Patents by Inventor Montien Saubhayana

Montien Saubhayana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
    Patent number: 7821655
    Abstract: An apparatus and process for in-situ measurement of thin film thickness, ash rate, and end point generally include generating and measuring shallow angle interference patterns. The apparatus generally includes a chamber having a first viewing port and a second viewing port. The first viewing port includes receiving optics configured to receive light at a shallow angle from a surface of a substrate processed therein. The second port includes a broadband illumination source and is preferably disposed in a sidewall opposite the receiving optics. The process includes calculating the thin film thickness, ash rate, and end point from the interference patterns.
    Type: Grant
    Filed: February 8, 2005
    Date of Patent: October 26, 2010
    Assignee: Axcelis Technologies, Inc.
    Inventors: Alan Janos, Montien Saubhayana
  • In-situ absolute measurement process and apparatus for film thickness, film removal rate, and removal endpoint prediction
    Publication number: 20060082785
    Abstract: An apparatus and process for in-situ measurement of thin film thickness, ash rate, and end point generally include generating and measuring shallow angle interference patterns. The apparatus generally includes a chamber having a first viewing port and a second viewing port. The first viewing port includes receiving optics configured to receive light at a shallow angle from a surface of a substrate processed therein. The second port includes a broadband illumination source and is preferably disposed in a sidewall opposite the receiving optics. The process includes calculating the thin film thickness, ash rate, and end point from the interference patterns.
    Type: Application
    Filed: February 8, 2005
    Publication date: April 20, 2006
    Inventors: Alan Janos, Montien Saubhayana