Patents by Inventor Mohamed Boutchich

Mohamed Boutchich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190035907
    Abstract: Disclosed is a method for obtaining a field effect transistor, including steps of: —forming a multi-layer graphene stack on a face of a base substrate; —depositing a source and a drain electrode on the multi-layer graphene stack; —forming a conductive multi-layer graphene block by lithography and etching process; —fluorinating the graphene block, using the source and d rain electrodes as a fluorination-protective mask, during a predetermined period and at a predetermined temperature, such that an upper part of the graphene block is converted into fluorographene over a given thickness portion, to form a dielectric element with in the graphene block; —depositing a gate electrode on the dielectric element.
    Type: Application
    Filed: January 24, 2017
    Publication date: January 31, 2019
    Inventors: Mohamed BOUTCHICH, Abdelkarim OUERGHI, Chao-Sung LAI, Kuan-I HO
  • Patent number: 8853632
    Abstract: An IR sensor comprises a heat sink substrate (10) having portions (12) of relatively high thermal conductivity and portions (14) of relatively low thermal conductivity and a planar thermocouple layer (16) having a hot junction (18) and a cold junction (20), with the hot junction (18) located on a portion (14) of the heat sink substrate with relatively low thermal conductivity. A low thermal conductivity dielectric layer (22) is provided over the thermocouple layer (16), and has a via (24) leading to the hot junction (18). An IR reflector layer (26) covers the low thermal conductivity dielectric layer (22) and the side walls of the via (24). An IR absorber (30; 30?) is within the via. This structure forms a planar IR microsensor which uses a structured substrate and a dielectric layer to avoid the need for any specific packaging. This design provides a higher sensitivity by providing a focus on the thermocouple, and also gives better immunity to gas conduction and convection.
    Type: Grant
    Filed: September 7, 2009
    Date of Patent: October 7, 2014
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Mohamed Boutchich, Benoit Bataillou
  • Patent number: 8546863
    Abstract: A memory cell, the memory cell comprising a substrate, a nanowire extending along a vertical trench formed in the substrate, a control gate surrounding the nanowire, and a charge storage structure formed between the control gate and the nanowire.
    Type: Grant
    Filed: April 17, 2008
    Date of Patent: October 1, 2013
    Assignee: NXP B.V.
    Inventors: Almudena Huerta, Michiel Jos Van Duuren, Nader Akil, Dusan Golubovic, Mohamed Boutchich
  • Patent number: 8405041
    Abstract: An electrode for an ionization chamber and an ionization chamber including an electrode are provided wherein the electrode comprises a substrate comprising a first material, and a plurality of nanowires extending from the substrate and manufactured by processing the first material of the substrate.
    Type: Grant
    Filed: November 17, 2008
    Date of Patent: March 26, 2013
    Assignee: NXP B.V.
    Inventors: Mohamed Boutchich, Vijayaraghavan Madakasira, Nader Akil
  • Patent number: 8339842
    Abstract: Non-volatile memories can have data retention problems at high temperatures reducing the reliability of such devices. A non-volatile memory cell is described having a magnet, a ferromagnetic switching element and heating means. The non-volatile memory cell has a set position having a low resistance state and a reset position having a high resistance state. The non-volatile memory is set by applying a magnetic field to the switching element causing it to move to the set position. The non-volatile memory cell is reset by the heating means which causes the switching element to return to the reset position. The switching element is formed from a ferromagnetic material or a ferromagnetic shape memory alloy. This structure can have improved reliability at higher temperatures than previously described non-volatile memories.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: December 25, 2012
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Mohamed Boutchich
  • Publication number: 20110305258
    Abstract: An IR sensor comprises a heat sink substrate (10) having portions (12) of relatively high thermal conductivity and portions (14) of relatively low thermal conductivity and a planar thermocouple layer (16) having a hot junction (18) and a cold junction (20), with the hot junction (18) located on a portion (14) of the heat sink substrate with relatively low thermal conductivity. A low thermal conductivity dielectric layer (22) is provided over the thermocouple layer (16), and has a via (24) leading to the hot junction (18). An IR reflector layer (26) covers the low thermal conductivity dielectric layer (22) and the side walls of the via (24). An IR absorber (30; 30?) is within the via. This structure forms a planar IR microsensor which uses a structured substrate and a dielectric layer to avoid the need for any specific packaging. This design provides a higher sensitivity by providing a focus on the thermocouple, and also gives better immunity to gas conduction and convection.
    Type: Application
    Filed: September 7, 2009
    Publication date: December 15, 2011
    Inventors: Mohamed Boutchich, Benoit Bataillou
  • Publication number: 20100329000
    Abstract: Non-volatile memories can have data retention problems at high temperatures reducing the reliability of such devices. A non-volatile memory cell is described having a magnet, a ferromagnetic switching element and heating means. The non-volatile memory cell has a set position having a low resistance state and a reset position having a high resistance state. The non-volatile memory is set by applying a magnetic field to the switching element causing it to move to the set position. The non-volatile memory cell is reset by the heating means which causes the switching element to return to the reset position. The switching element is formed from a ferromagnetic material or a ferromagnetic shape memory alloy. This structure can have improved reliability at higher temperatures than previously described non-volatile memories.
    Type: Application
    Filed: June 28, 2010
    Publication date: December 30, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventor: Mohamed Boutchich
  • Publication number: 20100253359
    Abstract: An electrode for an ionization chamber and an ionization chamber including an electrode are provided wherein the electrode comprises a substrate comprising a first material, and a plurality of nanowires extending from the substrate and manufactured by processing the first material of the substrate.
    Type: Application
    Filed: November 17, 2008
    Publication date: October 7, 2010
    Applicant: NXP B.V.
    Inventors: Mohamed Boutchich, Vijayaraghavan Madakasira, Nader Akil
  • Publication number: 20100117138
    Abstract: A memory cell (300, 500), the memory cell (300, 500) comprising a substrate (301), a nanowire (302) extending along a vertical trench formed in the substrate (301), a control gate (303) surrounding the nanowire (302), and a charge storage structure (320, 501) formed between the control gate (303) and the nanowire (302).
    Type: Application
    Filed: April 17, 2008
    Publication date: May 13, 2010
    Applicant: NXP, B.V.
    Inventors: Almudena Huerta, Michiel Jos Van Duuren, Nader Akil, Dusan Golubovic, Mohamed Boutchich