Patents by Inventor Miki Motomura

Miki Motomura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive resin comprising a polymer having an azide group in the side chain
    Patent number: 5424368
    Abstract: A photosensitive resin having at least one group as shown below in Chemical Formula (1) in a molecule. ##STR1## wherein n represents an integer from 1 to 10. Since the photosensitive resin has an azido group in a molecule having an adsorption region higher than 300 nm, the resin is highly sensitive. Therefore, an emulsion coating photo mask or a soda glass photo mask, which allows light permeation within the abosorption region of the azido group and is cheap in industry, can be used as the photo mask for the photosensitive resin of the invention. The photosensitive resin is particularly useful as a photo resist.
    Type: Grant
    Filed: February 3, 1994
    Date of Patent: June 13, 1995
    Assignee: Sanyo Chemical Industries, Inc.
    Inventors: Tadakazu Miyazaki, Masahide Mizumori, Miki Motomura