Patents by Inventor Min Yun

Min Yun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240031184
    Abstract: Disclosed are a method and an apparatus for an instant messaging service to provide a schedule service. A schedule management server according to an example embodiment includes receiving a schedule creating request, selecting any one of a first type of calendar belonging to a chatroom in which the schedule creating request is created and a second type of calendar belonging to a user account which creates the schedule creating request, according to a schedule type included in the schedule creating request; and creating a schedule corresponding to the selected type of calendar.
    Type: Application
    Filed: October 2, 2023
    Publication date: January 25, 2024
    Inventors: Jeong Min YUN, Moon Young JO, Yeon Jin LEE, Won Chul JEONG, Han Byeol CHOI, Bong Gyun KANG, Hyun Na PARK, Moon Seok PARK, Pyung Hwa CHOI, Dae Seong SHIN, Seung Uk JEONG, Hoi Moon JEONG, Won Iel YOO, Seo Yon CHOI
  • Publication number: 20240031185
    Abstract: Disclosed are a method and an apparatus for an instant messaging service to provide a schedule service. A schedule management server according to an example embodiment includes receiving a schedule creating request, selecting any one of a first type of calendar belonging to a chatroom in which the schedule creating request is created and a second type of calendar belonging to a user account which creates the schedule creating request, according to a schedule type included in the schedule creating request; and creating a schedule corresponding to the selected type of calendar.
    Type: Application
    Filed: October 2, 2023
    Publication date: January 25, 2024
    Inventors: Jeong Min YUN, Moon Young JO, Yeon Jin LEE, Won Chul JEONG, Han Byeol CHOI, Bong Gyun KANG, Hyun Na PARK, Moon Seok PARK, Pyung Hwa CHOI, Dae Seong SHIN, Seung Uk JEONG, Hoi Moon JEONG, Won Iel YOO, Seo Yon CHOI
  • Publication number: 20240029177
    Abstract: The present invention relates to a factory simulator-based scheduling system using reinforcement learning, which schedules a process by training a neural network agent that determines a next action when a current state of a workflow is given in a factory environment in which a plurality of processes having a precedence relationship with each other constitutes a workflow and products are produced when the processes in the workflow are performed, and there is provided a factory simulator-based scheduling system using reinforcement learning, the system comprising a neural network agent having at least one neural network that outputs, when a state of a factory workflow (hereinafter, referred to as a workflow state) is input, a next work to be processed in the workflow state, wherein the neural network is trained by a reinforcement learning method; a factory simulator for simulating the factory workflow; and a reinforcement learning module for simulating the factory workflow using the factory simulator, extracting
    Type: Application
    Filed: September 7, 2021
    Publication date: January 25, 2024
    Inventors: Young Min YUN, Ho Yeoul LEE
  • Publication number: 20240027653
    Abstract: Provided is an optical multilayer structure including a shatterproof layer including a polyimide resin including a siloxane structure and an adhesion promoting layer. Since the adhesion promoting layer and the shatterproof layer of the optical multilayer structure according to one implementation are connected by a chemical bond (imide bond), interlayer adhesiveness is high and durability is excellent. In addition, the optical multilayer structure according to one implementation has excellent heat resistance, so that curling is reduced to minimize substrate bending, has high surface hardness, so that mechanical properties are excellent, and has a low haze and is transparent, so that optical properties are excellent.
    Type: Application
    Filed: July 11, 2023
    Publication date: January 25, 2024
    Applicant: SK Innovation Co., Ltd.
    Inventors: Chun Ho Kim, Cheol Min Yun
  • Publication number: 20240019607
    Abstract: An optical multilayer structure including: a substrate; a shatterproof layer which is formed on at least one surface of the substrate and includes a polyimide film including a polyimide precursor, a polyimide, or a combination thereof including a structure of the following Chemical Formula 1, and inorganic particles; and a hard coating layer formed on the other surface of the substrate: wherein R1 and R2 are independently of each other C1-5 alkyl which is unsubstituted or substituted with one or more halogens; R3 and R4 are independently of each other C6-10 aryl which is unsubstituted or substituted with one or more halogens; L1 and L2 are independently of each other C1-10 alkylene; and x and y are independently of each other an integer of 1 or more.
