Abstract: An endoscope includes: a distal end rigid member including a distal end-side end portion and a proximal end-side end portion in the longitudinal axis direction of an insertion portion and a hole provided in the longitudinal axis direction; an objective optical unit inserted into and attached to an inside of the hole in the longitudinal axis direction; a camera unit; and a projecting portion projecting from at least a part of a periphery of the hole, from the proximal end-side end portion to a proximal end side in the longitudinal axis direction, by a length that is equal to or greater than a length up to a gravity center position of the camera unit in the longitudinal axis direction exceeding a connecting portion connecting the objective optical unit and the camera unit, so as to cover a part of an outer peripheral portion of the camera unit.

Abstract: An information processing method for detecting conditions of a plurality of manufacturing devices respectively used by a plurality of entities includes acquiring sensor value data obtained by detecting physical quantities related to the manufacturing devices; individually storing collected sensor value data in a plurality of databases; generating by machine learning a plurality of learning models based on the stored sensor value data; and calculating a condition of the manufacturing device of one of the entities by inputting sensor value data acquired from the manufacturing device of the one of the entities to the one or more of the learning models selected by the one of the entities.

Abstract: An abnormality detection system includes an abnormality detection apparatus that detects an abnormality of a manufacturing device, a control device that performs operation control of the manufacturing device and transmits operating data, and a sensor that detects a physical quantity related to operation of the manufacturing device or a product manufactured by the manufacturing device and outputs sensor value data. The abnormality detection apparatus receives operating data transmitted from the control device, acquires sensor value data output from the sensor, calculates statistics of the sensor value data acquired, determines a presence or an absence of an abnormality of the manufacturing device based on the statistics calculated and a threshold depending on the operating data received, and transmits a determination result and the statistics to the control device.

Abstract: An abnormality detection system includes an abnormality detection apparatus that detects an abnormality of a production device, a control device that performs operation control of the manufacturing device and transmits operating data, a sensor that detects a physical quantity related to operation or a product of the manufacturing device and outputs sensor value data, and a diagnostic apparatus. The abnormality detection apparatus determines a presence or an absence of an abnormality of the manufacturing device based on the operating data transmitted from the control device and the sensor value data output from the sensor and transmits the determination result to the control device. The abnormality detection apparatus further transmits the operating data and the sensor value data to the diagnostic apparatus.

Abstract: There is provided a method of performing a surface processing on a substrate having a metal layer formed on a bottom portion of a recess formed in an insulating film, the method including: supplying a halogen-containing gas into a processing chamber in which the substrate is loaded; and removing a metal oxide from the bottom portion of the recess using the halogen-containing gas.

Abstract: There is provided a method of performing a surface processing on a substrate having a metal layer formed on a bottom portion of a recess formed in an insulating film, the method including: supplying a halogen-containing gas into a processing chamber in which the substrate is loaded; and removing a metal oxide from the bottom portion of the recess using the halogen-containing gas.

Abstract: A method of forming a tungsten film having low resistance is provided. The method includes forming a discontinuous film containing a metal on a substrate; and forming the tungsten film on the substrate on which the discontinuous film is formed. In the forming of the discontinuous film, a first source gas and a nitriding gas are supplied onto the substrate alternately along with, for example, a carrier gas. In the forming of the tungsten film, a second source gas and a reducing gas are supplied onto the substrate alternately along with, for example, a carrier gas.

Abstract: An object of the present invention is to provide a vibration damping device including a bearing member capable of achieving simplification of configuration in the vibration damping device, reducing frictional force during operation, and having an excellent wear resistance. A vibration damping device of the present invention includes a bearing structure, in which a metal bush (bearing member) has a resin layer on a side defined as a friction sliding surface of a base member, the resin layer includes polytetrafluoroethylene and a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer resin, and the metal bush is lubricated by a magneto-rheological fluid composition.

Abstract: There is provided a method of performing a surface processing on a substrate having a metal layer formed on a bottom portion of a recess formed in an insulating film, the method including: supplying a halogen-containing gas into a processing chamber in which the substrate is loaded; and removing a metal oxide from the bottom portion of the recess using the halogen-containing gas.

Abstract: There is provided a tungsten film forming method which includes: forming a first tungsten film on a substrate; and forming a second tungsten film on the first tungsten film. The forming a first tungsten film includes alternately supplying a first raw material gas containing tungsten and a diborane gas together with a first carrier gas to the substrate. The forming a second tungsten film includes alternately supplying a second raw material gas containing tungsten and a hydrogen gas together with a second carrier gas to the substrate on which the first tungsten film is formed. The first carrier gas is a nitrogen gas. The second carrier gas includes at least one kind of nobel gas and has the noble gas at a flow rate of 70% or more with respect to a total flow rate of the second carrier gas.

