Abstract: A pixel cell for a CMOS image sensor includes an isolation structure that isolates a pixel transistor region from a pixel photodiode region. On a front side of the image sensor, the isolation structure includes a first shallow trench isolation (STI) structure, a second STI structure and a semiconductor region between the first STI structure and the second STI structure, and an implant region formed from a p-type semiconductor that is in contact with the semiconductor region and extends toward a backside of the image sensor. The semiconductor region is formed from the first type semiconductor. On a backside of the image sensor, the isolation structure includes a trench isolation structure extending from the backside toward the front side and that contacts the implant region.

Abstract: A pixel for an image sensor is disclosed that includes a photodiode, a thin-film layer and a reflective layer. The photodiode includes a first side and a second side that is opposite the first side, and receives incident light on the first side. The thin-film layer is formed on the first side of the photodiode and provides a unidirectional phase-shift to light passing from the photodiode to the thin-film layer. The thin-film layer has a refractive index that less than a refractive index of material forming the photodiode. The unidirectional phase-shift may be a unidirectional it phase shift at a target near-infrared light wavelength. The reflective layer is formed on the second side of the photodiode and reflects light passing from the photodiode to the reflective layer toward the first side of the photodiode. The reflective layer may be a thin-film layer, a Distributed Bragg Reflector layer, or a metal.

Abstract: Detergent compositions including at least one AMPS copolymer, at least one maleic acid polymer, an alkaline agent and optional additives are disclosed. Embodiments of the present invention are phosphorus free, and exhibit reduced scale accumulation for warewashing applications. Solid embodiments of the present invention may be disintegrant free.

Abstract: The present invention includes methods and compositions that employ sodium carboxymethyl cellulose as a scale inhibitor. According to the invention, scale inhibiting compositions are disclosed which include, sodium carboxymethyl cellulose and a polymer such as polymaleic acid, polyacrylic acid or mixtures, copolymers or terpolymers of the same and optionally may also include a phosphonate. The scale control composition may be incorporated into a detergent/cleaning composition.

Abstract: Detergent compositions including at least one AMPS copolymer, at least one organophosphonate, an alkaline agent, free of acrylic homopolymer, and an optional complexing agent are disclosed. Embodiments of the present invention reduce scale accumulation and provide stain removal capability for warewash applications.

Abstract: Detergent compositions including at least one AMPS copolymer, at least one organophosphonate, an alkaline agent and an optional complexing agent are disclosed. Embodiments of the present invention reduce scale accumulation and provide stain removal capability for warewash applications.

Abstract: Detergent compositions including at least one AMPS copolymer, at least one maleic acid polymer, an alkaline agent and optional additives are disclosed. Embodiments of the present invention are phosphorous free, and reduced scale accumulation for warewashing applications.

Abstract: The present invention includes methods and compositions that employ sodium carboxymethyl cellulose as a scale inhibitor. According to the invention, scale inhibiting compositions are disclosed which include, sodium carboxymethyl cellulose and a polymer such as polymaleic acid, polyacrylic acid or mixtures, copolymers or terpolymers of the same and optionally may also include a phosphonate. The scale control composition may be incorporated into a detergent/cleaning composition.

Abstract: A novel approach to the removal of coffee and tea stains from dishes is disclosed. Tea, coffee and other stains caused by tannins are particularly difficult to remove and traditional techniques include harsh treatments that use bleach, or other environmentally undesirable chemicals such as phosphates, EDTA, NTA or other aminocarboxylates. Applicants have found that an acid rinse prior to alkaline cleaning of stained dishware such as ceramics porcelain and the like can remove up to one hundred percent of even aged coffee and tea stains.