    Type: Application
    Filed: May 24, 2023
    Publication date: January 18, 2024
    Inventors: Cheol Min Yun, Chun Ho Kim
  • Patent number: 11858886
    Abstract: Disclosed is a process for converting methane into value-added compounds. In this process, a gas mixture containing hydrogen as well as high-concentration acetylene formed through methane pyrolysis (e.g. non-oxidative coupling of methane) is selectively hydrogenated in the presence of a bimetallic supported catalyst. This process obtains ethylene from acetylene in the gas mixture while unreacted methane and hydrogen are recovered as byproducts and/or additionally recycled.
    Type: Grant
    Filed: October 26, 2022
    Date of Patent: January 2, 2024
    Assignee: SK Innovation Co., Ltd.
    Inventors: Dong Min Yun, Ju Hwan Im, Hee Soo Kim, Do Kyoung Kim, Dae Hyun Choo
  • Patent number: 11851565
    Abstract: Provided is a method of preparing a composition for forming a polyimide film which may significantly improve dispersibility of a pigment. Specifically, the method includes preparing a polyamic acid resin in the presence of a pigment dispersion including a blue-based inorganic pigment and a dispersing agent. In addition, an average particle size of the inorganic pigment in the pigment dispersion may be 10 to 100 nm.
    Type: Grant
    Filed: August 29, 2022
    Date of Patent: December 26, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Cheol Min Yun, Hye Jin Park
  • Patent number: 11856847
    Abstract: An organic light emitting display device is provided. The organic light emitting display device includes at least two or more light emitting parts between an anode and a cathode and each having a light emitting layer. At least one of the at least two or more light emitting parts includes an organic layer. The organic layer is formed of a compound comprising a functional group that reacts with alkali metals or alkali earth metals and a functional group with electron transport properties.
    Type: Grant
    Filed: January 31, 2023
    Date of Patent: December 26, 2023
    Assignee: LG DISPLAY CO., LTD.
    Inventors: Shinhan Kim, Dohan Kim, Min Yun, Seunghee Yoon
  • Patent number: 11847787
    Abstract: An image registration apparatus including at least one processor and configured to project, to a first model, a first image generated based on an image obtained from a first camera to generate a first intermediate image, to map the first intermediate image to a first output model to generate a first output image, to project, to a second model, a second image generated based on an image obtained from a second camera to generate a second intermediate image, to map the second intermediate image to a second output model to generate a second output image, and to determine a match rate between the first output image and the second output image and transform at least one of the first model and the second model based on a determined match rate and a preset reference match rate.
    Type: Grant
    Filed: November 12, 2021
    Date of Patent: December 19, 2023
    Assignee: HYUNDAI MOBIS CO., LTD.
    Inventor: Yeo Min Yun
  • Publication number: 20230380192
    Abstract: An semiconductor device may include a first conductive line; a second conductive line disposed to be spaced apart from the first conductive line; a variable resistance layer disposed between the first conductive line and the second conductive line; and an electrode layer which is disposed at least one of a first location between the first conductive lines and the variable resistance layer, or a second location between the variable resistance layer and the second conductive lines and includes a thickness dependent metal-insulator transition (TDMIT) material that exhibits an electrical resistance depending on a thickness of the TDMIT material.
    Type: Application
    Filed: December 14, 2022
    Publication date: November 23, 2023
    Inventor: Jong Min YUN
  • Publication number: 20230374344
    Abstract: Provided are polyimide precursor composition including a polyimide precursor including a siloxane structure, and inorganic particles, and an optical multilayer structure including a structure in which a polyimide shatterproof layer formed using the composition is formed on a substrate. The optical multilayer structure according to one implementation is less curled to minimize substrate bending and has significantly improved surface hardness, and thus, has excellent mechanical properties.
    Type: Application
    Filed: May 22, 2023
    Publication date: November 23, 2023
    Inventors: Cheol Min Yun, Chun Ho Kim
  • Patent number: 11817962
    Abstract: Disclosed are a method and an apparatus for an instant messaging service to provide a schedule service. A schedule management server according to an example embodiment includes receiving a schedule creating request, selecting any one of a first type of calendar belonging to a chatroom in which the schedule creating request is created and a second type of calendar belonging to a user account which creates the schedule creating request, according to a schedule type included in the schedule creating request; and creating a schedule corresponding to the selected type of calendar.
    Type: Grant
    Filed: December 14, 2021
    Date of Patent: November 14, 2023
    Assignee: KAKAO CORP.
