Patents by Inventor Min Young Lim

Min Young Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9790369
    Abstract: Provided is a complex material that includes a first metal deposition layer, a first thermosetting resin layer positioned on one side of the first metal deposition layer, and a second thermosetting resin layer positioned on the other side of the first metal deposition layer.
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: October 17, 2017
    Assignee: Lotte Advanced Materials Co., Ltd.
    Inventors: Young-Sin Kim, Kang-Yeol Park, Young-Chul Kwon, Seon-Ae Lee, Min-Young Lim
  • Patent number: 9637630
    Abstract: A resin composition includes (A) a thermoplastic resin, (B) a first metal layer-resin composite particle including a first metal layer and first thermosetting resin coating layers positioned on the first metal layer and (C) a second metal layer-resin composite particle including a second metal layer and second thermosetting resin coating layers positioned on the second metal layer, and a molded article using the same.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: May 2, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Seon-Ae Lee, Young-Sin Kim, Min-Young Lim, Kang-Yeol Park
  • Patent number: 9353253
    Abstract: A low gloss thermoplastic resin composition can have improved scratch resistance, and includes a silicon compound-grafted aromatic vinyl-vinyl cyanide-based copolymer to improve mechanical physical properties such as scratch resistance, and the like, and to implement low gloss property. The low gloss composition can be used in a vehicle interior material.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: May 31, 2016
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Gyeong Ha Chae, Min Young Lim, Young Chul Kwon, Kang Yeol Park, Bo Eun Kim, Joo Hyun Jang, Jae Won Heo
  • Publication number: 20150376396
    Abstract: A resin composition includes (A) a thermoplastic resin, (B) a first metal layer-resin composite particle including a first metal layer and first thermosetting resin coating layers positioned on the first metal layer and (C) a second metal layer-resin composite particle including a second metal layer and second thermosetting resin coating layers positioned on the second metal layer, and a molded article using the same.
    Type: Application
    Filed: September 2, 2013
    Publication date: December 31, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Seon-Ae LEE, Young-Sin KIM, Min-Young LIM, Kang-Yeol PARK
  • Publication number: 20150353736
    Abstract: Provided is a complex material that includes a first metal deposition layer, a first thermosetting resin layer positioned on one side of the first metal deposition layer, and a second thermosetting resin layer positioned on the other side of the first metal deposition layer.
    Type: Application
    Filed: May 2, 2013
    Publication date: December 10, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Young-Sin KIM, Kang-Yeol PARK, Young-Chul KWON, Seon-Ae LEE, Min-Young LIM
  • Publication number: 20150183974
    Abstract: A low gloss thermoplastic resin composition can have improved scratch resistance, and includes a silicon compound-grafted aromatic vinyl-vinyl cyanide-based copolymer to improve mechanical physical properties such as scratch resistance, and the like, and to implement low glass property. The low gloss composition can be used in a vehicle interior material.
    Type: Application
    Filed: December 11, 2014
    Publication date: July 2, 2015
    Inventors: Gyeong Ha CHAE, Min Young LIM, Young Chul KWON, Kang Yeol PARK, Bo Eun KIM, Joo Hyun JANG, Jae Won HEO
  • Patent number: 8951713
    Abstract: An alkali-soluble resin is provided. The alkali-soluble resin is prepared using a polyfunctional thiol compound as a chain transfer agent. The alkali-soluble resin has a lower viscosity than a resin having the same molecular weight. Further provided is a negative-type photosensitive resin composition comprising the alkali-soluble resin as a binder resin. The use of the alkali-soluble resin lowers the overall viscosity of the photosensitive resin composition to effectively reduce the height of a stepped portion of a photoresist pattern using a small amount of the photosensitive resin composition.
    Type: Grant
    Filed: January 15, 2013
    Date of Patent: February 10, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Kwang Han Park, Min Young Lim, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8822132
    Abstract: A colored dispersion according to the present invention comprises a resin including monomers of Formulas 1 to 4, as a binder resin. Accordingly, a photoresist composition for a black matrix of a high light shielding property, which has the dispersion stability of the colored dispersion according to the present invention, could be provided, and a black matrix of high sensibility having an uniform process characteristic while maintaining a high light-shielding property could be produced.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Chang Choi, Kyung-Soo Choi, Ho-Chan Ji, Geun-Young Cha, Min-Young Lim, Sung-Hyun Kim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo
  • Publication number: 20140221547
    Abstract: Disclosed are a thermoplastic resin composition including (A) a transparent thermoplastic resin; and (B) a metallic particle including a glass flake coated with metal oxide, and an article using the same.
    Type: Application
    Filed: July 25, 2013
    Publication date: August 7, 2014
    Applicant: Cheil Industries Inc.
