Patents by Inventor Minoru Hidaka

Minoru Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020042811
    Abstract: The reserved request type of searched information distribution server having a first function unit for issuing a search request to another server connected to the Internet via the Internet so as to collect desired data from a WWW server specified by the search request according to the schedule specified by the search request when receiving a request of data searching in a WWW server from a client terminal, and a second function unit for receiving searched data via a communication satellite.
    Type: Application
    Filed: December 7, 2001
    Publication date: April 11, 2002
    Inventors: Toshio Hirosawa, Tsutomu Ito, Yoshihiro Ishii, Minoru Hidaka
  • Patent number: 5981399
    Abstract: A semiconductor device fabrication apparatus having multiple processing chambers for different processes, where a substrate is carried in and out in a sophisticated manner, with their different internal ambient conditions being retained, so that the substrate is free from contamination, thereby manufacturing high-quality semiconductor devices at high throughput. The apparatus includes a movable buffer chamber having a wafer carriage means within a transfer chamber which faces a process chamber, an evacuation means which evacuates of gas the buffer chamber, transfer chamber and process chamber independently, a gas feed means, and a control means.
    Type: Grant
    Filed: August 14, 1997
    Date of Patent: November 9, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Yoshio Kawamura, Tatuharu Yamamoto, Shigeo Moriyama, Yoshifumi Kawamoto, Natsuki Yokoyama, Fumihiko Uchida, Minoru Hidaka, Miyako Matsui
  • Patent number: 5420436
    Abstract: A technique and exposure apparatus measures, with a high degree of accuracy, figure and placement errors of individual optical elements constituting optics embedded inside of an exposure apparatus or the like, with the optics kept in an embedded state as they are. The system measures the distribution of wavefront distortions in the optics while changing the positions of a light source and an image point inside an exposure field of the optics being observed. Optimal displacements of reflective surfaces constituting the optics are then found by calculation based on the measured distribution of wave-front distortions. Finally, the positions of the reflective surfaces are corrected in accordance with the calculated optimal displacements. The positions of the reflective surfaces are corrected by individually controlling displacements output by a plurality of actuators attached to each reflective surface and by mechanically modifying appropriate portions of the reflective surfaces.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: May 30, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Eiichi Seya, Massaaki Ito, Soichi Katagiri, Tsuneo Terasawa, Minoru Hidaka, Eiji Takeda, Norio Saitou