Patents by Inventor Miho Shimizu

Miho Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240158482
    Abstract: An objective of the present invention is to provide methods for promoting antigen uptake into cells by antigen-binding molecules, methods for increasing the number of times of antigen binding by one antigen-binding molecule, methods for promoting reduction of the antigen concentration in plasma by administering antigen-binding molecules, and methods for improving the plasma retention of an antigen-binding molecule, as well as antigen-binding molecules that allow enhanced antigen uptake into cells, antigen-binding molecules having an increased number of times of antigen binding, antigen-binding molecules that can promote reduction of the antigen concentration in plasma when administered, antigen-binding molecules with improved plasma retention, pharmaceutical compositions comprising the above antigen-binding molecules, and methods for producing them. The present inventors revealed that the above objective can be achieved by using antigen-binding molecules that show calcium-dependent antigen-antibody reaction.
    Type: Application
    Filed: December 20, 2023
    Publication date: May 16, 2024
    Applicant: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Tomoyuki Igawa, Shinya Ishii, Miho Funaki, Naoka Hironiwa, Atsuhiko Maeda, Junichi Nezu, Yoshinao Ruike, Takeshi Baba, Shun Shimizu
  • Publication number: 20150265658
    Abstract: Providing an agent for activating a sirtuin gene and an application thereof. The agent for activating a sirtuin gene is characterized to contain an egg shell membrane ingredient, for example an egg shell membrane-containing powder or soluble egg shell membrane ingredient.
    Type: Application
    Filed: March 24, 2015
    Publication date: September 24, 2015
    Inventors: Yoriko ATOMI, Miho SHIMIZU, Yukio HASEBE
  • Publication number: 20150196606
    Abstract: To provide an activator of gene expression of molecular chaperone gene and applications thereof. This activator of gene expression of molecular chaperone gene contains an eggshell membrane component, for example, a powder containing eggshell membrane or a soluble eggshell membrane component. Moreover, the powder containing eggshell membrane used in the present invention may be a fine powder preferably having 6 ?m or less in the mean volume particle diameter of the fine powder containing eggshell membranes, and/or 20 ?m or less in the maximum volume particle diameter thereof, but not limited to these values.
    Type: Application
    Filed: March 30, 2015
    Publication date: July 16, 2015
    Inventors: Yukio HASEBE, Junko ATOMI, Miho SHIMIZU
  • Publication number: 20150150916
    Abstract: To provide an insulin resistance-improving agent, and the application thereof. The insulin resistance-improving agent contains an eggshell membrane component, for example, an eggshell membrane-containing powder or a soluble eggshell membrane component. Further, the eggshell membrane-containing powder to be used is a fine powder, and preferably has a volume average particle size of 6 ?m or less, and/or a volume maximum particle size of 20 ?m or less, but these particle sizes are not limited to the values.
    Type: Application
    Filed: November 25, 2014
    Publication date: June 4, 2015
    Inventors: Yoriko ATOMI, Miho SHIMIZU, Yukio HASEBE
  • Publication number: 20140363519
    Abstract: To provide an activator of gene expression of molecular chaperone gene and applications thereof. This activator of gene expression of molecular chaperone gene contains an eggshell membrane component, for example, a powder containing eggshell membrane or a soluble eggshell membrane component. Moreover, the powder containing eggshell membrane used in the present invention may be a fine powder preferably having 6 ?m or less in the mean volume particle diameter of the fine powder containing eggshell membranes, and/or 20 ?m or less in the maximum volume particle diameter thereof, but not limited to these values.
    Type: Application
    Filed: November 27, 2013
    Publication date: December 11, 2014
    Applicants: The University of Tokyo, ALMADO Inc.
    Inventors: Yukio HASEBE, Yoriko ATOMI, Miho SHIMIZU
  • Publication number: 20140356450
    Abstract: Providing an agent for activating a sirtuin gene and an application thereof. The agent for activating a sirtuin gene is characterized to contain an egg shell membrane ingredient, for example an egg shell membrane-containing powder or soluble egg shell membrane ingredient.
    Type: Application
    Filed: November 27, 2013
    Publication date: December 4, 2014
    Applicants: ALMADO Inc., The University of Tokyo
    Inventors: Yoriko ATOMI, Miho SHIMIZU, Yukio HASEBE
  • Patent number: 8735201
    Abstract: The challenge for the present invention is to provide a film-forming method and for forming a passivation film which can sufficiently inhibit the loss of carriers due to their recombination; and a method for manufacturing a solar cell element with the use of the method or the device. The film-forming device comprises a mounting portion 22 for mounting a film-forming object, a high frequency power source 25, and a shower plate 23 which is provided to face the film-forming object S mounted on the mounting portion 22, which introduces a film-forming gas, and to which the high frequency power source is connected and a high frequency voltage is applied. A low frequency power source 26 for applying a low frequency voltage is connected to the shower plate or the mounting portion mounting a substrate. The film-forming method is performed using the film-forming device, and the film-forming method is carried out in forming a passivation film.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: May 27, 2014
    Assignee: ULVAC, Inc.