    Inventors: Jeong Min Yun, Moon Young Jo, Yeon Jin Lee, Won Chul Jeong, Han Byeol Choi, Bong Gyun Kang, Hyun Na Park, Moon Seok Park, Pyung Hwa Choi, Dae Seong Shin, Seung Uk Jeong, Hoi Moon Jeong, Won Iel Yoo, Seo Yon Choi
  • Patent number: 11807730
    Abstract: Provided are a composition for forming a polyimide film for a cover window which may satisfy performance required for an advanced cover window, a method for preparing the same, and a use thereof. According to an implementation, a polyimide film for a cover window, which has excellent visibility without optical stain while colorless and transparent optical properties were not deteriorated and has excellent heat resistance and mechanical properties, and thus, is for use in optical applications, may be provided. In addition, a polyimide film for a cover window according to an implementation may be useful in various display devices.
    Type: Grant
    Filed: June 15, 2022
    Date of Patent: November 7, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Cheol Min Yun, Hye Jin Park
  • Publication number: 20230340202
    Abstract: The present disclosure relates to a polyamideimide film-forming composition, a method of preparing the same, and a use thereof. The polyamideimide film-forming composition according to one embodiment prevents deterioration of colorless and transparent optical properties and has excellent mechanical properties, and thus may be effectively used for a polyamideimide film or a display device including the polyamideimide film.
    Type: Application
    Filed: September 9, 2022
    Publication date: October 26, 2023
    Inventors: Cheol Min Yun, Hye Jin Park
  • Patent number: 11795271
    Abstract: An embodiment relates to a polyimide based film for a cover window that may satisfy required performance of an advanced cover window, and a use thereof, and the polyimide based film for a cover window according to the embodiment has excellent visibility without optical stains without deterioration in colorless and transparent optical physical properties, and excellent heat resistance and mechanical physical properties, and thus, may be usefully used for optical applications or the purpose of replacing existing tempered glass. In addition, the polyimide based film for a cover window according to an embodiment may be usefully used in a multilayer structure and a display device.
    Type: Grant
    Filed: June 13, 2022
    Date of Patent: October 24, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Cheol Min Yun, Hye Jin Park
  • Patent number: 11795549
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: March 7, 2022
    Date of Patent: October 24, 2023
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Patent number: 11794446
    Abstract: Provided are a glass substrate multilayer structure including a glass substrate; a polyimide-based shatter-proof layer formed on one surface of the glass substrate; and a hard coating layer formed on the polyimide-based shatter-proof layer. The polyimide-based shatter-proof layer has a thickness of 5 to 50 ?m, the hard coating layer has a thickness of 5 to 20 ?m, and the glass substrate multilayer structure has a retardation in a thickness direction (Rth) of 200 nm or less. A method for manufacturing the glass substrate multilayer structure, and a display panel including the glass substrate multilayer structure are also provided.
    Type: Grant
    Filed: June 27, 2022
    Date of Patent: October 24, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Hyun Joo Song, Cheol Min Yun
  • Patent number: 11766664
    Abstract: Disclosed herein are a dehydrogenation catalyst having single-atom cobalt loaded onto a silica support that has undergone pretreatment including a thermal treatment and a high-temperature aqueous treatment (reaction), a preparation method therefor, and a method for producing olefins by dehydrogenating corresponding paraffins, particularly light paraffins in the presence of the dehydrogenation catalyst.
    Type: Grant
    Filed: June 25, 2021
    Date of Patent: September 26, 2023
    Assignee: SK Innovation Co., Ltd.
    Inventors: Young Eun Cheon, Hee Soo Kim, Dong Min Yun, Ho Won Lee, Ju Hwan Im
  • Patent number: 11732364
    Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: August 22, 2023
    Assignee: LG INNOTEK CO., LTD.
    Inventors: Dong Mug Seong, Jong Min Yun, Su Hyeon Cho, Hae Sik Kim, Tae Hoon Han, Hyo Won Son, Sang Yu Lee, Sang Beum Lee
  • Publication number: 20230257525
    Abstract: Provided is a polyimide precursor composition including a polyimide precursor including a siloxane structure and a solvent having a negative partition coefficient (log P). The polyimide precursor composition may be used to alleviate thermal expansion-contraction behavior, thereby producing a polyimide film with minimal curling.
    Type: Application
    Filed: February 13, 2023
    Publication date: August 17, 2023
    Inventors: Cheol Min Yun, Chun Ho Kim, Hye Jin Park, Chang Q Lee