Abstract: The present disclosure discloses a communication device and server configured to provide to a user a relative event impact map display depicting a plurality of items impacted by an event or a portion of a network impacted by the event. The network can not only be a supply and/or logistics chain but also a computer network, a telecommunications network, transportation network, and power grid.

Abstract: The present disclosure describes a communication device and server configured to provide a user a relative event impact map display depicting a plurality of items impacted by an event or a portion of a network impacted by the event. The network can not only be a supply and/or logistics chain but also a computer network, a telecommunications network, transportation network, and power grid.

Abstract: The present disclosure discloses a communication device and server configured to provide to a user a relative event impact map display depicting a plurality of items impacted by an event or a portion of a network impacted by the event. The network can not only be a supply and/or logistics chain but also a computer network, a telecommunications network, transportation network, and power grid.

Abstract: A system and process for stamping parts having tolerances below 1000 nanometers. The inventive system and process is particularly suited for producing optoelectronic parts. The system includes a stamping press and one or a progression of stamping stations for supporting a punch and die. The stamping stations are designed to maintain substantial alignment of the punch and die with minimal moving components. The stamping station includes a shaft for rigidly guiding the punch to the die. The stamping press is capable of providing the punch with the necessary force to perform the stamping operations. The system includes an interface system for interfacing the force of the press with the punch, while simultaneously structurally decoupling the press from the punch. The system also includes a locating sub-plate, for locating the stamping station in alignment relative to each other, and means for in-line machine stock material before entry into the stamping stations.

Abstract: A system and process for stamping parts having tolerances below 1000 nanometers. The inventive system and process is particularly suited for producing optoelectronic parts. The system includes a stamping press and one or a progression of stamping stations for supporting a punch and die. The stamping stations are designed to maintain substantial alignment of the punch and die with minimal moving components. The stamping station includes a shaft for rigidly guiding the punch to the die. The stamping press is capable of providing the punch with the necessary force to perform the stamping operations. The system includes an interface system for interfacing the force of the press with the punch, while simultaneously structurally decoupling the press from the punch. The system also includes a locating sub-plate, for locating the stamping station in alignment relative to each other, and means for in-line machine stock material before entry into the stamping stations.