Patents by Inventor Min-Hao Chung

Min-Hao Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240169167
    Abstract: The present disclosure provides a method for anti-tampering apparatus servicing data implemented by a calculation device connected to a target device, the method comprising: identifying a contract identification code and obtaining a contract package file and a contract authentication code from at least one remote device; obtaining a microservice file corresponding to the target device from the remote device when a device embedded code of the calculation device is matching the contract authentication code; performing the microservice file to enable the target device according to the contract package file and generate an execution report; publishing the execution report to the remote device to obtain an acceptance certification code; and combining and hashing the device embedded code, the contract authentication code and the acceptance certification code to generate a hash value, and sending the hash value to a blockchain.
    Type: Application
    Filed: December 22, 2022
    Publication date: May 23, 2024
    Inventors: Min-Hao LI, Yu-Chiao WANG, Ya-Ping LEE, Wei-Der CHUNG, Jhy-Ping WU
  • Publication number: 20110049554
    Abstract: A package base structure for packaging a light-emitting element and a related manufacturing process are provided. The package base structure includes a semiconductor substrate having a top surface, a receiving space in the top surface and defined by slant surfaces, and a micro diffractive optical element on one of the slant surfaces. To produce the package base structure, a first etching mask with a first etching window is formed on the top surface. The etching window has a sidewall oriented at a bias angle with respect to a specific equivalent crystallographic orientation of the semiconductor substrate. Then, a selective anisotropic etching procedure is performed through the first etching window to form the slant surfaces on the semiconductor substrate. Afterwards, the micro diffractive optical element is formed on the slant surface for collimating or focusing a light beam emitted from the light-emitting element.
    Type: Application
    Filed: August 27, 2010
    Publication date: March 3, 2011
    Applicant: NATIONAL CENTRAL UNIVERSITY
    Inventors: Mao-Jen Wu, Hsiao-Chin Lan, An-Nong Wen, Chih-Hung Hsu, Hsu-Liang Hsiao, Chia-Chi Chang, Chia-Yu Lee, Siou-Ping Chen, Min-Hao Chung