Abstract: An apparatus and method for holding a solid precursor in a sublimator such that the solid precursor can be vaporized for saturating a carrier gas. The apparatus may include alternating disks or shelves that form inner and outer passages, as well as spaces between the disks for fluidicly coupling the passages to create a winding, tortuous fluid flow path through the sublimator for optimizing solid vapor saturation. The method may include directing a carrier gas into a sublimation chamber, around the first shelf in the outer passage, over the first shelf in the space, around the second shelf in the inner passage, and back out of the sublimation chamber.

Abstract: Methods for the production of trisilane from the pyrolysis of disilane in a single reactor.

Abstract: A method for purifying organosilicon precursor compounds is provided. It includes preparation of the adsorbent with a treating compound. The thus-treated adsorbents can be used to remove impurities such as organic impurities and moisture from a composition containing an organosilicon containing compound. In this manner, it is able to purify organosilicon precursors (or solutions containing organosilicon precursors) without inducing decomposition of the organosilicon precursor.

Abstract: An apparatus and method for holding a solid precursor in a sublimator such that the solid precursor can be vaporized for saturating a carrier gas. The apparatus may include alternating disks or shelves that form inner and outer passages, as well as spaces between the disks for fluidicly coupling the passages to create a winding, tortuous fluid flow path through the sublimator for optimizing solid vapor saturation. The method may include directing a carrier gas into a sublimation chamber, around the first shelf in the outer passage, over the first shelf in the space, around the second shelf in the inner passage, and back out of the sublimation chamber.

Abstract: Methods for the production of trisilane from the pyrolysis of disilane in a single reactor.

Abstract: Novel methods and additives for stabilizing one or more cyclotetrasiloxane compounds for use in silicon film deposition are described herein. The disclosed methods and additives may utilize silicon-containing compounds to inhibit polymerization of one or more cyclotetrasiloxanes. In an embodiment, a method of stabilizing one or more cyclotetrasiloxane compounds for use in silicon film deposition comprises adding one or more additives to the one or more cyclotetrasiloxane compounds to inhibit polymerization of the cyclotetrasiloxane compound. The one or more additives may comprise an acrylate, a methacrylate, or a silane compound having the formula: where R1-R4 may each independently be an alkyl group, an alkoxy group, a heterocyclic group, an acryloxy group, a vinyl group, an epoxy group, a glycidyloxy group, or a hydrogen. R1-R4 may be the same or different from each other. The one or more additives may also comprise combinations of the above mentioned compounds.

Abstract: Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical to a point of use or to another integral block are provided. More particularly, the integral blocks include a recharge container block, a pressurization gas block, a purge gas block, a waste recovery block, a vacuum block, a solvent supply block, a degas block, a control block, and a filtration block. Various integral blocks may be selected to form a chemical delivery system, which is particularly suited for a given application. A chemical delivery system will typically comprise a chemical container block, a chemical delivery block, and a point of use in line with the chemical container block and chemical delivery block, as well as one or more integral blocks.

Abstract: A method for purifying organosilicon precursor compounds is provided. It includes preparation of the adsorbent with a treating compound. The thus-treated adsorbents can be used to remove impurities such as organic impurities and moisture from a composition containing an organosilicon containing compound. In this manner, it is able to purify organosilicon precursors (or solutions containing organosilicon precursors) without inducing decomposition of the organosilicon precursor.

Abstract: An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.

Abstract: An ammonia purification system includes a hydrocarbon removal station that removes hydrocarbons from gaseous ammonia via adsorption, a moisture removal station that removes water from gaseous ammonia via adsorption, and a distillation station including a distillation column connected with a condenser to facilitate removal of impurities from ammonia and condensation of gaseous ammonia to form a purified liquid ammonia product. The system further includes a storage tank to receive purified ammonia, a remote station connected with the storage tank, and a vaporizer connected with the storage tank. The vaporizer is configured to receive and vaporize liquid ammonia from the storage tank and deliver gaseous ammonia back to the storage tank so as to facilitate pumping of the ammonia to the remote station based upon a vapor pressure established within the storage tank.

