Abstract: A laser annealing device and methods for annealing using the device are disclosed. The laser annealing device includes: a laser light source system (3); a laser adjusting system (4) that is connected to the laser light source system and is disposed above a wafer (1); a temperature monitoring system (5) that is disposed above the wafer (1) and configured to measure in real time a temperature at a location of the surface of the wafer at which a light spot is formed; and a central control system (6) in connection with each of the laser light source system, the laser adjusting system, the temperature monitoring system and a wafer table (2). The wafer is jointly annealed by laser beams from several independent lasers (31) in the laser light source system, which have different wavelengths and cooperate in a mutually complementary manner, with a selected optimum set of process parameters. As a result, an optimum annealing temperature can be achieved and surface pattern effects can be effectively reduced.

Abstract: A method for in-situ aberration measurement in an optical imaging system of lithographic tools. According to the method, a reticle pattern is imaged to form an imaged pattern by transmitting beams through a reticle via the optical imaging system. The imaged reticle pattern is shaped to have plural groups of imaged linewidths. The plural groups of imaged linewidths are measured using either of an image sensor, a CD-SEM and a microscope by modifying the intensity distribution at an exit pupil plane of the optical imaging system. The asymmetry and ununiformity of the imaged linewidths are calculated. Aberrations of the optical imaging system are calculated.

Abstract: The present invention has disclosed a method for in-situ aberration measurement in an optical imaging system of lithographic tools, which comprises the steps of: imaging the reticle pattern by the beams transmitting through the reticle via the optical imaging system; using particular tools to measure plural groups of linewidths by modifying the intensity distribution at the exit pupil plane of the optical imaging system; calculating the asymmetry and ununiformity of the linewidths and calculating the aberrations of the optical imaging system. The present method for aberration measurement can simplify the process of measurement; increase the measurement accuracy of the parameters of image quality; and reduce the time of measurement.