Patents by Inventor Mitsuru Koizumi

Mitsuru Koizumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11404238
    Abstract: There is provided a control method for an electron microscope including a thermionic-emission gun of self-bias type using a fixed bias resistor, an accelerating voltage power supply supplying an accelerating voltage to the thermionic-emission gun, and an optical system for irradiating a specimen with an electron beam. The control method includes: obtaining a value of a load current which is a current passing through an accelerating voltage power supply; determining a filament height of the thermionic-emission gun based on the value of the load current; and setting a condition of the optical system based on the filament height.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: August 2, 2022
    Assignee: JEOL Ltd.
    Inventor: Mitsuru Koizumi
  • Publication number: 20210074506
    Abstract: There is provided a control method for an electron microscope including a thermionic-emission gun of self-bias type using a fixed bias resistor, an accelerating voltage power supply supplying an accelerating voltage to the thermionic-emission gun, and an optical system for irradiating a specimen with an electron beam. The control method includes: obtaining a value of a load current which is a current passing through an accelerating voltage power supply; determining a filament height of the thermionic-emission gun based on the value of the load current; and setting a condition of the optical system based on the filament height.
    Type: Application
    Filed: September 9, 2020
    Publication date: March 11, 2021
    Inventor: Mitsuru Koizumi
  • Patent number: 8158937
    Abstract: A particle beam system is offered which can prevent contamination of the inside of the objective lens, the objective lens being located at the front end of the optical column. The particle beam system has an optical column equipped with a particle beam source for emitting a particle beam and a beam passage pipe through which the beam passes. The system further includes a vacuum chamber connected with the front end portion of the column. The beam passed through the pipe is released from the front end of the column. An inner pipe is detachably disposed inside the beam passage pipe located at the front-end side of the column.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: April 17, 2012
    Assignee: JOEL Ltd.
    Inventors: Mitsuru Koizumi, Hidetoshi Nishiyama
  • Patent number: 8119994
    Abstract: Method and apparatus have a film including a first surface to hold the liquid sample thereon, a vacuum chamber for reducing the pressure of an ambient in contact with a second surface of the film, primary beam irradiation means connected with the vacuum chamber and irradiating the sample with a primary beam via the film, signal detection means for detecting a secondary signal produced from the sample in response to the beam irradiation, a partitioning plate for partially partitioning off the space between the film and the primary beam irradiation means in the vacuum chamber, and a vacuum gauge for detecting the pressure inside the vacuum chamber.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: February 21, 2012
    Assignee: JEOL Ltd.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi
  • Patent number: 8030622
    Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).
    Type: Grant
    Filed: June 4, 2009
    Date of Patent: October 4, 2011
    Assignee: JEOL Ltd.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
  • Patent number: 7906760
    Abstract: An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of the cells or information about the cells is obtained by detecting a resulting secondary signal. If the film is destroyed, the plugging agent plugs up the damaged portion of the film. Consequently, liquid leakage can be minimized.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: March 15, 2011
    Assignee: JEOL Ltd.
    Inventors: Hidetoshi Nishiyama, Mitsuo Suga, Mitsuru Koizumi
  • Publication number: 20100243888
    Abstract: An inspection apparatus and method capable of well observing or inspecting a specimen contained in a liquid. The inspection apparatus has a film including first and second surfaces. Furthermore, the apparatus has a vacuum chamber for reducing the pressure in the ambient in contact with the second surface of the film, primary beam irradiation column connected with the vacuum chamber, and a shutter for partially partitioning the space between the film and the primary beam irradiation column within the vacuum chamber. A liquid sample is held on the first surface of the film. The primary beam irradiation column irradiates the sample. Backscattered electrons (a secondary beam) produced from the sample by the primary beam irradiation are directed at the shutter, producing secondary electrons (a tertiary signal).
    Type: Application
    Filed: March 17, 2010
    Publication date: September 30, 2010
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
  • Patent number: 7745802
    Abstract: A specimen holder, a specimen inspection apparatus, and a specimen inspection method permitting a specimen consisting of cultured cells to be observed or inspected. Also, a method of fabricating the holder is offered. The holder has an open specimen-holding surface. At least a part of this surface is formed by a film. A specimen cultured on the specimen-holding surface of the film can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the cultured specimen (e.g., cells) can be observed or inspected in vitro. Especially, if an electron beam is used as the primary beam, the specimen in vitro can be observed or inspected by SEM. Because the specimen-holding surface is open, a manipulator can gain access to the specimen. A stimulus can be given to the specimen using the manipulator. The reaction can be observed or inspected.
    Type: Grant
    Filed: January 31, 2008
    Date of Patent: June 29, 2010
    Assignee: Jeol Ltd.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi
  • Publication number: 20100051803
    Abstract: A particle beam system is offered which can prevent contamination of the inside of the objective lens, the objective lens being located at the front end of the optical column. The particle beam system has an optical column equipped with a particle beam source for emitting a particle beam and a beam passage pipe through which the beam passes. The system further includes a vacuum chamber connected with the front end portion of the column. The beam passed through the pipe is released from the front end of the column. An inner pipe is detachably disposed inside the beam passage pipe located at the front-end side of the column.
    Type: Application
    Filed: August 24, 2009
    Publication date: March 4, 2010
    Applicant: JEOL LTD.
