Patents by Inventor Mitsuhiro Nambu

Mitsuhiro Nambu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming coating film and apparatus therefor
    Patent number: 6063190
    Abstract: An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.
    Type: Grant
    Filed: April 6, 1999
    Date of Patent: May 16, 2000
    Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited
    Inventors: Keizo Hasebe, Akihiro Fujimoto, Hiroichi Inada, Hiroyuki Iino, Shinzi Kitamura, Masatoshi Deguchi, Mitsuhiro Nambu
  • Solvent and resist spin coating apparatus
    Patent number: 5942035
    Abstract: An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: August 24, 1999
    Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited
    Inventors: Keizo Hasebe, Akihiro Fujimoto, Hiroichi Inada, Hiroyuki Iino, Shinzi Kitamura, Masatoshi Deguchi, Mitsuhiro Nambu
  • Method of forming coating film and apparatus therefor
    Patent number: 5658615
    Abstract: An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.
    Type: Grant
    Filed: March 25, 1994
    Date of Patent: August 19, 1997
    Assignees: Tokyo Electron Limited, Tokyo Electron Kyushu Limited
    Inventors: Keizo Hasebe, Akihiro Fujimoto, Hiroichi Inada, Hiroyuki Iino, Shinzi Kitamura, Masatoshi Deguchi, Mitsuhiro Nambu