Patents by Inventor Michie Ishii

Michie Ishii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aromatic diisocyanate and method of producing the same
    Patent number: 5654474
    Abstract: Novel aromatic diisocyanate and a method of producing the same. The method comprises reacting a diamine compound with a chloroformate to produce an urethane intermediate, and then reacting the urethane intermediate with a halogenated organosilicon compound or a halogenated organoboron compound, using an organic solvent capable of dissolving both the diamine compound and the urethane intermediate. This method enables to produce the aromatic diisocyanate by one-pot. The aromatic diisocyanate has excellent various properties such as high heat resistance and chemical resistance.
    Type: Grant
    Filed: September 23, 1996
    Date of Patent: August 5, 1997
    Assignee: Nitto Denko Corporation
    Inventors: Michie Ishii, Amane Mochizuki
  • Heat-resistant photoresist composition and negative-type pattern formation method
    Patent number: 5645979
    Abstract: A heat-resistant negative-working photoresist composition comprising a resin component having a carbodiimide unit in the molecule, and a compound capable of inducing a basic compound by irradiation with actinic rays. The photosensitive layer formed by the photoresist composition shows a sufficient sensitivity even by a lower irradiation energy and can give a sharp negative-type pattern by irradiation with actinic rays such as ultraviolet rays.
    Type: Grant
    Filed: September 6, 1996
    Date of Patent: July 8, 1997
    Assignee: Nitto Denko Corporation
    Inventors: Amane Mochizuki, Michie Ishii, Masako Maeda, Kazumi Higashi
  • Heat-resistant photoresist composition and negative-type pattern formation method
    Patent number: 5595856
    Abstract: A heat-resistant negative-working photoresist composition comprising a resin component having a carbodiimide unit in the molecule, and a compound capable of inducing a basic compound by irradiation with actinic rays. The photosensitive layer formed by the photoresist composition shows a sufficient sensitivity even by a lower irradiation energy and can give a sharp negative-type pattern by irradiation with actinic rays such as ultraviolet rays.
    Type: Grant
    Filed: January 31, 1996
    Date of Patent: January 21, 1997
    Assignee: Nitto Denko Corporation
    Inventors: Amane Mochizuki, Michie Ishii, Masako Maeda, Kazumi Higashi