Patents by Inventor MOO-SONG LEE

MOO-SONG LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

Method of exposing a semiconductor structure, apparatus for controlling a lithography process performed by a lithography apparatus across a semiconductor structure, non-transitory computer readable medium having instructions stored thereon for generating a weight function

Patent number: 10824071

Abstract: Multiple model functions may be calculated by detecting alignment marks on a semiconductor wafer structure. The model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model functions. Thus, even when asymmetry of alignment marks or overlay marks has high dependency on a horizontal location on a wafer, reliability of exposure process is insured.

Type: Grant

Filed: June 4, 2019

Date of Patent: November 3, 2020

Assignee: SAMSUNG ELECTRONICS CO., LTD.

Inventors: Moo-song Lee, Seung-yoon Lee
METHOD OF EXPOSING A SEMICONDUCTOR STRUCTURE, APPARATUS FOR CONTROLLING A LITHOGRAPHY PROCESS PERFORMED BY A LITHOGRAPHY APPARATUS ACROSS A SEMICONDUCTOR STRUCTURE, NON-TRANSITORY COMPUTER READABLE MEDIUM HAVING INSTRUCTIONS STORED THEREON FOR GENERATING A WEIGHT FUNCTION

Publication number: 20200110332

Abstract: Multiple model functions may be calculated by detecting alignment marks on a semiconductor wafer structure. The model functions may be combined to determine a combined model function by using a weight function that assigns a different weight to each of basis functions of the model functions. Thus, even when asymmetry of alignment marks or overlay marks has high dependency on a horizontal location on a wafer, reliability of exposure process is insured.

Type: Application

Filed: June 4, 2019

Publication date: April 9, 2020

Inventors: MOO-SONG LEE, Seung-yoon Lee

Method of exposing a semiconductor structure, apparatus for controlling a lithography process performed by a lithography apparatus across a semiconductor structure, non-transitory computer readable medium having instructions stored thereon for generating a weight function

METHOD OF EXPOSING A SEMICONDUCTOR STRUCTURE, APPARATUS FOR CONTROLLING A LITHOGRAPHY PROCESS PERFORMED BY A LITHOGRAPHY APPARATUS ACROSS A SEMICONDUCTOR STRUCTURE, NON-TRANSITORY COMPUTER READABLE MEDIUM HAVING INSTRUCTIONS STORED THEREON FOR GENERATING A WEIGHT FUNCTION