Patents by Inventor Ming Fa Tsai

Ming Fa Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11953078
    Abstract: A gear module includes a rotating cylinder, a first planetary gear set, a second planetary gear set, a concave-convex structure, and a limit bearing set. The first planetary gear set is accommodated in the rotating cylinder and includes a driven gear; the second planetary gear set includes a positioning frame, second planetary gears pivoted to a positioning frame, a driven gear engaged with the second planetary gears, and the positioning frame has a through hole; the concave-convex structure includes a convex column extended from the rotating cylinder and a concave hole formed on the positioning frame, the convex column is plugged into the concave hole; the limit bearing set includes a first ball bearing sheathing the driven gear and mounted between the driven gear and the through hole, and a second ball bearing sheathing the convex column and mounted between the convex column and the concave hole.
    Type: Grant
    Filed: August 16, 2023
    Date of Patent: April 9, 2024
    Assignee: SHA YANG YE INDUSTRIAL CO., LTD.
    Inventors: Feng-Chun Tsai, Ming-Han Tsai, Chin-Fa Lu, Kai-Hsien Wang
  • Publication number: 20230288553
    Abstract: Disclosed is a medical care radar system, comprising: a radio-frequency integrated circuit, a first-operation-mode transmitting antenna, a second-operation-mode transmitting antenna, a first-operation-mode receiving antenna set, a second-operation-mode receiving antenna set, a processing device, and an analog-to-digital converter. A field-programmable gate array of the processing device controls the analog-to-digital converter to perform an analog-to-digital conversion without the use of a microcontroller, so that the architecture is simplified and the cost is reduced.
    Type: Application
    Filed: April 20, 2022
    Publication date: September 14, 2023
    Applicant: RAYINN TECHNOLOGY, INC.
    Inventors: Shih-Hai TU, Ming-Fa TSAI
  • Patent number: 11469763
    Abstract: Disclosed is a low-pass filtering system having a phase-lock loop comprising a Park transform circuit, a first low-pass filter, a second low-pass filter, an inverse Park transform circuit, a phase-locked loop filter, and a voltage-controlled oscillator. The Park transform circuit, the first low-pass filter, the second low-pass filter, and the inverse Park transform circuit form a phase detector of a phase-locked loop, since the low-pass filter system of the present invention has the phase-locked loop mechanism, the phase and amplitude of a output signal remain the same with those of the original AC input signal.
    Type: Grant
    Filed: December 21, 2021
    Date of Patent: October 11, 2022
    Assignee: RAYINN TECHNOLOGY, INC.
    Inventors: Shih-Hai Tu, Ming-Fa Tsai
  • Patent number: 11298798
    Abstract: A polishing delivery apparatus, configured to provide slurry and rinse agent to a polishing pad, includes a delivery arm, at least one first nozzle, and at least one second nozzle. The delivery arm is rotatably connected to the polishing pad and has an arc-shaped top surface facing away from the polishing pad, a bottom surface facing away from the arc-shaped top surface, and a recess indenting from the bottom surface. The first nozzle is mounted on the bottom surface of the delivery arm and has a first nozzle head facing toward the polishing pad. The second nozzle is mounted in the recess of the delivery arm and has three second nozzle heads, in which one of the three second nozzle heads faces toward the polishing pad, and the other two of the three second nozzle heads face toward sidewalls of the recess.
    Type: Grant
    Filed: February 14, 2020
    Date of Patent: April 12, 2022
    Assignee: NANYA TECHNOLOGY CORPORATION
    Inventors: Jiun-Bo Wang, Chia-Hung Su, Yuan-Chi Hsieh, Chih-Yuan Chen, Ming-Fa Tsai, Chih-Wang Hsu
  • Publication number: 20210252669
    Abstract: A polishing delivery apparatus, configured to provide slurry and rinse agent to a polishing pad, includes a delivery arm, at least one first nozzle, and at least one second nozzle. The delivery arm is rotatably connected to the polishing pad and has an arc-shaped top surface facing away from the polishing pad, a bottom surface facing away from the arc-shaped top surface, and a recess indenting from the bottom surface. The first nozzle is mounted on the bottom surface of the delivery arm and has a first nozzle head facing toward the polishing pad. The second nozzle is mounted in the recess of the delivery arm and has three second nozzle heads, in which one of the three second nozzle heads faces toward the polishing pad, and the other two of the three second nozzle heads face toward sidewalls of the recess.
