Abstract: A method for producing fine patterns is disclosed, comprising spin-coating a photosensitive resin solution as an upper layer, which comprises a diazonium salt as a photobleachable agent, water and/or an organic solvent, and a polymer, on a photoresist layer as a lower layer and then light-exposing both the upper layer and the lower layer, wherein the polymer in the upper layer has a structural unit shown by formula (I): ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3 each represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, or a nitrile group; R.sub.4 represents a hydrogen atom, an alkyl group having from 1 to 4 carbon atoms, a halogen atom, a hydroxyl group, or a carboxyl group; and X represents a hydrogen atom, an alkali metal, an alkaline earth metal, or an ammonium group.

Abstract: A thin film of conductive high molecular compound is formed on a substrate such as Si followed by a heat treatment, and thereafter an electron beam exposure and subsequent development are made, to form pattern of the thin film of conductive high molecular compound; this method can eliminate forming of metal film to prevent the electron charge, can prevent charging of resist in electron-beam exposure or further prevent proximity effect when combined with deep ultraviolet light exposure.

Abstract: Disclosed is a method for forming micro-patterns on base plates such as for semiconductor integrated circuits, particularly by development, wherein a radiation sensitive negative resist film is formed on the base plate and irradiated according to pattern designs, and the non-irradiated portions of the film is dissolved by a liquid developer comprising a mixture of a good solvent selected from the group of alkyl esters of acetic acid, having an alkyl group containing 1 to 5 carbon atoms, and a poor solvent selected from the group consisting of alicyclic compounds and alkyl ethers of ethyleneglycol having an alkyl group containing 1 to 5 carbon atoms. The method can minimize swelling of irradiated portions of the resist film and can accelerate dissolution of non-irradiated portions of the resist film, so that desired micro-patterns with excellent edge shape quality can be obtained.

Abstract: Plasma albumin is separated by a crude albumin fraction from blood plasma by a rough fractional separation and then separating plasma albumin through an ultrafiltration membrane. The ultrafiltration membrane is a membrane made of a polysulfone resin having the formula ##STR1## (n=50 to 250).

Abstract: Photosensitive compositions useful as resists for transistors, ICs, etc. comprising a solution of a photosensitive high polymer of a polymer or a copolymer which contains a unit expressed by the following general formula: ##STR1## (where X.sub.1 is an atom of hydrogen or halogen, a halogenated alkyl group of 1 to 4 carbon atoms or an alkyl group having 1 to 4 carbon atoms, X.sub.2 is a halogen atom or a halogenated alkyl group having 1 to 4 carbon atoms and R is an aromatic ring or a heterocyclic ring), and a photosensitizing agent dissolved in organic solvents. The photosensitive compositions show marked improvement in photosensitivity and gamma value.

Abstract: A laser light beam is projected through a fluid measuring cell having a fluid accommodating chamber and inlet and outlet pathways for the fluid. The light is separated into transmitted light and scattered light. Separate light detectors sense the transmitted light and scattered light. An electric control circuit uses the variations of the intensity of the transmitted light to compensate for fluctuations in the intensity of the scattered light to provide an output related to the intensity of the scattered light.

Abstract: Serum albumin and a serum .gamma.-globulin are separated by filtration from each other in a solution of a mixture thereof by using an ultrafiltration membrane. The ultrafiltration membrane has a fractionation molecular weight of about 100,000. The total protein concentration and salt concentration in the mixture solution to be forced through the membrane are adjusted to not more than 4 g/dl and not more than 0.6 mole/l, respectively. Also, the pH of the solution is adjusted to a value of from about 3.8 to about 4.7.

Abstract: .gamma.-Globulin aggregate is separated by a membrane from an aqueous solution of .gamma.-globulin through an ultrafiltration membrane.

Abstract: An anionic polymerization is carried out by polymerizing a monomer for anionic polymerization in a solvent in the presence of a polymerization initiator after preparing a polymerization system by an operation (I) adding a solution of an organometallic compound in a polymerization system of a solvent or a combination of a solvent and an inert gas and an operation (II) removing excess of the unreacted organometallic compound, before charging the monomer and the polymerization initiator.