Abstract: A disinfectant method and device produces a disinfectant smoke. The smoke contains reaction products of the initiator compound, sometimes with an additional disinfectant agent. A composition for the non-pyrotechnic generation of the smoke includes a monomer that exothermically polymerizes, an initiator, and a disinfectant agent. A non-pyrotechnic method of generating disinfectant-containing smoke is provided, which includes initiating a frontal polymerization reaction (FPR) in a composition for the non-pyrotechnic generation of disinfectant-containing smoke, and generating disinfectant smoke. A method of disinfecting an area is provided, involving initiating an FPR to generate disinfectant smoke, and exposing the area to the smoke for a period of time sufficient to achieve disinfection.

Abstract: A slider system have been developed to aid in the spacing between read/write heads and the storage medium, and a grating antenna amplifier has been developed to improve illumination spot size and polarization characteristics. The grating antenna can be attached to a grayscale slider to obtain a distance between the illumination spot and antenna that lies in the near field region.

Abstract: An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in either a sloped linear manner or in a curvilinear manner, and the protrusions repeat across the surface in at least one dimension to transmit the incident light. Gray scale lithography may be used to produce these patterns of protrusions in photoresist layers. High fidelity transfer of the protrusion patterns into the surfaces is accomplished by utilizing, for example, an electron cyclotron resonance plasma. Transmission values at such patterned surfaces maybe as high as 99.3%.

Abstract: A master wafer is replicated by creating a mold by plating a nickel electroform on a surface of a silicon wafer. Thereafter, a child wafer is prepared with a layer of photoresist or similar material that is compatible with plasma-etching techniques. Thereafter, the mold shape is transferred to the photoresist through compression molding, thereafter the child wafer is etched.

Abstract: A master wafer is replicated by creating a mold by plating a nickel electroform on a surface of a silicon wafer. Thereafter, a child wafer is prepared with a layer of photoresist or similar material that is compatible with plasma-etching techniques. Thereafter, the mold shape is transferred to the photoresist through compression molding, thereafter the child wafer is etched.

Abstract: A slider system have been developed to aid in the spacing between read/write heads and the storage medium, and a grating antenna amplifier has been developed to improve illumination spot size and polarization characteristics. The grating antenna can be attached to a grayscale slider to obtain a distance between the illumination spot and antenna that lies in the near field region.

Abstract: A master wafer is replicated by creating a mold by plating a nickel electroform on a surface of a silicon wafer. Thereafter, a child wafer is prepared with a layer of photoresist or similar material that is compatible with plasma-etching techniques. Thereafter, the mold shape is transferred to the photoresist through compression molding, thereafter the child wafer is etched.

Abstract: An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in either a sloped linear manner or in a curvilinear manner, and the protrusions repeat across the surface in at least one dimension to transmit the incident light. Gray scale lithography may be used to produce these patterns of protrusions in photoresist layers. High fidelity transfer of the protrusion patterns into the surfaces is accomplished by utilizing, for example, an electron cyclotron resonance plasma. Transmission values at such patterned surfaces maybe as high as 99.3%.