    Type: Application
    Filed: February 14, 2020
    Publication date: August 19, 2021
    Inventors: Jiun-Bo WANG, Chia-Hung SU, Yuan-Chi HSIEH, Chih-Yuan CHEN, Ming-Fa TSAI, Chih-Wang HSU
  • Patent number: 10215784
    Abstract: A measuring system, during a measurement process thereof, uses a phase-locked loop mechanism of a stator phase voltage and a stator phase current of a three-phase AC motor to effectively remove harmonics and to sense and obtain the amplitude effective values of the phase voltage and the phase current of the three-phase AC motor and the phase difference between the phase voltage and phase current. Therefore, the measuring apparatus is capable of quickly and accurately calculating the input power of the motor without having to measure the parameters of the motor.
    Type: Grant
    Filed: December 6, 2017
    Date of Patent: February 26, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chun-Han Chen, Chun-Hsiang Yang, Yung-Jen Cheng, Ming-Fa Tsai, Ying-Che Weng
  • Patent number: 7298316
    Abstract: An apparatus for detecting clutter blocks and an interference source for dynamically establishing a clutter map includes a clutter block detecting module accumulates a plurality of range cell data of each detecting area, and compares the accumulated value with a clutter block level to define the position of a clutter block; a interference source detecting module accumulates all range cell data in each radar beam area, and compares the accumulated value with an interference source reference level to detect whether any interference source exists; and a clutter map establishing module saves the clutter maps on different beam areas in three memory blocks. When one clutter map cell is extracted, the clutter map cells on different beam areas neighboring with the beam area saving extracted clutter map cell are also extracted. The largest value among the extracted clutter map cells is being a clutter threshold value of a detected target.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: November 20, 2007
    Assignee: Chung Shan Institute of Science and Technology, Armaments Bureau M.N.D.
    Inventors: Ming-Fa Tsai, Zheng-Cheng Chang, Ming-Wey Chen
  • Publication number: 20070139258
    Abstract: An apparatus for detecting clutter blocks and an interference source for dynamically establishing a clutter map includes a clutter block detecting module accumulates a plurality of range cell data of each detecting area, and compares the accumulated value with a clutter block level to define the position of a clutter block; a interference source detecting module accumulates all range cell data in each radar beam area, and compares the accumulated value with an interference source reference level to detect whether any interference source exists; and a clutter map establishing module saves the clutter maps on different beam areas in three memory blocks. When one clutter map cell is extracted, the clutter map cells on different beam areas neighboring with the beam area saving extracted clutter map cell are also extracted. The largest value among the extracted clutter map cells is being a clutter threshold value of a detected target.
    Type: Application
    Filed: December 19, 2005
    Publication date: June 21, 2007
    Inventors: Ming-Fa Tsai, Zheng-Cheng Chang, Ming-Wey Chen
  • Patent number: 6932094
    Abstract: A slurry tank autocleaner for cleaning an empty slurry tank. A first pipe is inserted in the interior of the slurry tank, where the first pipe has an open end located inside the slurry tank. A first nozzle is disposed on the open end of the first pipe. A cover is used to cover the slurry tank, where the cover has a plurality of second nozzles targeting the slurry tank. A second pipe is connected to the second nozzles. A controller is used to control chemical, pure water or dry gas to spurt from the first nozzle and the second nozzles through the first pipe and the second pipe. Thus, the slurry tank can be automatically cleaned.