Abstract: A chemical manufacturing system includes an air compressor configured to receive and pressurize a stream of air to a selected pressure, an air separation unit configured to receive pressurized air from the air compressor and generate a stream of oxygen and a stream of nitrogen at selected purity levels from the pressurized air, a chemical generation system configured to receive at least the stream of oxygen from the air separation unit, and a reactant supply to provide a reactant to the chemical generation system. During system operation, the reactant is oxidized to form a product within the chemical generation system. In one embodiment, the reactant is paraxylene, and the chemical generation system produces a terephthalic acid product.

Abstract: Apparatus and processes are presented to contact a dry, preferably high purity inert gas with a chemical composition in a pressure vessel, or a wetting composition, to form a wet inert gas, which is then used to pressurize the chemical composition out of the pressure vessel. No additional space is needed for an external humidifier. Since a very small amount of vapor is needed to form a wet inert gas, the composition of chemical composition will not be significantly affected.

Abstract: Systems and methods of purifying a silicon-containing material include the step of directing the silicon-containing material in a liquid state through an adsorption unit including an adsorbent material to facilitate adsorption of at least one component from the silicon-containing material. Alternatively, the silicon-containing material is directed, in liquid state and/or gaseous state, through two or more purification units, including an adsorption unit, a vaporization unit, a filter unit and a condenser. The silicon-containing material can be a low-k silicon-containing material such as trimethylsilane, tetramethylsilane, dimethyldimethoxysilane, tetramethylcyclotetrasiloxane, octamethylcyclotetrasiloxane, dimethylphenyl silane, and dimethyldivinyl silane.

Abstract: Apparatus and processes are presented to contact a dry, preferably high purity inert gas with a chemical composition in a pressure vessel, or a wetting composition, to form a wet inert gas, which is then used to pressurize the chemical composition out of the pressure vessel. No additional space is needed for an external humidifier. Since a very small amount of vapor is needed to form a wet inert gas, the composition of chemical composition will not be significantly affected.

Abstract: Apparatus and processes are presented to contact a dry, preferably high purity inert gas with a chemical composition in a pressure vessel, or a wetting composition, to form a wet inert gas, which is then used to pressurize the chemical composition out of the pressure vessel. No additional space is needed for an external humidifier. Since a very small amount of vapor is needed to form a wet inert gas, the composition of chemical composition will not be significantly affected.

Abstract: Provided is a system for transferring and delivering a liquid chemical from a source to an end use station.

Abstract: Provided are apparatuses and methods for vaporizing a liquid chemical to form a vapor phase product. One exemplary apparatus includes: a vaporization chamber, which includes a first annular wall having a plurality of openings and enclosing a vaporization space and a second annular wall disposed within the first annular wall, the first and second annular walls forming an annular space therebetween; a first conduit connected to the vaporization chamber for introducing thereto a liquid chemical to be vaporized; a second conduit connected to the vaporization chamber for introducing a carrier gas to the annular space, wherein the carrier gas flows from the annular space through the first annular wall to the vaporization space; and a third conduit connected to the vaporization chamber for supplying the vapor phase product to a point of use.

Abstract: Integral blocks, chemical delivery systems and methods for delivering an ultrapure chemical to a point of use or to another integral block are provided. More particularly, the integral blocks include a recharge container block, a pressurization gas block, a purge gas block, a waste recovery block, a vacuum block, a solvent supply block, a degas block, a control block, and a filtration block. Various integral blocks may be selected to form a chemical delivery system, which is particularly suited for a given application. A chemical delivery system will typically comprise a chemical container block, a chemical delivery block, and a point of use in line with the chemical container block and chemical delivery block, as well as one or more integral blocks.

Abstract: A system for damping pressure pulses is provided, including a channel for permitting fluid flow between a first chamber and a second chamber, a piston for varying a fluid flowing space such that pressure pulses in fluid are damped, and a flexible wall for absorbing pressure pulses in fluid, wherein the flexible wall is connected to the piston by a transmitting rod such that a movement of the piston results in a deformation of the flexible wall and vice versa.

Abstract: Apparatus and processes are presented to contact a dry, preferably high purity inert gas with a chemical composition in a pressure vessel, or a wetting composition, to form a wet inert gas, which is then used to pressurize the chemical composition out of the pressure vessel. No additional space is needed for an external humidifier. Since a very small amount of vapor is needed to form a wet inert gas, the composition of chemical composition will not be significantly affected.