Patents by Inventor Moshood Kayode MORAKINYO

Moshood Kayode MORAKINYO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9620365
    Abstract: Sub-50-nm structures are formed using sequential top-down and bottom up lithographies in conjunction with selective etching. The preferred rendition of the method involves: (a) rough lithographic patterning, (b) size/shape selected nanostructure deposition, (c) resist reflow around the nanostructures, and (d) selective removal/etching of the nanostructure.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: April 11, 2017
    Assignee: Portland State University
    Inventors: Shankar B. Rananavare, Moshood Kayode Morakinyo
  • Publication number: 20160155660
    Abstract: Sub-50-nm structures are formed using sequential top-down and bottom up lithographies in conjunction with selective etching. The preferred rendition of the method involves: (a) rough lithographic patterning, (b) size/shape selected nanostructure deposition, (c) resist reflow around the nanostructures, and (d) selective removal/etching of the nanostructure.
    Type: Application
    Filed: July 11, 2014
    Publication date: June 2, 2016
    Inventors: Shankar B. RANANAVARE, Moshood Kayode MORAKINYO