Abstract: Provided is a method for forming a tungsten film in which a tungsten film is formed on the surface of a substrate, the method including: disposing a substrate having an amorphous layer on the surface thereof inside a treatment container under a depressurized atmosphere; heating the substrate inside the treatment container; and supplying, into the treatment container, WF6 gas which is a tungsten raw material and H2 gas which is a reducing gas, and forming a main tungsten film on the amorphous layer.

Abstract: An object of the present invention is to provide a vibration damping device including a bearing member capable of achieving simplification of configuration in the vibration damping device, reducing frictional force during operation, and having an excellent wear resistance. A vibration damping device of the present invention includes a bearing structure, in which a metal bush (bearing member) has a resin layer on a side defined as a friction sliding surface of a base member, the resin layer includes polytetrafluoroethylene (PTFE) and a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer resin, and the metal bush is lubricated by a magneto-rheological fluid composition.

Abstract: A method of forming a tungsten film having low resistance is provided. The method includes forming a discontinuous film containing a metal on a substrate; and forming the tungsten film on the substrate on which the discontinuous film is formed. In the forming of the discontinuous film, a first source gas and a nitriding gas are supplied onto the substrate alternately along with, for example, a carrier gas. In the forming of the tungsten film, a second source gas and a reducing gas are supplied onto the substrate alternately along with, for example, a carrier gas.

Abstract: There is provided a tungsten film forming method which includes: forming a first tungsten film on a substrate; and forming a second tungsten film on the first tungsten film. The forming a first tungsten film includes alternately supplying a first raw material gas containing tungsten and a diborane gas together with a first carrier gas to the substrate. The forming a second tungsten film includes alternately supplying a second raw material gas containing tungsten and a hydrogen gas together with a second carrier gas to the substrate on which the first tungsten film is formed. The first carrier gas is a nitrogen gas. The second carrier gas includes at least one kind of inert gas and has a noble gas at a flow rate of 70% or more with respect to a total flow rate of the second carrier gas.

Abstract: A metal hard mask for etching an etching target film that is present on a target object to be processed is formed of an amorphous alloy film that is formed by a thin film formation technique. It is preferable to use a physical vapor deposition method as the thin film formation technique, and sputtering is suitable for the use among physical vapor deposition methods. This metal hard mask is obtained by forming an amorphous alloy film on the etching target film by a thin film formation technique and patterning the amorphous alloy film.

Abstract: A two-cycle engine having a structure in which the shaft center Ccy of the cylinder 3 is offset onto the exhaust port 32 side with respect to the rotational center Ccr of the crankshaft 4, and the offset amount S of the shaft center Ccy with respect to the rotational center Ccr is set greater than 1 mm and less than 6 mm. Furthermore, in this case, the center of gravity of the counterweight 42 of the crankshaft 4 is shifted onto the rear side in the rotational direction with respect to the line passing the rotational center Ccr of the crankshaft 4 and the center Ccp of the crank pin 41.

Abstract: A half bearing for a crankshaft of an internal combustion engine, which includes crush relieves at both circumferential end portions of an inner circumferential surface of the half bearing, is provided. The half bearing further includes an axial groove at least at a position adjacent to a crush relief on a rear side of a relative rotation direction of the crankshaft, and adjacent to the inner circumferential surface of the half bearing. The axial groove extends along an entire width of the inner circumferential surface of the half bearing.

Abstract: A double floor structure capable of being adapted to the conditions of construction and the needs of users at low cost. A double floor structure (K) provided with support legs (1) which are provided on a lower floor and rows of beams which form an upper floor. The support legs (1) are each provided with an upper member (14) which supports a beam from the lower side, an intermediate member (13) which supports the upper member (14) from the lower side, and a lower member (12) which supports the intermediate member (13) from the lower side. The upper member (14), the intermediate member (13), and the lower member (12) consist of metallic, extruded shape material and are disposed in such a manner that the direction of the extrusion is aligned with the top-bottom direction.

Abstract: A halved sliding bearing is provided, two of which are paired into a cylindrical shape. The halved sliding bearing includes a steel back metal, and a bearing alloy layer, which serves as a sliding surface, on the inside of the steel back metal. A coat layer of Bi or a Bi-based alloy is formed on the outside back surface of the steel back metal. Preferably, the coat layer consists of 1 to 30 mass % of one or more of Sn, Pb, In, Ag and Cu and the balance being Bi and inevitable impurities.

Abstract: A Ni film forming method performs a cycle once or multiple times. The cycle includes: forming a nitrogen-containing Ni film on a substrate by CVD using nickel amidinate as a film formation material and at least one selected from ammonia, hydrazine and derivatives thereof as a reduction gas; and eliminating nitrogen from the nitrogen-containing Ni film by atomic hydrogen which is generated by using as a catalyst Ni produced by supplying hydrogen gas to the nitrogen-containing Ni film.