Patents by Inventor Mituo Fujiwara

Mituo Fujiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion implantation apparatus
    Patent number: 4476393
    Abstract: An ion implantation apparatus in which ions are dispersed by a dispersion magnetic field and the dispersed ions of a predetermined mass number are focused on a slit and directed therethrough toward a target. The ions of the predetermined mass number are electromagnetically scanned by a deflection magnetic field preceding the slit in a direction which is orthogonal to the dispersion plane. The target is subjected to reciprocating motion in a direction which is orthogonal to the scanning direction of the ions of the predetermined mass number.
    Type: Grant
    Filed: May 4, 1982
    Date of Patent: October 9, 1984
    Assignee: Hitachi, Ltd.
    Inventors: Shunroku Taya, Mituo Fujiwara