Abstract: A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by the action of an acid. The resist composition contains a high-molecular-weight compound having a constitutional unit represented by General Formula (a0-1), and a high-molecular-weight compound having a constitutional unit represented by General Formula (f01-1) and a constitutional unit including an acid-dissociable group represented by General Formula (f02-r-1).

Abstract: A resist composition that generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid. The resist composition contains a polymeric compound having a constitutional unit (a0) represented by General Formula (a0-1), a compound (B1) represented by General Formula (b1), and a compound (D1) represented by General Formula (d1).

Abstract: A resist composition containing a resin component, an acid generator component that generates acid upon exposure, and an organic solvent component, the resin component containing a polymeric compound that exhibits changed solubility in a developing solution under action of acid, the acid generator component containing a compound represented by General Formula (b0-1), and a proportion of a mass of the resin component with respect to a total mass of the resin component and the organic solvent component is in a range of 15% to 30% by mass. In the formula (b0-1), Rb01 represents an alkyl group; Lb01 represents a single bond or an alkylene group; Lb02 represents an alkylene group; and Rf01 and Rf01 represent a fluorine atom or a fluorinated alkyl group.

Abstract: A resist composition containing a compound represented by General Formula (d1-1) or a compound represented by General Formula (d1-2) and containing a polymeric compound (A01) having a constitutional unit (a01) represented by General Formula (a0-1), a constitutional unit (a02) represented by General Formula (a0-2), and a constitutional unit (a03) represented by General Formula (a0-3) wherein, Ra01 represents a lactone-containing cyclic group having a cyano group or the like.

Abstract: A resist composition which generates an acid by exposure and whose solubility in a developing solution changes by the action of an acid. The resist composition contains a high-molecular-weight compound having a constitutional unit represented by General Formula (a0-1), and a high-molecular-weight compound having a constitutional unit represented by General Formula (f01-1) and a constitutional unit including an acid-dissociable group represented by General Formula (f02-r-1).