Abstract: A power supply architecture for a structural application-specific integrated circuit (ASIC) is provided. The power supply architecture includes a first conductor and a second conductor. The first conductor is coupled to a fixed voltage. The first conductor at least passes through two edges of a cell. The first conductor and the second conductor are connected through a contact. The second conductor at most passes through one edge of the cell. The structural ASIC includes a first metal layer and a second metal layer. The first metal layer includes the first conductor. The second metal layer includes the second conductor.

Abstract: A power supply architecture for a structural application-specific integrated circuit (ASIC) is provided. The power supply architecture includes a first conductor and a second conductor. The first conductor is coupled to a fixed voltage. The first conductor at least passes through two edges of a cell. The first conductor and the second conductor are connected through a contact. The second conductor at most passes through one edge of the cell. The structural ASIC includes a first metal layer and a second metal layer. The first metal layer includes the first conductor. The second metal layer includes the second conductor.

Abstract: The present invention discloses a structured ASIC layout architecture, which includes a fixed body region and a programmable layout region. The fixed body region includes a tunnel wire or multiple tunnel wires for providing a function capability or multiple function capability. The programmable layout region is disposed on the fixed body region and is connected to the fixed body region, wherein the programmable layout region utilizes the tunnel wires of the fixed body region to propagate electrical signals.

Abstract: A method for programming a routing layout design through one via layer includes forming a plurality of metal traces on a first routing layer and a second routing layer, and positioning a plurality of vias within a via layer disposed between the first and second routing layers for connecting the metal traces on the first and second routing layers according to a first current route defined by a predetermined circuit layout design to connect a first node and a second node so as to establish a second current route equivalent to the first current route.

Abstract: A method for programming a routing layout design through one via layer includes forming a plurality of metal traces on a first routing layer and a second routing layer, and positioning a plurality of vias within a via layer disposed between the first and second routing layers for connecting the metal traces on the first and second routing layers according to a first current route defined by a predetermined circuit layout design to connect a first node and a second node so as to establish a second current route equivalent to the first current route.