Patents by Inventor Milos Toth
Milos Toth has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230341341Abstract: Practical implementation of Particle-Induced X-ray Emission (PIXE) on a focused ion beam apparatus or on a dual-beam apparatus comprising both focused-ion beam and scanning microscopy capabilities is described. Accordingly, an analytical method comprises: directing and focusing a beam of ions comprising a mixture of protons and non-hydrogen ions onto a sample, wherein the kinetic energy of ions of the mixture is not greater than 50 kilo-electron-Volts (keV); and detecting and measuring X-rays that are emitted from the sample in response to the impingement of the protons and non-hydrogen ions onto the sample.Type: ApplicationFiled: April 25, 2022Publication date: October 26, 2023Applicant: FEI COMPANYInventors: Daniel TOTONJIAN, Aurelien Philippe Jean Maclou BOTMAN, Milos TOTH
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Patent number: 11377740Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.Type: GrantFiled: December 10, 2019Date of Patent: July 5, 2022Assignee: FEI CompanyInventors: James Bishop, Toan Trong Tran, Igor Aharonovich, Charlene Lobo, Milos Toth
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Patent number: 11152189Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.Type: GrantFiled: March 18, 2020Date of Patent: October 19, 2021Assignee: FEI CompanyInventors: James Bishop, Daniel Totonjian, Chris Elbadawi, Charlene Lobo, Milos Toth
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Publication number: 20210296086Abstract: Various methods and systems are provided for imaging a sample under low vacuum with a charged particle beam. A magnetic field is provided in a detection area of the detector. Gas and plasma are provided in the detection area while detecting charged particles emitted from the sample. Sample image is formed based on the detected charged particles.Type: ApplicationFiled: March 18, 2020Publication date: September 23, 2021Applicant: FEI CompanyInventors: James Bishop, Daniel Totonjian, Chris Elbadawi, Charlene Lobo, Milos Toth
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Patent number: 10777383Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.Type: GrantFiled: July 6, 2018Date of Patent: September 15, 2020Assignee: FEI CompanyInventors: Cameron James Zachreson, Dolf Timmerman, Milos Toth, Jorge Filevich, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Publication number: 20200190669Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.Type: ApplicationFiled: December 10, 2019Publication date: June 18, 2020Applicant: FEI CompanyInventors: James Bishop, Toan Trong Tran, Igor Aharonovich, Charlene Lobo, Milos Toth
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Patent number: 10538844Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.Type: GrantFiled: September 11, 2015Date of Patent: January 21, 2020Assignee: FEI CompanyInventors: James Bishop, Toan Trong Tran, Igor Aharonovich, Charlene Lobo, Milos Toth
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Patent number: 10501851Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.Type: GrantFiled: June 21, 2016Date of Patent: December 10, 2019Assignee: FEI CompanyInventors: Mehran Kianinia, Olga Shimoni, Igor Aharonovich, Charlene Lobo, Milos Toth, Steven Randolph, Clive D. Chandler
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Patent number: 10493559Abstract: Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.Type: GrantFiled: July 8, 2009Date of Patent: December 3, 2019Assignee: FEI CompanyInventors: Marcus Straw, David H. Narum, Milos Toth, Mark Utlaut, Guido Knippels, Gerardus Nicolaas Anne Van Veen
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Patent number: 10304658Abstract: Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.Type: GrantFiled: July 17, 2015Date of Patent: May 28, 2019Assignee: FEI CompanyInventors: Aiden Martin, Milos Toth
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Publication number: 20190013178Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.Type: ApplicationFiled: July 6, 2018Publication date: January 10, 2019Applicant: FEI CompanyInventors: Cameron James Zachreson, Dolf Timmerman, Milos Toth, Jorge Filevich, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Patent number: 9951417Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. Once the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.Type: GrantFiled: October 6, 2014Date of Patent: April 24, 2018Assignee: FEI CompanyInventors: Aurélien Philippe Jean Maclou Botman, Steven Randolph, Milos Toth
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Publication number: 20170327951Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.Type: ApplicationFiled: June 21, 2016Publication date: November 16, 2017Applicant: FEI CompanyInventors: Mehran Kianinia, Olga Shimoni, Igor Aharonovich, Charlene Lobo, Milos Toth, Steven Randolph, Clive D. Chandler
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Patent number: 9812286Abstract: A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber.Type: GrantFiled: December 22, 2015Date of Patent: November 7, 2017Assignee: FEI CompanyInventors: David H. Narum, Milos Toth, Steven Randolph, Aurelien Philippe Jean Maclou Botman
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Patent number: 9799490Abstract: A cold trap is provided to reduce contamination gases that react with the beam during operations that use a process gas. The cold trap is set to a temperature that condenses the contamination gas but does not condense the process gas. Cold traps may be used in the sample chamber and in the gas line.Type: GrantFiled: March 31, 2015Date of Patent: October 24, 2017Assignee: FEI CompanyInventors: Aiden Martin, Geoff McCredie, Milos Toth
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Patent number: 9679741Abstract: An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photoelectron yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable mirror.Type: GrantFiled: November 9, 2010Date of Patent: June 13, 2017Assignee: FEI CompanyInventors: Libor Novak, Marek Uncovsky, Milos Toth, Martin Cafourek, William Parker, Marcus Straw, Mark Emerson
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Patent number: 9633816Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.Type: GrantFiled: May 18, 2015Date of Patent: April 25, 2017Assignee: FEI CompanyInventors: Toby Shanley, John Scott, Milos Toth
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Publication number: 20170073814Abstract: Methods and systems for direct lithographic pattern definition based upon electron beam induced alteration of the surface chemistry of a substrate are described. The methods involve an initial chemical treatment for global definition of a specified surface chemistry (SC). Electron beam induced surface reactions between a gaseous precursor and the surface are then used to locally alter the SC. High resolution patterning of stable, specified surface chemistries upon a substrate can thus be achieved. The defined patterns can then be utilized for selective material deposition via methods which exploit the specificity of certain SC combinations or by differences in surface energy. It is possible to perform all steps in-situ without breaking vacuum.Type: ApplicationFiled: September 11, 2015Publication date: March 16, 2017Applicant: FEI CompanyInventors: James Bishop, Toan Trong Tran, Igor Aharonovich, Charlene Lobo, Milos Toth
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Publication number: 20160343537Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.Type: ApplicationFiled: May 18, 2015Publication date: November 24, 2016Applicant: FEI CompanyInventors: Toby Shanley, John Scott, Milos Toth
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Publication number: 20160293380Abstract: A cold trap is provided to reduce contamination gases that react with the beam during operations that use a process gas. The cold trap is set to a temperature that condenses the contamination gas but does not condense the process gas. Cold traps may be used in the sample chamber and in the gas line.Type: ApplicationFiled: March 31, 2015Publication date: October 6, 2016Applicant: FEI CompanyInventors: Aiden Martin, Geoff McCredie, Milos Toth