Patents by Inventor Ming-Tsung Hong

Ming-Tsung Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10844164
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: November 24, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
  • Patent number: 10179833
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: January 15, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung Hong, Yun-Ching Lee, Wei-Ta Yang, Meng-Song Yin
  • Publication number: 20180171068
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Application
    Filed: December 21, 2017
    Publication date: June 21, 2018
    Applicant: Industrial Technology Research Institute
    Inventors: Wei-Ta Yang, Yen-Yi Chu, Ming-Tsung Hong, Li-Chun Liang, Yun-Ching Lee, Meng-Song Yin, Hsi-Yi Chin
  • Publication number: 20170342200
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer can be a reaction product of a reactant (a) and a reactant (b). The reactant (a) is a reaction product of a reactant (c) and a reactant (d). The reactant (b) can be or a combination thereof, wherein a is 0 or 1, and R1 is independently hydrogen or and wherein b is 0-6; c is 0 or 1; and, d is 0-6. The reactant (c) is wherein R2 is C5-10 alkyl group. The reactant (d) is wherein e is 0-10.
    Type: Application
    Filed: December 30, 2016
    Publication date: November 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung HONG, Yun-Ching LEE, Wei-Ta YANG, Meng-Song YIN
  • Publication number: 20170342199
    Abstract: An oligomer, composition, and composite material employing the same are provided. The oligomer has a structure represented by Formula (I) wherein R1 and R2 are independently hydrogen, C1-20 alkyl group, C2-20 alkenyl group, C6-12 aryl group, C6-12 alkylaryl group, C5-12 cycloalkyl group, C6-20 cycloalkylalkyl group, alkoxycarbonyl group, or alkylcarbonyloxy group; R1 is not hydrogen when R2 is hydrogen; a is 0 or 1; n?0; m?1; n:m is from 0:100 to 99:1; the oligomer has a number average molecular weight of less than or equal to 12,000; and the repeat unit and the repeat unit are arranged in a random or block fashion.
    Type: Application
    Filed: December 29, 2016
    Publication date: November 30, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wei-Ta YANG, Yen-Yi CHU, Ming-Tsung HONG, Li-Chun LIANG, Yun-Ching LEE, Meng-Song YIN
  • Patent number: 9236169
    Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: January 12, 2016
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung Hong, Yun-Ching Lee, Li-Chun Liang, Wei-Ta Yang
  • Publication number: 20140141232
    Abstract: Provided is an electromagnetic wave shielding structure, including: a substrate; and a porous composite film formed on the substrate, wherein the porous composite film includes a continuous phase network fused from a plurality of metal nanoparticles, a first resin composition coated on a surface of the continuous phase network and a plurality of holes which are void spaces in the continuous phase network coated with the first resin composition.
    Type: Application
    Filed: May 9, 2013
    Publication date: May 22, 2014
    Applicant: Industrial Technology Research Institute
    Inventors: Ming-Tsung HONG, Yun-Ching LEE, Li-Chun LIANG, Wei-Ta YANG
  • Publication number: 20100163429
    Abstract: Gas sensing material and gas sensor employing the same are provided. The gas sensing material includes an inorganic metal oxide and an organic polymer, wherein the organic polymer includes a repeat unit having the structure of wherein R1 and R2 are an independent alkyl group, alkoxy group, alkoxycarbonyl group, aryl group, heteroaryl group, or aliphatic group.
    Type: Application
    Filed: June 3, 2009
    Publication date: July 1, 2010
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Kuo-Chuang Chiu, Ren-Der Jean, Jinn-Shing King, Ming-Tsung Hong, Shur-Fen Liu
  • Publication number: 20090236132
    Abstract: An organic/inorganic hybrid composition with electrostatic discharge protection properties, high thermal stability, good adhesion, low costs, and good processability is disclosed. The composition includes a thermosetting resin system, an inherently dissipative polymer, and non-insulating particles. The inherently dissipative polymer and the non-insulating particles are dispersed within the thermosetting resin system.
    Type: Application
    Filed: October 1, 2008
    Publication date: September 24, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Ming-Tsung Hong, Shur-Fen Liu, Jinn-Shing King