Patents by Inventor Mikio Yamahiro
Mikio Yamahiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230295427Abstract: A siloxane polymer contains a silsesquioxane unit and a linear siloxane unit in its main chain and has a cage-type silsesquioxane structure in its side chain. A highly transparent and flexible film having a small linear thermal expansion coefficient is produced by utilizing the cohesion force (physical crosslinking) of the cage-type silsesquioxane in the side chain. The siloxane polymer has repeating units respectively represented by formulae (1) and (4), and has terminal groups respectively represented by formulae (5L) and (5R) at its right and left terminals, wherein A represents a structure shown below.Type: ApplicationFiled: July 29, 2021Publication date: September 21, 2023Applicant: JNC CORPORATIONInventors: Nobuo ENOKI, Kazuya SUWA, Ayaka KIYA, Mikio YAMAHIRO, Takeshi MATSUSHITA, Taro ISHIKAWA, Hisao OIKAWA
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Patent number: 10906065Abstract: The invention of the present application is a laminate in which thermoplastic polyurethane is used, excellent antifouling and adhesion properties are obtained, and glue residue is minimized. The laminate is provided with a substrate film formed from thermoplastic polyurethane, and an adhesive layer formed on one surface side of the substrate film. The substrate film has a surface layer on the opposite side of the first surface, a mixture of the thermoplastic polyurethane and a curable resin composition being present in the surface layer. The content ratio of the curable resin composition is configured so as to gradually decrease from the surface of the surface layer towards the interior of the substrate film. The curable resin composition contains at least one fluorine compound selected from the group consisting of fluorosilsesquioxane and fluorosilsesquioxane polymers, and a curable resin. The adhesive layer has a surface roughness of 350-750 nm.Type: GrantFiled: July 14, 2015Date of Patent: February 2, 2021Assignees: JNC CORPORATION, SUMIRON CO., LTD.Inventors: Soichiro Hiraki, Koji Ohguma, Mikio Yamahiro, Taro Magatani, Shigetaka Ikemoto
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Patent number: 10189999Abstract: A compound capable of increasing the scratch resistance of, for instance, a hard-coat agent and a resin composition for a coating agent containing the compound are shown. The resin composition for a coating agent of the present application contains: a silicon compound (a) represented by formula (I) of the specification; and a curable resin (b). In formula (I), R1 is a C3 or C4 alkylene group, and X is a group represented by formula (II) of the specification having a urethane skeleton and having a (meth)acryloyl group at an end. In formula (II), R2 is hydrogen or a methyl group, and n is an integer of 0 or 1. The molecular weight of the silicon compound (a) is 500 to 699.Type: GrantFiled: March 31, 2015Date of Patent: January 29, 2019Assignee: JNC CORPORATIONInventors: Akiko Yoda, Koji Ohguma, Mikio Yamahiro
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Patent number: 9857505Abstract: A laminate body (1) is provided with a transparent substrate (10) and a refractive layer (11) which refracts incident light towards the top of the substrate (10). The refractive layer (11) contains, at least, one kind of fluorine compound (ss) selected from a group consisting of fluoro-silsesquioxane and fluoro-silsesquioxane polymers, and a resin (pl) having a refractive index higher than that of the aforementioned fluorine compound (ss). Of the side of the substrate (10) (the side of the back surface s2) and the side opposite thereof (the side of the front surface s1), the concentration of the fluorine compound (ss) in the refractive layer (11) is higher on said side opposite (the side of the front surface s1), and the refractive layer (11) forms a graded structure layer of high refractive indices and low refractive indices inside the layer.Type: GrantFiled: October 13, 2011Date of Patent: January 2, 2018Assignee: JNC CORPORATIONInventors: Yuka Takahashi, Takuro Tanaka, Yukio Hirano, Koji Ohguma, Mikio Yamahiro
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Patent number: 9860981Abstract: Provided is a transparent conductive film having multilayer structure, and inconspicuous pattern shape and good visibility. The film includes: transparent base 11 formed of film-like polymer resin; first hard coat layer 12 laminated on the base 11; first transparent dielectric layer 13 laminated as required on the layer 12; and first transparent conductive layer 14 laminated on the layer 13. The base 11 has a film thickness of 2 to 250 micrometers. The layer 12 is formed of hardening resin containing inorganic oxide, with refractive index: 1.40 to 1.90 and film thickness: 0.5 to 6 micrometers. The layer 13 is formed of inorganic substance, with refractive index: 1.30 to 1.50 and film thickness: 10 to 50 nanometers. The layer 14 is formed of at least one kind of inorganic oxide, metal and carbon, and patterned, and has a film thickness of 10 nanometers to 2 micrometers.Type: GrantFiled: July 5, 2011Date of Patent: January 2, 2018Assignee: JNC CORPORATIONInventors: Takuro Tanaka, Yasuhiko Nakagawa, Hiroyuki Iizuka, Koji Ohguma, Mikio Yamahiro