    Type: Grant
    Filed: December 6, 2002
    Date of Patent: August 23, 2005
    Assignee: Nanya Technology Corporation
    Inventors: Chih-Kun Chen, Ming Fa Tsai
  • Patent number: 6886442
    Abstract: An apparatus for punching CMP machine backing film. The apparatus comprises a base, a first plate, and a second plate. The base holds the backing-film. The first plate is disposed on the base in a manner such that it moves between a first position and a second position. The first plate abuts the backing-film when it is located at the second position. The second plate, having a plurality of punches, is disposed on the base in a manner such that it moves between a third position and a fourth position. The first plate is located at the first position when the second plate is located at the third position. The first plate is located at the second position when the second plate is located at the fourth position so that the punches pass through the first plate to punch the backing-film.
    Type: Grant
    Filed: May 8, 2002
    Date of Patent: May 3, 2005
    Assignee: Nanya Technology Corporation
    Inventors: Wan-Yi Wu, Ming Fa Tsai
  • Patent number: 6865764
    Abstract: A fixture for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The fixture comprises a base, a plurality of posts and a guiding member. The base is provided with a plurality of holes. The posts insert into the holes of the base through the hollow portion of the outer brush respectively so as to assist the brush core in passing through the hollow portion of the outer brush. The guiding member is connected with the brush core to assist the brush core in passing through the hollow portion of the outer brush.
    Type: Grant
    Filed: April 16, 2002
    Date of Patent: March 15, 2005
    Assignee: Nanya Technology Corporation
    Inventors: Ming Fa Tsai, Chia Chi Lin
  • Patent number: 6832422
    Abstract: An apparatus for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The apparatus comprises a base, a fixed member, a sliding member, a plurality of posts, and an actuating device. The base holds the brush core and the outer brush, and the fixed member is disposed on the base. The sliding member is disposed on the base in a manner such that it is located at the opposite side of the fixed member relative to the outer brush disposed on the base. The posts, disposed on the sliding member, pass through the fixed member and the hollow portion of the outer brush so as to assist the brush core in passing through the hollow portion of the outer brush. The actuating device connects with the brush core so as to pass the brush core through the hollow portion of the outer brush and separate the posts, inserted into the outer brush, from the outer brush.
    Type: Grant
    Filed: May 21, 2002
    Date of Patent: December 21, 2004
    Assignee: Nanya Technology Corporation
    Inventors: Ming Fa Tsai, Chia Chi Lin, Shih Hsien Hsu, Chih-Feng Wang, Hong-wei Chen
  • Publication number: 20040154452
    Abstract: An apparatus for punching CMP machine backing film. The apparatus comprises a base, a first plate, and a second plate. The base holds the backing-film. The first plate is disposed on the base in a manner such that it moves between a first position and a second position. The first plate abuts the backing-film when it is located at the second position. The second plate, having a plurality of punches, is disposed on the base in a manner such that it moves between a third position and a fourth position. The first plate is located at the first position when the second plate is located at the third position. The first plate is located at the second position when the second plate is located at the fourth position so that the punches pass through the first plate to punch the backing-film.
    Type: Application
    Filed: February 9, 2004
    Publication date: August 12, 2004
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Wan-Yi Wu, Ming Fa Tsai
  • Patent number: 6772528
    Abstract: An incremental offset measuring instrument is provided. The incremental offset measuring instrument includes a main base; a specimen seat mounted on the main base for resting a specimen; a measuring tool assembly for measuring the specimen; and a movable assembly mounted on the main base, wherein the movable assembly carries the measuring tool assembly, thereby achieving the goal of measuring the specimen.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: August 10, 2004
    Assignee: Nan Ya Technology Corporation
    Inventors: Ming Fa Tsai, Shan Chang Wang, Yi-Tung Lin
  • Publication number: 20040016140
    Abstract: An incremental offset measuring instrument is provided. The incremental offset measuring instrument includes a main base; a specimen seat mounted on the main base for resting a specimen; a measuring tool assembly for measuring the specimen; and a movable assembly mounted on the main base, wherein the movable assembly carries the measuring tool assembly, thereby achieving the goal of measuring the specimen.
