Patents by Inventor Mika Kanehira

Mika Kanehira has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8004657
    Abstract: An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.
    Type: Grant
    Filed: February 21, 2007
    Date of Patent: August 23, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masayuki Tanabe, Yutaka Watanabe, Shigeru Terashima, Mika Kanehira
  • Publication number: 20080304031
    Abstract: An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the light, plural vacuum chambers, each of which houses one or more of the plural optical elements, and a gas supplier configured to supply to each vacuum chamber independently a gas used to inhibit contaminations that could occur on the optical element housed in each vacuum chamber, wherein the gas supplier supplies different types of gases to the plural vacuum chambers according to an illuminance of an illumined region on the optical element housed in each vacuum chamber.
    Type: Application
    Filed: March 13, 2008
    Publication date: December 11, 2008
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Mika Kanehira, Shigeru Terashima, Yutaka Watanabe
  • Publication number: 20070202423
    Abstract: An exposure apparatus includes a chamber where an optical element having a capping layer is arranged, and exposes a substrate by using the optical element. The exposure apparatus includes a supply unit which supplies a material to repair the capping layer into the chamber, and a providing unit which provides electromagnetic waves to the optical element. The electromagnetic waves cause a photochemical reaction of the material to grow a layer on the capping layer so as to repair the capping layer.
    Type: Application
    Filed: February 21, 2007
    Publication date: August 30, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masayuki Tanabe, Yutaka Watanabe, Shigeru Terashima, Mika Kanehira