Patents by Inventor Mikhail Ravkin

Mikhail Ravkin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for cleaning semiconductor substrates
    Patent number: 6324715
    Abstract: A cleaning method and apparatus using very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate and reduces the volumes of chemical solutions used in a scrubbing process. The process of the present invention uses SC1 to convert substrate surfaces from a hydrophobic state to a hydrophilic surface state while cleaning the wafer with the brush. A hydrophilic surface state is necessary to successfully remove surface contaminants by chemical mechanical brush cleaning.
    Type: Grant
    Filed: January 7, 1999
    Date of Patent: December 4, 2001
    Assignee: Lam Research Corporation
    Inventors: Diane J. Hymes, Mikhail Ravkin, Wibur C. Krusell, Venus Noorai
  • Method and apparatus for cleaning of semiconductor substrates using standard clean 1 (SC1)
    Patent number: 5858109
    Abstract: A cleaning method and apparatus using very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate and reduces the volumes of chemical solutions used in a scrubbing process. The process of the present invention uses SC1 to convert substrate surfaces from a hydrophobic state to a hydrophilic surface state while cleaning the wafer with the brush. A hydrophilic surface state is necessary to successfully remove surface contaminants by chemical mechanical brush cleaning.
    Type: Grant
    Filed: January 31, 1997
    Date of Patent: January 12, 1999
    Assignee: Ontrak Systems, Inc.
    Inventors: Diane J. Hymes, Mikhail Ravkin, Wibur C. Krusell, Venus Noorai
  • Apparatus for a brush assembly
    Patent number: 5806126
    Abstract: A Method and Apparatus for Chemical Delivery Through the Brush used in semiconductor substrate cleaning processes. The chemical solutions are delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate, reduces the volumes of chemical solutions used in a scrubbing process, and helps maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a scrubber that scrubs both sides of a semiconductor substrate.
    Type: Grant
    Filed: September 17, 1997
    Date of Patent: September 15, 1998
    Assignee: OnTrak Systems, Inc.
    Inventors: John Martin de Larios, Mikhail Ravkin, Douglas Grant Gardner