Patents by Inventor Michelle Lynn Neal

Michelle Lynn Neal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma enhanced chemical vapor deposition (PECVD) source
    Patent number: 9406487
    Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: August 2, 2016
    Assignee: Sputtering Components, Inc.
    Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, Jr., John Robert German, Michelle Lynn Neal
  • Plasma enhanced chemical vapor deposition (PECVD) source
    Patent number: 9362093
    Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: June 7, 2016
    Assignee: Sputtering Components, Inc.
    Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, Jr., John Robert German, Michelle Lynn Neal
  • PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE
    Publication number: 20140184073
    Abstract: One embodiment is directed to a plasma source comprising a body in which a cavity is formed and at least two self-contained magnetron assemblies disposed within the cavity. The magnetron assemblies are mutually electrically isolated from each other and from the body. In one implementation of such an embodiment, the self-contained magnetron assemblies comprise closed-drift magnetron assemblies. Other embodiments are disclosed.
    Type: Application
    Filed: December 23, 2013
    Publication date: July 3, 2014
    Applicant: Sputtering Components, Inc.
    Inventors: Daniel Theodore Crowley, Patrick Lawrence Morse, William A. Meredith, JR., John Robert German, Michelle Lynn Neal
  • ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEM
    Publication number: 20130032476
    Abstract: A magnetron sputtering device includes a cathode source assembly, and a target assembly removably coupled to the cathode source assembly. The cathode source assembly comprises a rotatable drive shaft, and a water feed tube located in the drive shaft and coupled to a tube support. The target assembly comprises a rotary cathode including a rotatable target cylinder, the rotary cathode removably mounted to the drive shaft. A magnet bar inside of the target cylinder is coupled to an end portion of the feed tube. A sweeping mechanism coupled to the magnet bar includes a control motor. An indexing pulley is coupled to the control motor, and a magnet bar pulley is coupled to the indexing pulley. The magnet bar pulley is affixed to the tube support such that any motion of the magnet bar pulley is translated to the magnet bar through the tube support and the feed tube.
    Type: Application
    Filed: July 31, 2012
    Publication date: February 7, 2013
    Applicant: Sputtering Components, Inc.
    Inventors: Daniel Theodore Crowley, Michelle Lynn Neal