Patents by Inventor Mitsuhiro Kawadu

Mitsuhiro Kawadu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6740366
    Abstract: An article having a predetermined surface configuration, such as an optical element having fine irregularities in the surface which has high heat resistance, small heat shrinkage at the time of molding a film and high dimensional stability, and a production process therefor. The article having a predetermined surface configuration is produced by setting a composition comprising a compound which contains a dimethylsiloxane skeleton having at least three recurring units and at least one polymerizable organic group in the molecule between and in contact with the surface of a substrate and the molding surface of a mold in the form of a film, applying at least one of heat and ultraviolet radiation to the composition, removing the mold, and heating as required to form a film having a surface configuration which is the inversion of the surface configuration of the mold on the surface of the substrate.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: May 25, 2004
    Assignee: Nippon Sheet Glass Co., Ltd.
    Inventors: Masahiro Hori, Koichiro Nakamura, Mitsuhiro Kawadu, Hiroko Shikata, Hiroaki Yamamoto
  • Patent number: 6723487
    Abstract: There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition. The method for producing a pattern film-coated article comprises the steps of coating a photosensitive composition comprising an organometallic or organosilicon compound having photosensitivity and a hydrolyzable metal or silicon alkoxide on a substrate, irradiating the coated film on the substrate with light to polymerize the exposed portions of the coated film and then dissolving unexposed portions to remove them, wherein a pattern film-coated article is produced from an allyl group-containing metal or silicon alkoxide as the organometallic or organosilicon compound.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: April 20, 2004
    Assignees: Nippon Sheet Glass Co., Ltd.
    Inventors: Tsutomu Minami, Masahiro Tatsumisago, Kiyoharu Tadanaga, Atsunori Matsuda, Mitsuhiro Kawadu, Koichiro Nakamura, Hiroaki Yamamoto
  • Publication number: 20030027967
    Abstract: An article having a predetermined surface configuration, such as an optical element having fine irregularities in the surface which has high heat resistance, small heat shrinkage at the time of molding a film and high dimensional stability, and a production process therefor. The article having a predetermined surface configuration is produced by setting a composition comprising a compound which contains a dimethylsiloxane skeleton having at least three recurring units and at least one polymerizable organic group in the molecule between and in contact with the surface of a substrate and the molding surface of a mold in the form of a film, applying at least one of heat and ultraviolet radiation to the composition, removing the mold, and heating as required to form a film having a surface configuration which is the inversion of the surface configuration of the mold on the surface of the substrate.
    Type: Application
    Filed: August 21, 2002
    Publication date: February 6, 2003
    Inventors: Masahiro Hori, Koichiro Nakamura, Mitsuhiro Kawadu, Hiroko Shikata, Hiroaki Yamamoto
  • Publication number: 20020160298
    Abstract: There can be provided a method for producing a pattern film-coated article which has excellent film formability, can remove unexposed portions of a film completely in the development step after exposing the film to light. and has excellent pattern accuracy; and a photosensitive composition.
    Type: Application
    Filed: September 12, 2001
    Publication date: October 31, 2002
    Inventors: Tsutomu Minami, Masahiro Tatsumisago, Kiyoharu Tadanaga, Atsunori Matsuda, Mitsuhiro Kawadu, Koichiro Nakamura, Hiroaki Yamamoto