Patents by Inventor Michel Luc
Michel Luc has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240111104Abstract: A fiber optic connector assembly includes a connector housing defining locking portion defined, an adapter assembly selectively coupled to the connector housing, the adapter assembly including a conversion housing extending around the connector housing and defining a conversion retention member that is positionable between an engaged position, in which the conversion retention member restricts movement of the connector housing with respect to the adapter assembly in an axial direction, and a disengaged position, in which the connector housing is movable with respect to the adapter assembly in the axial direction, and a release housing positioned between the conversion housing and the connector housing, the release housing defining a release front end positionable at least partially within the conversion housing, and a release face selectively engageable with the conversion retention member and configured to move the conversion retention member from the engaged position to the disengaged position.Type: ApplicationFiled: December 14, 2023Publication date: April 4, 2024Inventors: Guy Barthes, Thierry Luc Alain Dannoux, Michel Teva Menguy, Felice Scotta
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Patent number: 11927810Abstract: A fiber optic connector assembly includes a connector housing defining a locking portion defined on an outer surface of the connector housing, an adapter assembly selectively coupled to the connector housing, the adapter assembly including a conversion housing extending around the connector housing and defining a conversion front end, a retention housing including a connector retention feature engaged with the locking portion of the connector housing and the retention housing defining one or more outwardly-extending retention features, and a release member, engageable with the retention housing, where the release member is positionable between an engaged position, in which axial movement between the retention housing and the conversion housing is restricted, and a disengaged position, in which the retention housing is removable from the conversion housing.Type: GrantFiled: November 16, 2021Date of Patent: March 12, 2024Assignee: CORNING RESEARCH & DEVELOPMENT CORPORATIONInventors: Guy Barthes, Thierry Luc Alain Dannoux, Michel Teva Menguy, Felice Scotta
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Patent number: 11045995Abstract: The device includes a mold block having at least one thermoforming chamber (28) having an inside surface (29), an axial opening (28A) through which a decorative wrap-around label (38) can be inserted into the chamber, and a moving end-wall (40) opposite from the opening. The end-wall is suitable for moving in an end segment (28A) of the chamber (28) between a positioning high level and at least one thermoforming low level, and the device has at least one tongue-and-groove set comprising a fin (42) on the end-wall (40) that is engaged in a notch (44) in the inside surface of the end segment (28B).Type: GrantFiled: May 6, 2016Date of Patent: June 29, 2021Assignee: ERCAInventor: Michel Luc
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Publication number: 20180222908Abstract: The present invention relates to novel 6,7-dihydropyrazolo[1,5-a]pyrazin-4(5H)-one derivatives as negative allosteric modulators (NAMs) of the metabotropic glutamate receptor subtype 2 (“mGluR2”). The invention is also directed to pharmaceutical compositions comprising such compounds, to processes for preparing such compounds and compositions, and to the use of such compounds and compositions for the prevention or treatment of disorders in which the mGluR2 subtype of metabotropic receptors is involved.Type: ApplicationFiled: July 30, 2015Publication date: August 9, 2018Applicant: Janssen Pharmaceutica NVInventors: José Ignacio Andrés-Gil, Michel Luc,Maria Van Gool, Andrés Avelino Trabanco-Suárez, Ana Isabel De Lucas Olivares, Sergio Alvar Alonso-de Diego, Óscar Delgado-González
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Publication number: 20180169928Abstract: The device includes a mold block having at least one thermoforming chamber (28) having an inside surface (29), an axial opening (28A) through which a decorative wrap-around label (38) can be inserted into the chamber, and a moving end-wall (40) opposite from the opening. The end-wall is suitable for moving in an end segment (28A) of the chamber (28) between a positioning high level and at least one thermoforming low level, and the device has at least one tongue-and-groove set comprising a fin (42) on the end-wall (40) that is engaged in a notch (44) in the inside surface of the end segment (28B).Type: ApplicationFiled: May 6, 2016Publication date: June 21, 2018Applicant: ERCAInventor: Michel LUC