    Inventors: Masashi Kubo, Makoto Kikuchi, Kazuya Saito, Miwa Watai, Miho Shimizu
  • Patent number: 8198115
    Abstract: A method for manufacturing a solar cell, includes: forming, on a silicon substrate whose conductivity type is p-type or n-type, a silicon layer including a dopant whose conductivity type is different from that of the silicon substrate; and diffusing the dopant included in the silicon layer into the silicon substrate by heat-treating the silicon layer.
    Type: Grant
    Filed: April 21, 2009
    Date of Patent: June 12, 2012
    Assignee: ULVAC, Inc.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Atsushi Ota, Shunji Kuroiwa, Miho Shimizu
  • Publication number: 20120000512
    Abstract: A solar cell includes: a substrate; a photoelectric conversion cell which has a first electrode layer provided with permeability, a photoelectric conversion layer, and a second electrode layer, and is arranged on the substrate; and a protection layer which covers at least the second electrode layer. The protection layer includes a silicon nitride compound.
    Type: Application
    Filed: January 26, 2010
    Publication date: January 5, 2012
    Inventors: Miho Shimizu, Kazuya Saito, Masanori Hashimoto
  • Publication number: 20110294256
    Abstract: The challenge for the present invention is to provide a film-forming method and for forming a passivation film which can sufficiently inhibit the loss of carriers due to their recombination; and a method for manufacturing a solar cell element with the use of the method or the device. The film-forming device comprises a mounting portion 22 for mounting a film-forming object, a high frequency power source 25, and a shower plate 23 which is provided to face the film-forming object S mounted on the mounting portion 22, which introduces a film-forming gas, and to which the high frequency power source is connected and a high frequency voltage is applied. A low frequency power source 26 for applying a low frequency voltage is connected to the shower plate or the mounting portion mounting a substrate. The film-forming method is performed using the film-forming device, and the film-forming method is carried out in forming a passivation film.
    Type: Application
    Filed: December 28, 2009
    Publication date: December 1, 2011
    Applicant: ULVAC, INC.
    Inventors: Masashi Kubo, Makoto Kikuchi, Kazuya Saito, Miwa Watai, Miho Shimizu
  • Publication number: 20110030780
    Abstract: A solar cell includes: a substrate having optical transparency; a photoelectric converter provided on the substrate, including a top-face electrode having optical transparency, a photoelectric conversion layer, and a back-face electrode having light reflectivity; and a low-refractive conductive layer whose refractive index is less than or equal to 2.0, the low-refractive conductive layer being made of a conductive material having optical transparency, being adjacent to the photoelectric conversion layer, and being disposed on a side of the photoelectric conversion layer opposite to the substrate.
    Type: Application
    Filed: April 24, 2009
    Publication date: February 10, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Yoshio Ide, Shin Asari, Yusuke Mizuno, Miho Shimizu
  • Publication number: 20110020976
    Abstract: A method for manufacturing a solar cell, includes: forming, on a silicon substrate whose conductivity type is p-type or n-type, a silicon layer including a dopant whose conductivity type is different from that of the silicon substrate; and diffusing the dopant included in the silicon layer into the silicon substrate by heat-treating the silicon layer.
    Type: Application
    Filed: April 21, 2009
    Publication date: January 27, 2011
    Applicant: ULVAC, INC.
    Inventors: Miwa Watai, Kazuya Saito, Takashi Komatsu, Atsushi Ota, Shunji Kuroiwa, Miho Shimizu
  • Publication number: 20100075475
    Abstract: An electrode is prevented from being peeled from a substrate or a silicon layer. After the surface of a first copper thin film composed mainly of copper is treated by exposing it to an ammonia gas, a film of silicon nitride is formed on the surface of the first copper thin film by generating a plasma of a raw material gas containing a silane gas and an ammonia gas in an atmosphere in which an object to be processed is placed. Since the surface is preliminarily treated with the ammonia gas, the silane gas is prevented from being diffused into the first copper thin film. Therefore, an electrode constituted by the surface-treated first copper thin film is not peeled from the glass substrate or the silicon layer. In addition, its electric resistance value does not rise.
    Type: Application
    Filed: December 3, 2009
    Publication date: March 25, 2010
    Applicant: ULVAC, INC.
    Inventors: Satoru TAKASAWA, Yuuichi Oishi, Miho Shimizu, Tooru Kikuchi, Satoru Ishibashi
  • Patent number: 5756313
    Abstract: A plasmid for a yeast host, the plasmid comprising in sequence: (1) a yeast derived promoter, (2) an albumin-encoding region placed under control of the yeast-derived promoter, (3) a transcription terminator and (4) a sequence homologous to a part of the yeast host chromosomal sequence such that the plasmid is capable of being integrated into the yeast host cell chromosome and wherein the plasmid is incapable of autonomous replication in yeast cells; a yeast host transformed with the above plasmid; a method of producing a yeast transformant which comprises transforming a yeast host by integrating at least two different plasmids each having a sequence homologous to a part of the host yeast chromosomal sequence one at a time into the chromosome of the yeast host cell; and a method of producing albumin which comprises cultivating the above transformant and recovering the thus-produced albumin.
    Type: Grant
    Filed: October 20, 1993
    Date of Patent: May 26, 1998
    Assignee: The Green Cross Corporation
    Inventors: Ken Okabayashi, Hideyuki Oi, Kazumoto Hirabayashi, Masami Miura, Miho Shimizu, Haruhide Kawabe