Abstract: A bottom surface of a housing recess of a turbine housing includes a close attachment portion in a continuous annular land shape, which is located radially outside a fitting recess. The close attachment portion is closely attached to a portion radially outside first support holes in a surface of a shroud ring opposite from its facing surface, by a fastening force of attachment bolts. The first support holes in the shroud ring communicate with an outlet side of a turbine impeller through a connection path and a cutout.

Abstract: A fixed vane-type turbocharger is provided with a fixed vane in a conduit between a bearing housing and a turbine housing. The fixed vane is configured by a movable member disposed on one of the mutually opposing front faces of the bearing housing and the turbine housing so as to be capable of forward and backward movement, and by vanes which are fixed to the front face of the movable member. A pressing member presses the movable member so that the distal ends of the vanes are brought into pressure contact between the rear face of the movable member and either the bearing housing or the turbine housing with the other opposing front face of these. The pressing member contacts the rear face of the movable member within a range in the radial direction where the vanes are disposed, and presses within this range.

Abstract: Different attack angles including a first attack angle and a second attack angle are set to turbine blades on a first axial side and a second axial side according to respective relative inflow angles of an exhaust gas. In other words, the first attack angle is set on the first axial side according to a relative inflow angle of an exhaust gas blown against the turbine blades through a first scroll passage, and the second attack angle is set on the second axial side according to a relative inflow angle of an exhaust gas blown against the turbine blades through a second scroll passage. An average value of the first attack angle is larger than an average value of the second attack angle.

Abstract: A bottom surface of a housing recess of a turbine housing includes a close attachment portion in a continuous annular land shape, which is located radially outside a fitting recess. The close attachment portion is closely attached to a portion radially outside first support holes in a surface of a shroud ring opposite from its facing surface, by a fastening force of attachment bolts. The first support holes in the shroud ring communicate with an outlet side of a turbine impeller through a connection path and a cutout.

Abstract: The present invention relates to a fixed vane-type turbocharger provided with a fixed vane (15) in a conduit (9) between a bearing housing and a turbine housing (4). The fixed vane (15) is configured by a movable member (11) which is disposed on one of the mutually opposing front faces of the bearing housing and the turbine housing (4) so as to be capable of forward and backward movement, and by vanes (14) which are fixed to the front face of the movable member (11). A pressing means (16) is provided which presses the movable member (11) so that the distal ends of the vanes (14) are brought into pressure contact between the rear face of the movable member (11) and either the bearing housing or the turbine housing (4) with the other opposing front face of these. The pressing means (16) contacts the rear face of the movable means (11) within a range in the radial direction where the vanes (14) are disposed, and conducts pressing within this range.

Abstract: An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample can be achieved because a linear cross-sectional configuration can be created in an optical system with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam from a laser light source at a prescribed angle by means of rotating means even when the beam pattern of the beam from the laser light source has a non-uniform intensity distribution.

Abstract: A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.

Abstract: An object of the present invention is to provide a laser annealing method and apparatus capable of performing uniform beam emission. By means of the present invention, uniform beam application to a sample (50) can be achieved because a linear cross-sectional configuration can be created in an optical system (57) with a beam having a Gaussian distribution while areas of strong light intensity are avoided by rotating the beam (41) from a laser light source at a prescribed angle by means of rotating means (42) even when the beam pattern of the beam (41) from the laser light source has a nonuniform intensity distribution.

Abstract: A laser irradiation apparatus having a low running cost compared to the conventional, and a laser irradiation method using the laser irradiation apparatus, are provided. Crystal grains having a size in the same order as, or greater than, conventional grains are formed. The cooling speed of a semiconductor film is made slower, and it becomes possible to form crystal grains having a grain size in the same order as, or greater than, the size of grains formed in the case of irradiating laser light having a long output time to the semiconductor film. This is achieved by delaying one laser light with respect to another laser light, combining the laser lights, and performing irradiation to the semiconductor film in the case of irradiating laser light using a solid state laser as a light source, which has a short output time.