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Patent number: 9751286Abstract: Provided is a multi-layered weather-resistant multilayer film that exhibits good substrate adhesion, wherein curing problems are avoided, bleed-out is minimized, yellowing is reduced, and weather-resistance is improved. The weather-resistant multilayer film 10 is provided with the following: a transparent film-like substrate C; a UV-absorbing resin layer B laminated on the substrate C and containing a UV absorber; and a first cured resin layer A laminated on the UV-absorbing resin layer B. The first cured resin layer A has a thickness of 1.0 to 10 ?m. The UV-absorbing resin layer B has a thickness of 0.5 to 5 ?m. The UV-absorbing resin layer B has an absorption wavelength of 200 to 500 nm.Type: GrantFiled: July 2, 2012Date of Patent: September 5, 2017Assignee: JNC CORPORATIONInventors: Akiko Yoda, Kenya Ito, Koji Ohguma, Mikio Yamahiro
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Publication number: 20170226385Abstract: The invention of the present application is a laminate in which thermoplastic polyurethane is used, excellent antifouling and adhesion properties are obtained, and glue residue is minimized. The laminate is provided with a substrate film formed from thermoplastic polyurethane, and an adhesive layer formed on one surface side of the substrate film. The substrate film has a surface layer on the opposite side of the first surface, a mixture of the thermoplastic polyurethane and a curable resin composition being present in the surface layer. The content ratio of the curable resin composition is configured so as to gradually decrease from the surface of the surface layer towards the interior of the substrate film. The curable resin composition contains at least one fluorine compound selected from the group consisting of fluorosilsesquioxane and fluorosilsesquioxane polymers, and a curable resin. The adhesive layer has a surface roughness of 350-750 nm.Type: ApplicationFiled: July 14, 2015Publication date: August 10, 2017Applicants: JNC CORPORATION, SUMIRON CO., LTD.Inventors: SOICHIRO HIRAKI, KOJI OHGUMA, MIKIO YAMAHIRO, TARO MAGATANI, SHIGETAKA IKEMOTO
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Publication number: 20170015817Abstract: A compound capable of increasing the scratch resistance of, for instance, a hard-coat agent and a resin composition for a coating agent containing the compound are shown. The silicon compound of the present application is a silicon compound (a) represented by formula (I), R1 is a C3 or C4 alkylene group, X is a group selected from the group consisting of formula (II) to formula (III) of the specification, n is an integer of 0 or 1, Y is a group having a (meth)acrylate group selected from the group consisting of formula (IV) to formula (VI) of the specification, and R2 is hydrogen or a methyl group. If the silicon compound (a) and a cured resin are used together, then scratch resistance thought to be obtained from stress relief can be significantly increased.Type: ApplicationFiled: March 31, 2015Publication date: January 19, 2017Applicant: JNC CORPORATIONInventors: AKIKO YODA, KOJI OHGUMA, MIKIO YAMAHIRO
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Publication number: 20170015834Abstract: A compound capable of increasing the scratch resistance of, for instance, a hard-coat agent and a resin composition for a coating agent containing the compound are shown. The resin composition for a coating agent of the present application contains: a silicon compound (a) represented by formula (I) of the specification; and a curable resin (b). In formula (I), R1 is a C3 or C4 alkylene group, and X is a group represented by formula (II) of the specification having a urethane skeleton and having a (meth)acryloyl group at an end. In formula (II), R2 is hydrogen or a methyl group, and n is an integer of 0 or 1. The molecular weight of the silicon compound (a) is 500 to 699.Type: ApplicationFiled: March 31, 2015Publication date: January 19, 2017Applicant: JNC CORPORATIONInventors: AKIKO YODA, KOJI OHGUMA, MIKIO YAMAHIRO
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Patent number: 9375867Abstract: Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The IMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.Type: GrantFiled: June 18, 2012Date of Patent: June 28, 2016Assignee: JNC CORPORATIONInventors: Kenya Ito, Koji Ohguma, Takuro Tanaka, Yuka Takahashi, Aki Kuromatsu, Mikio Yamahiro
