Abstract: A film forming method includes: preparing a substrate having a recess within a processing container; forming a silicon-containing film on the substrate by activating a silicon-containing gas with plasma and supplying the activated silicon-containing gas to the substrate; partially modifying the silicon-containing film after the silicon-containing film closes an opening of the recess; and selectively etching the modified silicon-containing film.

Abstract: Provided is a plasma film-firming apparatus including: a chamber configured to accommodate a substrate therein; a substrate pedestal configured to disposed the substrate thereon within the chamber; a gas supply mechanism configured to supply a gas including a film-forming gas into the chamber; an exhaust mechanism configured to exhaust an inside of the chamber; and a plasma generating unit configured to generate plasma in the chamber. The substrate pedestal includes a pedestal body having a smaller diameter than that of the substrate and including a placement surface, and an annular adjustment member disposed outside the pedestal body. The adjustment member is replaceably installed. A plurality of adjustment members having various steps are provided at a position outside the substrate as the adjustment member, and among the plurality of adjustment members, an adjustment member is selected and used according to a processing condition of a plasma processing.

Abstract: A pre-filled syringe includes: a cylindrical container, a front end-side gasket; a rear end-side gasket; an intermediate gasket partitioning an inside of the cylindrical container into a front chamber and a rear chamber; a plunger; a medical drug contained in the front chamber, and a liquid drug contained in the rear chamber. In a state where the plunger is pushed in, a bypass portion included in the cylindrical container faces a groove portion provided in the intermediate gasket, thereby allowing communication between the front chamber and the rear chamber therethrough, so that the medical drug and the liquid drug are mixed, and a liquid mixture is discharged. The pre-filled syringe further includes a movement limiting mechanism for limiting movement of the plunger such that a tail end of the rear end-side gasket does not reach the bypass portion.

Abstract: Disclosed is a plasma film-forming method including: accommodating a workpiece in a chamber; supplying a film-forming gas into the chamber; generating plasma within the chamber; and exciting the film-forming gas by the plasma to form a predetermined film on the workpiece. Helium gas is supplied as a plasma generating gas into the chamber together with the film-forming gas to generate plasma containing the helium gas in the chamber.

Abstract: Provided is a plasma film-firming apparatus including: a chamber configured to accommodate a substrate therein; a substrate pedestal configured to disposed the substrate thereon within the chamber; a gas supply mechanism configured to supply a gas including a film-forming gas into the chamber; an exhaust mechanism configured to exhaust an inside of the chamber; and a plasma generating unit configured to generate plasma in the chamber. The substrate pedestal includes a pedestal body having a smaller diameter than that of the substrate and including a placement surface, and an annular adjustment member disposed outside the pedestal body. The adjustment member is replaceably installed. A plurality of adjustment members having various steps are provided at a position outside the substrate as the adjustment member, and among the plurality of adjustment members, an adjustment member is selected and used according to a processing condition of a plasma processing.

Abstract: Disclosed is a plasma film-forming method including: accommodating a workpiece in a chamber; supplying a film-forming gas into the chamber; generating plasma within the chamber; and exciting the film-forming gas by the plasma to form a predetermined film on the workpiece. Helium gas is supplied as a plasma generating gas into the chamber together with the film-forming gas to generate plasma containing the helium gas in the chamber.

Abstract: Disclosed is a plasma processing method including: growing a polycrystalline silicon layer on a processing target base body; and exposing the polycrystalline silicon layer to hydrogen radicals by supplying a processing gas containing hydrogen into a processing container that accommodates the processing target base body including the polycrystalline silicon layer grown thereon and radiating microwaves within the processing container to generate the hydrogen radicals.

Abstract: A pre-filled syringe includes: a cylindrical container, a front end-side gasket; a rear end-side gasket; an intermediate gasket partitioning an inside of the cylindrical container into a front chamber and a rear chamber; a plunger; a medical drug contained in the front chamber, and a liquid drug contained in the rear chamber. In the state where the plunger is pushed in, a bypass portion included in the cylindrical container faces a groove portion provided in the intermediate gasket, thereby allowing communication between the front chamber and the rear chamber therethrough, so that the medical drug and the liquid drug are mixed, and a liquid mixture is discharged. The pre-filled syringe further includes a movement limiting mechanism for limiting movement of the plunger such that a tail end of the rear end-side gasket does not reach the bypass portion.