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Publication number: 20110071385Abstract: A non-invasive exploration method for assessing the digestive motility of a subject including the subject swallowing an ingestible transmitting element containing a transmission means transmitting at a given fixed frequency, measuring in series the phase-shift of the frequency transmitted by each of at least three transportable reception means relative to a reference phase of a reference beacon to fix the origin of a coordinates system and the coordinates of each transportable reception means. Each of the reception means including a transceiver where the reception means is distributed around the subject and the reference beacon is attached to a given fixed location on the subject. The method includes measuring the phase shift of the frequency transmitted by the transmission means of the ingestible element to obtain at least three phase-shift measurements and determining by triangulation based on the phase-shift measurements a position of the ingestible element in the coordinates system.Type: ApplicationFiled: September 10, 2010Publication date: March 24, 2011Applicant: Assistance Publique-Hopitaux de ParisInventor: Michel Luc Bouchoucha
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Publication number: 20100040965Abstract: Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. In one embodiment, the phase shifting mask and the trim mask are exposed using substantially the same exposure conditions. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.Type: ApplicationFiled: October 16, 2009Publication date: February 18, 2010Applicant: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Cote
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Patent number: 7629109Abstract: Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. In one embodiment, the phase shifting mask and the trim mask are exposed using substantially the same exposure conditions. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.Type: GrantFiled: April 7, 2008Date of Patent: December 8, 2009Assignee: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Cote
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Handling of flat data for phase processing including growing shapes within bins to identify clusters
Patent number: 7500217Abstract: Definition of a phase shifting layout from an original layout can be time consuming. If the original layout is divided into useful groups, i.e. clusters that can be independently processed, then the phase shifting process can be performed more rapidly. If the shapes on the layout are enlarged, then the overlapping shapes can be grouped together to identify shapes that should be processed together. For large layouts, growing and grouping the shapes can be time consuming. Therefore, an approach that uses bins can speed up the clustering process, thereby allowing the phase shifting to be performed in parallel on multiple computers. Additional efficiencies result if identical clusters are identified and processing time saved so that repeated clusters of shapes only undergo the computationally expensive phase shifter placement and assignment process a single time.Type: GrantFiled: March 17, 2005Date of Patent: March 3, 2009Assignee: Synopsys, Inc.Inventors: Michel Luc Côté, Christophe Pierrat -
Patent number: 7422841Abstract: Mask and integrated circuit fabrication approaches are described to facilitate use of masks where substantially all of a layout is defined using phase shifting. Exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions that have an effect on the characteristics of the radiation used for the exposure, except for relative dosing. The same exposure conditions are changeable optical parameters that consist of numerical aperture (N.A.), wavelength (?) of radiation, partial coherency (?), illumination configuration, and defocus. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.Type: GrantFiled: May 7, 2004Date of Patent: September 9, 2008Assignee: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Cote
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Publication number: 20080187869Abstract: Mask and integrated circuit fabrication approaches are described to facilitate use of so called “full phase” masks. This facilitates use of masks where substantially all of a layout is defined using phase shifting. More specifically, exposure settings including relative dosing between the phase shift mask and the trim masks are described. Additionally, single reticle approaches for accommodating both masks are considered. In one embodiment, the phase shifting mask and the trim mask are exposed using the same exposure conditions, except for relative dosing. In another embodiment, the relative dosing between the phase and trim patterns is 1.0:r, 2.0<r<4.0. These approaches facilitate better exposure profiles for the resulting ICs and can thus improve chip yield and increase throughput by reducing the need to alter settings and/or switch reticles between exposures.Type: ApplicationFiled: April 7, 2008Publication date: August 7, 2008Applicant: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Cote