    Inventors: Young-Sin KIM, Kang-Yeol PARK, Seon-Ae LEE, Min-Young LIM
  • Patent number: 8535874
    Abstract: Provided is a novel fluorene-based polymer having urethane bonds and a method for preparing the fluorene-based polymer. According to the method, a diol compound is condensed with a diisocyanate instead of an acid dianhydride, and then an acid anhydride is reacted with the reaction mixture to introduce desired acid groups into the final polymer. Further provided is a negative-type photosensitive resin composition comprising of the fluorene-based polymer as a binder resin. The composition exhibits improved chemical resistance, good development margin and high sensitivity due to presence of the acid groups despite the low molecular weight of the fluorene-based polymer.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: September 17, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Sung Hyun Kim, Dong Chang Choi, Kyung Soo Choi, Ho Chan Ji, Min Young Lim, Geun Young Cha, Yoon Hee Heo, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8501835
    Abstract: An ink composition for roll printing is provided. The ink composition uses a solvent system having an evaporation rate (Vt) of at least 0.1 mg/cm2·min and an absorption rate (St) into a blanket of less than 3.412 mg/cm2·min. The use of the highly volatile solvent system can minimize swelling of the blanket without impairing the dispersibility of a pigment in the ink composition. Therefore, the uniformity of a pattern formed using the ink composition can be maintained and the formation of defects by the solvent system can be minimized.
    Type: Grant
    Filed: August 27, 2008
    Date of Patent: August 6, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Dae Hyun Kim, JinWoo Cho, Dong Myung Shin, Ji Su Kim, Min Young Lim, Sung Hyun Kim
  • Patent number: 8361696
    Abstract: The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
    Type: Grant
    Filed: January 15, 2008
    Date of Patent: January 29, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Keon-Woo Lee, Sung-Hyun Kim, Chang-Ho Cho, Dong-Kung Oh, Min-Young Lim, Ji-Heum Yoo, Sang-Kyu Kwak
  • Patent number: 8357483
    Abstract: The present invention relates to a photosensitive resin composition that includes a polymer prepared by using a macromonomer as an alkali soluble resin. The photosensitive resin composition is used for various types of purposes such as a photoresist for preparing a color filter, an overcoat photoresist, a column spacer, and an insulating material having a light blocking property, and improves physical properties such as residue or not, chemical resistance, and heat resistance of the photoresist.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: January 22, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Han-Soo Kim, Min-Young Lim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim, Kwang-Han Park
  • Patent number: 8338559
    Abstract: The present invention relates to a fluorene-based resin polymer having a repeating unit of Formula 1 and a method for preparing the same. The fluorene-based resin polymer has a high molecular weight and low acid value, and has an excellent developing property, adhesive property, and stability.
    Type: Grant
    Filed: January 21, 2008
    Date of Patent: December 25, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Yoon-Hee Heo, Kyung-Soo Choi, Han-Soo Kim, Min-Young Lim, Ji-Heum Yoo
  • Patent number: 8323533
    Abstract: The present invention relates to a composition for preparing a curable resin, comprising a) a compound represented by Formula 1; b) glycidyl (meth)acrylate; c) acid monoanhydride; and d) a solvent, a curable resin manufactured by the composition, and an ink composition comprising the same. The curable resin has a low viscosity and excellent flow properties, and the ink composition is excellent in terms of storage stability, heat resistance and chemical resistance.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: December 4, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Min-Young Lim, Jae-Joon Kim, Mi-Ae Kim, Dae-Hyun Kim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Patent number: 8304169
    Abstract: The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.
    Type: Grant
    Filed: February 11, 2008
    Date of Patent: November 6, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Min-Young Lim, Han-Soo Kim, Yoon-Hee Heo, Ji-Heum Yoo, Sung-Hyun Kim
  • Patent number: 8252879
    Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: August 28, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Han Soo Kim, Min Young Lim, Sung Hyun Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
  • Patent number: 8153751
    Abstract: Disclosed is a multifunctional urethane monomer prepared by reacting (a) an epoxy compound having two or more epoxy groups, (b) a diol compound having an acidic group and (c) a compound having an ethylenically unsaturated group and an isocyanate group with one another. The photosensitive resin composition comprising the multifunctional urethane monomer has low viscosity, superior sensitivity, excellent chemical resistance and heat-resistance and high development margin.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: April 10, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Yoon Hee Heo, Min Young Lim, Ho Chan Ji, Sung-Hyun Kim, Han Soo Kim, Sun Hwa Kim
  • Patent number: 8133962
    Abstract: A heat-curable ink composition and a color filter produced using the ink composition are provided. The ink composition and the color filter are highly resistant to heat and chemicals due to the use of a polyester resin prepared by polycondensation. In addition, unreacted anhydride groups are removed using a monohydric alcohol in the preparation of the ink composition to make the ink composition and the color filter very stable during storage.
    Type: Grant
    Filed: August 26, 2008
    Date of Patent: March 13, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Dae Hyun Kim, Han Soo Kim, Mi Ae Kim, Dong Myung Shin, Jae Joon Kim, Jin Woo Cho, Ji Su Kim, Mi Kyoung Kim, Min A. Yu, Min Young Lim, Sung Hyun Kim
  • Patent number: RE45219
    Abstract: Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: October 28, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Heon Kim, Sung Ho Chun, Keon Woo Lee, Sung Joon Oh, Kyungjun Kim, Jungho Jo, Byung Hyun Lee, Min Young Lim, Hye Won Jeong