    Inventors: Mitsuru Koizumi, Hidetoshi Nishiyama
  • Publication number: 20100019146
    Abstract: Specimen holder, specimen inspection apparatus, and specimen inspection method for observing or inspecting a specimen consisting of cultured cells. The specimen holder has a body portion and a film. The body portion has a specimen-holding surface opened to permit access from the outside. The film has a first surface forming the specimen-holding surface. The specimen disposed on the first surface of the film can be irradiated with a primary beam for observation or inspection of the specimen via the film. A region coated with an electrically conductive film is formed on the bottom surface of the body portion facing away from the specimen-holding surface. An optically transparent region not coated with the electrically conductive film is also formed on the bottom surface.
    Type: Application
    Filed: July 10, 2009
    Publication date: January 28, 2010
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
  • Publication number: 20090314955
    Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).
    Type: Application
    Filed: June 4, 2009
    Publication date: December 24, 2009
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi, Mitsuo Suga
  • Patent number: 7632486
    Abstract: Bone metastasis and the efficacy of drugs in the treatment of malignant tumors such as breast cancer, prostatic cancer and lung cancer that cause the bone metastasis are diagnosed using a marker that reflects the activity of osteoblasts and a marker that reflects the action of osteoclasts.
    Type: Grant
    Filed: August 20, 1999
    Date of Patent: December 15, 2009
    Inventors: Etsuro Ogata, Mitsuru Koizumi, Shunji Takahashi
  • Publication number: 20090250609
    Abstract: An electron microscope method for inspecting a liquid specimen and a reagent solution therefor. A culture medium and biological cells are put in the sample holder. A plugging agent is mixed into the liquid sample. The cells can be irradiated with a primary beam via a film. An image of the cells or information about the cells is obtained by detecting a resulting secondary signal. If the film is destroyed, the plugging agent plugs up the damaged portion of the film. Consequently, liquid leakage can be minimized.
    Type: Application
    Filed: December 15, 2008
    Publication date: October 8, 2009
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuo Suga, Mitsuru Koizumi
  • Publication number: 20090242762
    Abstract: Method and apparatus have a film including a first surface to hold the liquid sample thereon, a vacuum chamber for reducing the pressure of an ambient in contact with a second surface of the film, primary beam irradiation means connected with the vacuum chamber and irradiating the sample with a primary beam via the film, signal detection means for detecting a secondary signal produced from the sample in response to the beam irradiation, a partitioning plate for partially partitioning off the space between the film and the primary beam irradiation means in the vacuum chamber, and a vacuum gauge for detecting the pressure inside the vacuum chamber.
    Type: Application
    Filed: March 20, 2009
    Publication date: October 1, 2009
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi
  • Publication number: 20080308731
    Abstract: A specimen holder, a specimen inspection apparatus, and a specimen inspection method permitting a specimen consisting of cultured cells to be observed or inspected. Also, a method of fabricating the holder is offered. The holder has an open specimen-holding surface. At least a part of this surface is formed by a film. A specimen cultured on the specimen-holding surface of the film can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the cultured specimen (e.g., cells) can be observed or inspected in vitro. Especially, if an electron beam is used as the primary beam, the specimen in vitro can be observed or inspected by SEM. Because the specimen-holding surface is open, a manipulator can gain access to the specimen. A stimulus can be given to the specimen using the manipulator. The reaction can be observed or inspected.
    Type: Application
    Filed: January 31, 2008
    Publication date: December 18, 2008
    Applicant: JEOL LTD.
    Inventors: Hidetoshi Nishiyama, Mitsuru Koizumi
  • Patent number: 6831278
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Grant
    Filed: November 1, 2002
    Date of Patent: December 14, 2004
    Assignees: Sony Corporation, JEOL Ltd.
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date
  • Patent number: 6737660
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Grant
    Filed: February 24, 2003
    Date of Patent: May 18, 2004
    Assignees: Sony Corporation, Jeol Ltd.
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • Publication number: 20030178581
    Abstract: An electron beam irradiation apparatus in a partial vacuum method is structured with a static pressure floating pad 18 connected to a vacuum chamber 14 containing an electron beam column 15 and in a condition that the static pressure floating pad 18 is attached to a subject 1 to be irradiated without contacting, and an electron beam irradiating the subject 1 to be irradiated through an electron beam path 19 of the static pressure floating pad 18, whereby the vacuum chamber and the electron beam column can be maintained in the required degree of vacuum even in a condition that the static pressure floating pad 18 is separated from the subject 1 to be irradiated. A vacuum seal valve 30 including a piston to open and close the electron beam path 19 is provided within the static pressure floating pad 18.
    Type: Application
    Filed: February 24, 2003
    Publication date: September 25, 2003
    Inventors: Yoshihisa Miura, Yuichi Aki, Hiroshi Kawase, Masanobu Yamamoto, Naoki Date, Setsuo Norioka, Mitsuru Koizumi, Gakuo Komatsubara
  • Publication number: 20030116718
    Abstract: An electron beam irradiation system has a pumping block at an end of a microscope column of electron optics. The system has the rotary stage, the microscope column for directing an electron beam at the target on the rotary stage, the pumping block for evacuating air in the gap between the column and the target, a moving mechanism for sliding the rotary stage between a working position and a mounting position, and a cover member. In the working position, the target is opposite to the column. The cover member is brought into intimate contact with the rotary stage or target to prevent vacuum deterioration when the rotary stage moves from the working position to the mounting position.
    Type: Application
    Filed: November 1, 2002
    Publication date: June 26, 2003
    Applicant: SONY CORPORATION
    Inventors: Masanobu Yamamoto, Hiroshi Kawase, Jun Sasaki, Minoru Takeda, Gakuo Komatsubara, Mitsuru Koizumi, Setsuo Norioka, Naoki Date