    Type: Application
    Filed: July 23, 2002
    Publication date: January 29, 2004
    Applicant: Nan Ya Technology Corporation
    Inventors: Ming Fa Tsai, Shan Chang Wang, Yi-Tung Lin
  • Publication number: 20030201002
    Abstract: A slurry tank autocleaner for cleaning an empty slurry tank. A first pipe is inserted in the interior of the slurry tank, where the first pipe has an open end located inside the slurry tank. A first nozzle is disposed on the open end of the first pipe. A cover is used to cover the slurry tank, where the cover has a plurality of second nozzles targeting the slurry tank. A second pipe is connected to the second nozzles. A controller is used to control chemical, pure water or dry gas to spurt from the first nozzle and the second nozzles through the first pipe and the second pipe. Thus, the slurry tank can be automatically cleaned.
    Type: Application
    Filed: December 6, 2002
    Publication date: October 30, 2003
    Applicant: Nanya Technology Corporation
    Inventors: Chih-Kun Chen, Ming Fa Tsai
  • Publication number: 20030124857
    Abstract: An apparatus for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The apparatus comprises a base, a fixed member, a sliding member, a plurality of posts, and an actuating device. The base holds the brush core and the outer brush, and the fixed member is disposed on the base. The sliding member is disposed on the base in a manner such that it is located at the opposite side of the fixed member relative to the outer brush disposed on the base. The posts, disposed on the sliding member, pass through the fixed member and the hollow portion of the outer brush so as to assist the brush core in passing through the hollow portion of the outer brush. The actuating device connects with the brush core so as to pass the brush core through the hollow portion of the outer brush and separate the posts, inserted into the outer brush, from the outer brush.
    Type: Application
    Filed: May 21, 2002
    Publication date: July 3, 2003
    Inventors: Ming Fa Tsai, Chia Chi Lin, Shih Hsien Hsu, Chih-Feng Wang, Hong-wei Chen
  • Publication number: 20030084997
    Abstract: An apparatus for punching CMP machine backing film. The apparatus comprises a base, a first plate, and a second plate. The base holds the backing-film. The first plate is disposed on the base in a manner such that it moves between a first position and a second position. The first plate abuts the backing-film when it is located at the second position. The second plate, having a plurality of punches, is disposed on the base in a manner such that it moves between a third position and a fourth position. The first plate is located at the first position when the second plate is located at the third position. The first plate is located at the second position when the second plate is located at the fourth position so that the punches pass through the first plate to punch the backing-film.
    Type: Application
    Filed: May 8, 2002
    Publication date: May 8, 2003
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Wan-Yi Wu, Ming Fa Tsai
  • Publication number: 20030085609
    Abstract: A fixture for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The fixture comprises a base, a plurality of posts and a guiding member. The base is provided with a plurality of holes. The posts insert into the holes of the base through the hollow portion of the outer brush respectively so as to assist the brush core in passing through the hollow portion of the outer brush. The guiding member is connected with the brush core to assist the brush core in passing through the hollow portion of the outer brush.
    Type: Application
    Filed: April 16, 2002
    Publication date: May 8, 2003
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Ming Fa Tsai, Chia Chi Lin
  • Patent number: 6498583
    Abstract: A real time multiple simulated targets generator for mono pulse radar, applied to a simulation control system of a radar system, having at least one signal processor, in which a real time multiple targets generator is built inside. The real time multiple target generator has a precision timing generator to generate a timing signal. Several PRN code generators receive the timing signal to generate the psendo random code. Several DMWG's which are connected to the PTG and the PRN code generators to generate the modulated waveforms. The extent target generators are coupled to the corresponding DMWG's to receive the modulated waveform signals and generate simulated target signals.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: December 24, 2002
    Assignee: Chung-Shan Institute of Science and Technology
    Inventors: Ming-Fa Tsai, Chao-Cheng Chou, Ming-Chan Chen