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Patent number: 8840992Abstract: The curable resin composition of the present invention contains inorganic particles and a curable resin. The inorganic particles includes an inorganic particle (a-1) having a Mohs hardness of 7 or more and an average particle diameter of 1 ?m or less, an inorganic particle (a-2) having a Mohs hardness of 4 or more to less than 7 and an average particle diameter of 1 ?m or less, and an inorganic particle (a-3) having a Mohs hardness of less than 4 and an average particle diameter of 1 ?m or less. The curable resin is at least one selected from a group consisting of a thermosetting resin and an active energy ray-curable resin.Type: GrantFiled: October 20, 2010Date of Patent: September 23, 2014Assignee: JNC CorporationInventors: Hiroyuki Iizuka, Kenya Ito, Koji Ohguma, Mikio Yamahiro
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Publication number: 20140141223Abstract: Provided is a multi-layered weather-resistant multilayer film that exhibits good substrate adhesion, wherein curing problems are avoided, bleed-out is minimized, yellowing is reduced, and weather-resistance is improved. The weather-resistant multilayer film 10 is provided with the following: a transparent film-like substrate C; a UV-absorbing resin layer B laminated on the substrate C and containing a UV absorber; and a first cured resin layer A laminated on the UV-absorbing resin layer B. The first cured resin layer A has a thickness of 1.0 to 10 ?m. The UV-absorbing resin layer B has a thickness of 0.5 to 5 ?m. The UV-absorbing resin layer B has an absorption wavelength of 200 to 500 nm.Type: ApplicationFiled: July 2, 2012Publication date: May 22, 2014Applicant: JNC CORPORATIONInventors: Akiko Yoda, Kenya Ito, Koji Ohguma, Mikio Yamahiro
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Publication number: 20140113115Abstract: Provided is a transfer film for in-mold molding which is superior in solvent resistance, heat resistance, durability, blocking resistance, and moldability, and is capable of suppressing the generation of gate flow, and also provided is a method for producing such a film. The film is provided with: a transfer layer (11) which is to be transferred to an in-mold molded body and which is to be cured when irradiated with active energy rays after the transfer; and a film shaped substrate (L0). The transfer layer (11) comprises an IMD layer (L2) laminated on the substrate (L0) and to be arranged on the outermost surface of the molded body after the in-mold molding. The TMD layer (L2) is constituted by a mixture composition containing at least one active-energy curable resin and at least one thermosetting resin.Type: ApplicationFiled: June 18, 2012Publication date: April 24, 2014Applicant: JNC CORPORATIONInventors: Kenya Ito, Koji Ohguma, Takuro Tanaka, Yuka Takahashi, Aki Kuromatsu, Mikio Yamahiro
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Publication number: 20130258482Abstract: A laminate body (1) is provided with a transparent substrate (10) and a refractive layer (11) which refracts incident light towards the top of the substrate (10). The refractive layer (11) contains, at least, one kind of fluorine compound (ss) selected from a group consisting of fluoro-silsesquioxane and fluoro-silsesquioxane polymers, and a resin (pl) having a refractive index higher than that of the aforementioned fluorine compound (ss). Of the side of the substrate (10) (the side of the back surface s2) and the side opposite thereof (the side of the front surface s1), the concentration of the fluorine compound (ss) in the refractive layer (11) is higher on said side opposite (the side of the front surface s1), and the refractive layer (11) foams a graded structure layer of high refractive indices and low refractive indices inside the layer.Type: ApplicationFiled: October 13, 2011Publication date: October 3, 2013Applicant: JNC CORPORATIONInventors: Yuka Takahashi, Takuro Tanaka, Yukio Hirano, Koji Ohguma, Mikio Yamahiro
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Patent number: 8445613Abstract: A polymer and a treating agent (such as a surface-treating agent) are provided that have excellent characteristics in such properties as water repellency, oil repellency, antifouling property and charge controlling property. The polymer contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group, or contains a structural unit derived from fluorosilsesquioxane having an addition polymerizable group and a structural unit derived from organopolysiloxane having an addition polymerizable group. The treating agent contains the polymer. An article treated with the treating agent is also provided.Type: GrantFiled: March 21, 2008Date of Patent: May 21, 2013Assignee: JNC CorporationInventors: Kenya Ito, Hisao Oikawa, Koji Ohguma, Mikio Yamahiro
