozone being present in the carrier gas in a concentration of between 80 and 200 g/m3 NTP, with a residence time of between 8 and 40 min in said reactor.Type: ApplicationFiled: December 19, 2003Publication date: September 30, 2004Inventors: Alain Bailli, Christian Coste, Michel Dubois
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Patent number: 6692538Abstract: The invention relates to the use of novel indole compounds as direct dyes in compositions intended for dyeing keratin materials, and, for example, compositions intended for dyeing human keratin fibers and including the hair, and in cosmetic compositions intended for making up the skin, the nails and the lips, to the dye compositions or make-up compositions comprising them and to the direct dyeing process using them, and processes of manufacturing said novel indole compounds.Type: GrantFiled: May 3, 2002Date of Patent: February 17, 2004Assignee: L'Oréal S.A.Inventors: Nicole Bonaventure, Patrick Gilard, Gilles Barre, Michel Dubois
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Publication number: 20040008674Abstract: A method for generating switch matrix unit programming for switch matrix units of a cross connect device includes the step of obtaining information that identifies an input port of the cross connect device and a desired output port of the cross connect device for connecting to the identified input port. The method further includes identifying a pathway from a switch matrix unit in the cross connect device that provides the identified input port to a switch matrix unit in the cross connect device that provides the desired output port. The method further includes determining that sufficient channels exist in the identified pathway to allow a connection from the identified input port to the desired output port. Also, the method includes identifying specific channels in the identified pathway to allow a connection from the identified input port to the desired output port.Type: ApplicationFiled: July 7, 2003Publication date: January 15, 2004Inventor: Michel Dubois