Patents by Inventor Michihiro Kawano

Michihiro Kawano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6524397
    Abstract: A method for removing an acidic deposit containing a sulfur compound, which comprises contacting the acidic deposit with an aqueous solution of an alkali metal carbonate and/or an alkali metal hydrogencarbonate to remove it.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: February 25, 2003
    Assignee: Asahi Glass Company, Limited
    Inventors: Shigeru Sakurai, Masaharu Emoto, Hachiro Hirano, Makoto Yoshida, Hiroaki Noda, Michihiro Kawano
  • Patent number: 6387741
    Abstract: Silicon layers 2a, 2b comprised of different thicknesses are formed concurrently so as to be isolated from each other while a silicon oxide layer 1 serving as a foundation layer is controlled to be free from hollows by implanting ions only into a field silicon oxide layer 5a comprised of a thick film thickness among field silicon oxide layers 5a, 5b to be used for separating circuit elements, and thereby altering etching rates of the field silicon oxide layers 5a, 5b.
    Type: Grant
    Filed: February 1, 2001
    Date of Patent: May 14, 2002
    Assignee: Asahi Kasei Microsystems Co., Ltd.
    Inventor: Michihiro Kawano
  • Publication number: 20010039958
    Abstract: A method for removing an acidic deposit containing a sulfur compound, which comprises contacting the acidic deposit with an aqueous solution of an alkali metal carbonate and/or an alkali metal hydrogencarbonate to remove it.
    Type: Application
    Filed: April 5, 2001
    Publication date: November 15, 2001
    Applicant: Asahi Glass Company, Limited
    Inventors: Shigeru Sakurai, Masaharu Emoto, Hachiro Hirano, Makoto Yoshida, Hiroaki Noda, Michihiro Kawano