Patents by Inventor Minoru Doi

Minoru Doi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240166979
    Abstract: A culture device is provided with a culture tank having sidewalls that are formed from a translucent material, and cultures fine algae in a culture liquid that is accommodated in the culture tank and through which light is emitted via the sidewalls. The culture device is provided with a translucent insulating part that covers the sidewalls. The insulating part forms an air layer that insulates the inside of the culture tank. A culture device is provided with a culture tank having sidewalls that are formed from a translucent material, and cultures fine algae in a culture liquid that is accommodated in the culture tank and through which light is emitted via the sidewalls. The culture device is provided with a translucent insulating part that covers the sidewalls. The insulating part forms an air layer that insulates the inside of the culture tank.
    Type: Application
    Filed: February 24, 2022
    Publication date: May 23, 2024
    Inventors: Minoru GOTO, Nozomi SHIOBARA, Shohei KINOSHITA, Fumitomo TAKANO, Mizuho DOI, Satoshi SHIOZAKI, Kenji MACHIDA
  • Patent number: 7360546
    Abstract: A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, the inner container being communicated to the outer container through the upper opening; a cleaning liquid supply conduit for supplying a cleaning liquid into the inner container; an inner container drain conduit for draining the cleaning liquid from the inner container; a solvent-containing gas supply conduit for supplying a solvent-containing gas into the inner container for drying the substrate; a solvent-resolving gas supply conduit for supplying a solvent-resolving gas into the inner container for resolving a solvent component attached on the substrate; an exhaust pipe for exhausting the gases from the double container, and an outer container drain conduit for draining the liquid spilled from the inner container to the outer container.
    Type: Grant
    Filed: April 3, 2003
    Date of Patent: April 22, 2008
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Minoru Doi
  • Publication number: 20030188770
    Abstract: A cleaning apparatus for a semiconductor wafer comprising: a double container including an inner container with an upper opening for accommodating a substrate to be cleaned and an outer container having an airtight space accommodating the inner container therein, the inner container being communicated to the outer container through the upper opening; a cleaning liquid supply conduit for supplying a cleaning liquid into the inner container; an inner container drain conduit for draining the cleaning liquid from the inner container; a solvent-containing gas supply conduit for supplying a solvent-containing gas into the inner container for drying the substrate; a solvent-resolving gas supply conduit for supplying a solvent-resolving gas into the inner container for resolving a solvent component attached on the substrate; an exhaust pipe for exhausting the gases from the double container, and an outer container drain conduit for draining the liquid spilled from the inner container to the outer container.
    Type: Application
    Filed: April 3, 2003
    Publication date: October 9, 2003
    Inventor: Minoru Doi
  • Patent number: 6446645
    Abstract: There are provided an system for evaluating the amount of particles, a dip cleaning system, and a method of evaluating the amount of particles adhering to a substrate, which enable high-precision quantitative evaluation of the amount of particles suspended in a liquid without use of a monitor substrate, which enable easy determination of the correlation between the amount of particles suspended in the liquid and the amount of particles adhering to the substrate which is an object of cleaning, and which enable low-cost and highly-reliable cleaning evaluation. A residual liquid recovery pan for recovering a residual liquid interposed and a residual liquid quantitative measurement bath for measuring the amount of submerged particles is interposed, between the first substrate treatment bath and the second substrate treatment bath.
    Type: Grant
    Filed: June 1, 2000
    Date of Patent: September 10, 2002
    Assignee: Semiconductor Leading Edge Technologies, Inc.
    Inventor: Minoru Doi
  • Patent number: 6154040
    Abstract: In an apparatus for testing an electronic device, a life of a measurement board is significantly extended by interposing a plate member between the measurement board and a device mounting member for accommodating the electronic device. The plate member has a plurality of rear pads to be brought into contact with each of the pads of the measurement board on a back surface thereof and a plurality of front pads electrically connected to each of the rear pads through via holes on a front surface thereof. The plate member is places between the measurement board and the device mounting member on testing the electronic device and can be readily replaced by a new one when it is worn away.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: November 28, 2000
    Assignees: NEC Corporation, Agilent Technologies
    Inventors: Teruaki Tsukamoto, Minoru Doi
  • Patent number: 3940728
    Abstract: An alloy for use as a fuse element in a high temperature fuse characterized by having a high resistance to corrosion and a melting point at a fixed temperature within a range of 1000.degree. to 1100.degree.C. The alloy consists of copper containing 10-14% aluminum and 0-2.5% of a second constituent which second constituent consists of one or more metals selected from a group consisting of nickel, manganese and iron. The alloy also has desirable hardness and good workability to enable fabrication of the alloy into a fused element.
    Type: Grant
    Filed: August 3, 1973
    Date of Patent: February 24, 1976
    Assignees: Kabushiki Kaisha Toyota Chuo Kenkyusho, Nippondenso Co., Ltd.
    Inventors: Noboru Komatsu, Mikio Obayashi, Minoru Doi, Nobuyoshi Ota, Yoshio Iwai