Abstract: There is provided a method for manufacturing a double-chamber container including an agent storage chamber and a solution storage chamber separated from each other by a weak seal portion, the method including the steps of: preparing a first sheet-like member including a first agent storage chamber forming portion and a first solution storage chamber forming portion whose one sides are joined to each other, as well as a second sheet-like member including a second agent storage chamber forming portion and a second solution storage chamber forming portion whose one sides are joined to each other; and forming the agent storage chamber and the solution storage chamber by joining the first and the second sheet-like members. The weak seal portion is formed by joining the one side of the first medical solution storage chamber forming portion and the one side of the second medical solution storage chamber forming portion.

Abstract: A sealing device for sealing between a tube member and an axial member movably inserted into the tube member includes a dust seal held on an opening end part of the tube member and including an annular dust seal lip held in sliding contact with the outer peripheral surface of the axial member, and a scraper arranged at an inner side of the dust seal and including an annular lip portion slidably pressed into contact with the outer peripheral surface of the axial member. The hardness of the lip portion is set to be higher than that of the dust seal lip.

Abstract: A foot health orthosis to be fitted with a toe includes a flexible ring-like retainer which can be fitted with the toe, and a cushion portion formed on a part of the retainer, which is thicker than the retainer and allowed to be held on a reverse surface of the toe in the fitted state.

Abstract: Disclosed is a plasma processing method including: growing a polycrystalline silicon layer on a processing target base body; and exposing the polycrystalline silicon layer to hydrogen radicals by supplying a processing gas containing hydrogen into a processing container that accommodates the processing target base body including the polycrystalline silicon layer grown thereon and radiating microwaves within the processing container to generate the hydrogen radicals.

Abstract: A plasma processing method of one embodiment of the present invention is disclosed for growing a polycrystalline silicon layer on a base material to be processed. The plasma processing method includes: (a) a step for preparing, in a processing container, the base material to be processed; and (b) a step for growing the polycrystalline silicon layer on the base material by introducing microwaves for plasma excitation into the processing container, and introducing a silicon-containing raw material gas into the processing container.

Abstract: A sealing device for sealing between a tube member and an axial member movably inserted into the tube member includes a dust seal held on an opening end part of the tube member and including an annular dust seal lip held in sliding contact with the outer peripheral surface of the axial member, and a scraper arranged at an inner side of the dust seal and including an annular lip portion slidably pressed into contact with the outer peripheral surface of the axial member. The hardness of the lip portion is set to be higher than that of the dust seal lip.

Abstract: There is provided a method for manufacturing a double-chamber container including an agent storage chamber and a solution storage chamber separated from each other by a weak seal portion, the method including the steps of: preparing a first sheet-like member including a first agent storage chamber forming portion and a first solution storage chamber forming portion whose one sides are joined to each other, as well as a second sheet-like member including a second agent storage chamber forming portion and a second solution storage chamber forming portion whose one sides are joined to each other; and forming the agent storage chamber and the solution storage chamber by joining the first and the second sheet-like members. The weak seal portion is formed by joining the one side of the first medical solution storage chamber forming portion and the one side of the second medical solution storage chamber forming portion.

Abstract: A high-quality crystalline silicon film can be formed at a high film forming rate by performing a plasma CVD process. In a crystalline silicon film forming method for forming a crystalline silicon film on a surface of a processing target object by using a plasma CVD apparatus for introducing microwave into a processing chamber through a planar antenna having a multiple number of holes and generating plasma, the crystalline silicon film forming method includes generating plasma by exciting a film forming gas containing a silicon compound represented as SinH2n+2 (n is equal to or larger than 2) by the microwave; and depositing a crystalline silicon film on the surface of the processing target substrate by performing the plasma CVD process with the plasma.