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Publication number: 20130113757Abstract: Provided is a transparent conductive film having multilayer structure, and inconspicuous pattern shape and good visibility. The film includes: transparent base 11 formed of film-like polymer resin; first hard coat layer 12 laminated on the base 11; first transparent dielectric layer 13 laminated as required on the layer 12; and first transparent conductive layer 14 laminated on the layer 13. The base 11 has a film thickness of 2 to 250 micrometers. The layer 12 is formed of hardening resin containing inorganic oxide, with refractive index: 1.40 to 1.90 and film thickness: 0.5 to 6 micrometers. The layer 13 is formed of inorganic substance, with refractive index: 1.30 to 1.50 and film thickness: 10 to 50 nanometers. The layer 14 is formed of at least one kind of inorganic oxide, metal and carbon, and patterned, and has a film thickness of 10 nanometers to 2 micrometers.Type: ApplicationFiled: July 5, 2011Publication date: May 9, 2013Applicant: JNC CORPORATIONInventors: Takuro Tanaka, Yasuhiko Nakagawa, Hiroyuki Iizuka, Koji Ohguma, Mikio Yamahiro
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Patent number: 8293442Abstract: Disclosed is a resin particle having a volume average particle diameter of 10 nm to 500 nm, obtained by polymerizing an addition polymerizable monomer containing a silsesquioxane (a) represented by Formula (I) or by copolymerizing the silsesquioxane (a) with an addition polymerizable monomer (b), where R1 to R7 each independently represent a group selected from the group consisting of hydrogen, alkyl having 1 to 40 carbon atoms, substituted or unsubstituted aryl, and substituted or unsubstituted arylalkyl; any hydrogen in the alkyl group is optionally substituted by fluorine and any —CH2— is optionally substituted by —O—, —CH?CH—, cycloalkylene or cycloalkenylene; any hydrogen in alkylene in the arylalkyl group is optionally substituted by fluorine and any —CH2— is optionally substituted by —O— or —CH?CH—; and A1 represents an addition polymerizable functional group.Type: GrantFiled: September 22, 2009Date of Patent: October 23, 2012Assignees: Ricoh Company, Ltd., JNC CorporationInventors: Masaki Watanabe, Naohito Shimota, Hiroshi Yamashita, Naohiro Watanabe, Tsuneyasu Nagatomo, Tsuyoshi Sugimoto, Shinichi Wakamatsu, Kenya Itoh, Mikio Yamahiro
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Publication number: 20110189470Abstract: The curable resin composition of the present invention contains inorganic particles and a curable resin. The inorganic particles includes an inorganic particle (a-1) having a Mohs hardness of 7 or more and an average particle diameter of 1 ?m or less, an inorganic particle (a-2) having a Mohs hardness of 4 or more to less than 7 and an average particle diameter of 1 ?m or less, and an inorganic particle (a-3) having a Mohs hardness of less than 4 and an average particle diameter of 1 ?m or less. The curable resin is at least one selected from a group consisting of a thermosetting resin and an active energy ray-curable resin.Type: ApplicationFiled: October 20, 2010Publication date: August 4, 2011Applicant: CHISSO CORPORATIONInventors: Hiroyuki Iizuka, Kenya Ito, Koji Ohguma, Mikio Yamahiro
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Patent number: 7989560Abstract: A polymer containing: a constitutional unit A that is derived from fluorosilsesquioxane having one addition polymerizable functional group in a molecule; a constitutional unit B that is derived from organopolysiloxane having an addition polymerizable functional group; and a constitutional unit C that is derived from an addition polymerizable functional monomer containing a group having active hydrogen, and optionally containing a constitutional unit D that is derived from an addition polymerizable monomer other than the fluorosilsesquioxane having one addition polymerizable functional group in a molecule, the organopolysiloxane having an addition polymerizable functional group and the addition polymerizable monomer containing a group having active hydrogen.Type: GrantFiled: December 17, 2007Date of Patent: August 2, 2011Assignee: Chisso CorporationInventors: Hisao Oikawa, Koji Ohguma, Kenya Ito, Mikio Yamahiro
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Patent number: 7964692Abstract: A polymer represented by Formula (7): wherein all variables are defined in the specification, including P1 which is a polymer chain obtained by polymerizing an addition-polymerizable monomer, which makes it possible to control the structure of the polymer as a molecular aggregate.Type: GrantFiled: January 7, 2009Date of Patent: June 21, 2011Assignee: JNC CorporationInventors: Mikio Yamahiro, Hisao Oikawa, Kenya Ito, Yasuhiro Yamamoto, Masami Tanaka, Nobumasa Ootake, Kenichi Watanabe, Kohji Ohno, Yoshinobu Tsujii, Takeshi Fukuda