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Patent number: 7169515Abstract: A photolithographic mask used for defining a layer in an integrated circuit, or other work piece, where the layer comprises a pattern including a plurality of features to be implemented with phase shifting in phase shift regions is laid out including for patterns comprising high density, small dimension features, and for “full shift” patterns. The method includes identifying cutting areas for phase shift regions based on characteristics of the pattern. Next, the process cuts the phase shift regions in selected ones of the cutting areas to define phase shift windows, and assigns phase values to the phase shift windows. The phase shift values assigned comprise ? and ?, so that destructive interference is caused in transitions between adjacent phase shift windows having respective phase shift values of ? and ?. In the preferred embodiment, ? is equal to approximately ?+180 degrees.Type: GrantFiled: April 29, 2004Date of Patent: January 30, 2007Assignee: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Côté
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Patent number: 7083879Abstract: A photolithographic mask used for defining a layer in an integrated circuit, or other work piece, where the layer comprises a pattern including a plurality of features to be implemented with phase shifting in phase shift regions is laid out including for patterns comprising high density, small dimension features, and for “full shift” patterns. The method includes identifying cutting areas for phase shift regions based on characteristics of the pattern. Next, the process cuts the phase shift regions in selected ones of the cutting areas to define phase shift windows, and assigns phase values to the phase shift windows. The phase shift values assigned comprise ? and ?, so that destructive interference is caused in transitions between adjacent phase shift windows having respective phase shift values of ? and ?. In the preferred embodiment, ? is equal to approximately ?+180 degrees.Type: GrantFiled: August 17, 2001Date of Patent: August 1, 2006Assignee: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Côté
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Patent number: 6981240Abstract: A full phase shifting mask (FPSM) can define substantially all of the features of an integrated circuit using pairs of shifters having opposite phase. In particular, cutting patterns for working with the polysilicon, or gate, layers and active layers of static random access memory (SRAM) cells are considered. To resolve phase conflicts between shifters, one or more cutting patterns can be selected. These cutting patterns include cuts on contact landing pads. This cut simplifies the FPSM layout while ensuring greater critical dimension control of the more important features and reducing mask misalignment sensitivity.Type: GrantFiled: January 10, 2003Date of Patent: December 27, 2005Assignee: Synopsys, Inc.Inventors: Christophe Pierrat, Michel Luc Côté
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Patent number: 6861204Abstract: A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting. Through the process, computer readable definitions of an alternating aperture, dark field phase shift mask and of a complimentary mask are generated. Masks can be made from the definitions and then used to fabricate a layer of material in an integrated circuit. The separations between phase shifters, or cuts, are designed for easy mask manufacturability while also maximizing the amount of each feature defined by the phase shifting mask. Cost functions are used to describe the relative quality of phase assignments and to select higher quality phase assignments and reduce phase conflicts.Type: GrantFiled: March 26, 2004Date of Patent: March 1, 2005Assignee: Synopsys, Inc.Inventors: Michel Luc Côté, Christophe Pierrat
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Patent number: D511965Type: GrantFiled: May 6, 2004Date of Patent: November 29, 2005Assignee: ERCA FoamsealInventor: Michel Luc
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Patent number: D1018271Type: GrantFiled: January 26, 2023Date of Patent: March 19, 2024Assignee: BOMBARDIER RECREATIONAL PRODUCTS INC.Inventors: Pierre-Luc Robillard, Karl Dery St-Cyr, Bart Vandenbogaard, Mathieu Mercier, Alexandre Morin-Savard, Michel Bourassa, Samuel Simoneau
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Patent number: D1019513Type: GrantFiled: August 10, 2021Date of Patent: March 26, 2024Assignee: BOMBARDIER RECREATIONAL PRODUCTS INC.Inventors: Pierre-Luc Robillard, Karl Dery St-Cyr, Bart Vandenbogaard, Mathieu Mercier, Alexandre Morin-Savard, Michel Bourassa, Samuel Simoneau
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Patent number: D1021751Type: GrantFiled: August 10, 2021Date of Patent: April 9, 2024Assignee: BOMBARDIER RECREATIONAL PRODUCTS INC.Inventors: Pierre-Luc Robillard, Karl Dery St-Cyr, Bart Vandenbogaard, Mathieu Mercier, Alexandre Morin-Savard, Michel Bourassa, Samuel Simoneau
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Patent number: D1021758Type: GrantFiled: November 11, 2022Date of Patent: April 9, 2024Assignee: The Goodyear Tire & Rubber CompanyInventors: Pierre-Yves Andre Ghislain Chauveheid, Stephane Jose Geelen, Stephane Laurent Claude Bokken, Thierry Maurice Luc, Francois-Michel Thiry