Patents by Inventor Misuzu Watanabe

Misuzu Watanabe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220346422
    Abstract: The purpose of the present invention is to provide a konjak gel with a shrimp-like texture, a shrimp-like food using the konjak gel, and a dried, shrimp-like food that has a shrimp-like texture and can be easily reconstituted using, for instance, hot water. This solution involves a porous structure-containing konjak gel including the following features (A) to (G): (A) a glucomannan content of 3.5 to 12 wt %; (B) a moisture content of 70 to 90 wt %; (C) a gel long side of 7 to 20 mm; (D) a gel thickness of 0.5 to 1.5 mm; (E) a porosity of 9 to 17% as measured for pores of 100 ?m2 or larger in a gel cross section; (F) a largest pore porosity of 3 to 6% in the gel cross section; and (G) the gel having undergone freeze denaturation.
    Type: Application
    Filed: March 10, 2021
    Publication date: November 3, 2022
    Inventors: Takahito TOKUHISA, Shino NAKAMURA, Ayana IWANO, Misuzu WATANABE, Jiro SETO
  • Publication number: 20090022784
    Abstract: Systems, devices, and methods for delivering one or more active ingredients to intradermal tissues, deep regions of pores, and intradermal tissues in the vicinity of pores. In some embodiments, a composition is provided including a plurality of liposomes including a cationic lipid, and an amphiphilic glycerophospholipid having a saturated fatty acid moiety and an unsaturated fatty acid moiety, and at least one insulin, insulin analog, or insulin derivative.
    Type: Application
    Filed: June 12, 2008
    Publication date: January 22, 2009
    Inventors: Kentaro Kogure, Misuzu Watanabe, Hideyoshi Harashima
  • Patent number: 5073241
    Abstract: A carbon film producing method utilizing a reactive sputtering process for projecting carbon particles from a graphite target electrode to deposite a very thin layer on a substrate. The reactive sputtering process is performed at a predetermined pressure in an atmosphere of hydrogen gas mixed at a predetermined ratio to another kind of gas.
    Type: Grant
    Filed: January 28, 1987
    Date of Patent: December 17, 1991
    Assignee: Kabushiki Kaisha Meidenshae
    Inventor: Misuzu Watanabe
  • Patent number: 4031498
    Abstract: A non-linear voltage dependent resistor having a non-ohmic resistance element and an electrically insulating coating formed thereon, obtained by firing a formed element containing zinc oxide and a coating material applied thereon, at a temperature between 900.degree. and 1,400.degree. C, the coating material including a mixture of ZnO, SiO.sub.2, Bi.sub.2 O.sub.3 and Sb.sub.2 O.sub.3. There is formed a firm joint between the resistance element and the insulating coating and the insulating coating has a composition structure wherein fine constituent grains are closely packed whereby the occurrence of a flashover is prevented.
    Type: Grant
    Filed: October 24, 1975
    Date of Patent: June 21, 1977
    Assignee: Kabushiki Kaisha Meidensha
    Inventors: Masahiro Hayashi, Masanori Haba, Misuzu Watanabe, Shinji Hirano