Patents by Inventor Michitaka Shimazoe

Michitaka Shimazoe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4618844
    Abstract: In a semiconductor pressure transducer in accordance with the present invention, an oxide film is formed on a semiconductor base having a strain gauge resistor element for the purpose of protecting the strain gauge resistor element. Over the oxide film, a conductive metal film is formed which does not overlap with the strain gauge resistor element through said oxide film.
    Type: Grant
    Filed: May 12, 1983
    Date of Patent: October 21, 1986
    Assignee: Hitachi, Ltd.
    Inventors: Yukio Takahashi, Michitaka Shimazoe, Yoshitaka Matsuoka
  • Patent number: 4454771
    Abstract: A load cell comprises a semiconductor diaphragm which includes an outer flange portion, a central rigid portion having a smaller thickness than the outer flange portion and a thin resilient portion provided between the outer flange portion and the central rigid portion. At least two piezo-resistors constituting at least part of a bridge circuit are formed in the resilient portion. The load cell further comprises a first glass block secured to the central rigid portion, and a second glass block for securing the outer flange portion. A load is applied to the semiconductor diaphragm through the first glass block, wherein measurement of the applied load is effected by detecting variation in resistance of the resistor bridge circuit.
    Type: Grant
    Filed: November 5, 1981
    Date of Patent: June 19, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Michitaka Shimazoe, Yoshitaka Matsuoka
  • Patent number: 4364276
    Abstract: A differential pressure measuring transducer assembly including a measuring diaphragm formed of semiconductor material having gauge resistance elements on one surface thereof and a central boss area of large thickness and a peripheral support flange on the other surface thereof defining therebetween an annular portion of small thickness. The measuring diaphragm is attached at the peripheral support flange to a glass support member and a metallic support member formed with pressure conducting bores respectively communicating with each other. The metallic support member is formed of material having a Young's modulus substantially equal to that of the measuring diaphragm.
    Type: Grant
    Filed: December 16, 1980
    Date of Patent: December 21, 1982
    Assignee: Hitachi, Ltd.
    Inventors: Michitaka Shimazoe, Yoshitaka Matsuoka, Ryozo Akahane, Yasushi Shimizu, Hideyuki Nemoto, Masanori Tanabe
  • Patent number: 4303903
    Abstract: A pressure transducer comprising a silicon diaphragm on which a semiconductor strain gauge is formed and which has a diaphragm portion deformable in response to a pressure, an insulating support which is made of borosilicate glass having the silicon diaphragm rigidly mounted thereon and which is provided with a pressure introducing hole in its central part, a metallic support which is cylindrical, which is made of an iron-nickel alloy similar in the thermal expansion coefficient to the borosilicate glass and on which the glass insulating support is rigidly mounted, and a metallic housing within which the integrated structure consisting of the silicon diaphragm, the glass insulating support and the metallic support is arranged; the silicon diaphragm, the insulating support and the metallic support being joined by the anodic bonding, the metallic support being rigidly welded to the metallic housing at its lower end part.
    Type: Grant
    Filed: September 21, 1979
    Date of Patent: December 1, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Yoshitaka Matsuoka, Michitaka Shimazoe, Yoshimi Yamamoto, Mitsuo Ai, Keiji Miyauchi, Hideyuki Nemoto, Masatoshi Tsuchiya, Masanori Tanabe
  • Patent number: 4173900
    Abstract: A semiconductor pressure transducer comprising a disc-shaped pressure-responsive diaphragm; a pair of radial strain gauge units having a piezoresistance effect, formed by injecting an impurity in the radial direction in the surface of the diaphragm; and a pair of tangential strain gauge units having a piezoresistance effect, formed by injecting an impurity in the tangential direction in the surface of the diaphragm, wherein the distance from the pair of the radial strain gauge units to the center of the circular diaphragm is greater than the distance from the pair of the tangential strain gauge units to the center of the circular diaphragm.
    Type: Grant
    Filed: March 6, 1978
    Date of Patent: November 13, 1979
    Assignee: Hitachi, Ltd.
    Inventors: Masanori Tanabe, Satoshi Shimada, Motohisa Nishihara, Kazuji Yamada, Yasumasa Matsuda, Michitaka Shimazoe, Yoshitaka Matsuoka, Yukio Takahashi, Katsuya Katohgi, Mitsuo Ai
  • Patent number: 4065971
    Abstract: A semiconductor pressure transducer includes a monocrystalline semiconductor diaphragm, the outer edges of which are fixed. When subjected to pressure, the transducer produces radial strains of opposite polarity in a central portion thereof and a portion surrounding the central portion close to the edge of the strain inducing region. The diaphragm contains a plurality of elongated resistances formed of semiconductor material of the same conductivity type which are electrically isolated from the diaphragm, per se. Resistances of an individual set which lie in proximity to one another are combined in the form of a bridge. The longitudinal direction of resistances forming one set of opposing arms of the bridge extend along axes of the same crystal system as the longitudinal direction of the elongated resistances forming the other set of opposing arms of the bridge.
    Type: Grant
    Filed: July 1, 1976
    Date of Patent: January 3, 1978
    Assignee: Hitachi, Ltd.
    Inventors: Michitaka Shimazoe, Kousuke Nakamura, Yasuo Matsushita, Satoshi Shimada, Kazuji Yamada, Yukio Takahashi
  • Patent number: 4050313
    Abstract: A semiconductor pressure transducer comprises a circular diaphragm formed of a single crystal semiconductor material, at least a first strain gauge element having a piezoresistance effect and formed by injecting an impurity into the diaphragm in a linear region extending in parallel with a predetermined axis which extends transversely of the surface of the diaphragm, at least a second strain gauge element having the piezoresistance effect and formed by injecting an impurity into the diaphragm in a linear region extending in the direction perpendicular to the axis, and means for securing the diaphragm at the outer peripheral portion thereof. The distance between the second strain gauge element and the center of the diaphragm is differed from the distance between the center of the first strain gauge element and the latter.
    Type: Grant
    Filed: June 3, 1976
    Date of Patent: September 27, 1977
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Shimada, Kazuji Yamada, Yasumasa Matsuda, Ichiro Kimura, Michitaka Shimazoe, Yukio Takahashi