Abstract: A valve for use in oil and gas production or similar applications includes a plug or other flow barrier disposed in a cavity of a hollow valve body with a metal-to-metal sealing surface that is not reliant on any rubberized or elastomeric material to effect a seal.

Abstract: A method of removing impurities in a film is disclosed. The method includes generating hydrogen radicals including inputting a hydrogen radical precursor material to a radical source including a plasma chamber, that is external to a processing chamber, the radical source having an outlet in fluid communication with the processing chamber and creating a plasma in the plasma chamber. The hydrogen radicals are input into the processing chamber from the outlet of the radical source. The processing chamber has a pressure of between about 1 millitorr and about 10 torr and an impurity-containing film on a target is exposed to the hydrogen radicals. A system for reducing an oxide in an exposed surface is also disclosed.

Abstract: Chemical generators and methods are described for generating a desired chemical species at or near a point of use such as the chamber of a reactor in which a workpiece such as a semiconductor wafer is to be processed. The chemical species is generated by dissociating precursor materials to create free radicals, and combining the free radicals, alone or in combination with other materials, to form the chemical species. An inductively coupled plasma preferably performs such dissociation.