Patents by Inventor Motaki Tani

Motaki Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive, heat-resistant resin composition and process for using same to form patterns as well as polymeric composite and production process thereof
    Patent number: 5972807
    Abstract: A film forming, photosensitive, heat-resistant resin composition including a varnish of a polyimide precursor having no photosensitivity in itself, a polymeriziable monomer or oligomer compatible with the varnish and capable of providing a high-heat-resistant polymer upon being polymerized, and a polymerization initiator for the monomer or oligomer. The resin composition is useful for the production of circuit substrates and semiconductor devices for high-density mounting, since it can effectively avoid a reduction of the layer thickness during film formation, and ensures a low cost production process. The pattern formation process using such a resin composition is also disclosed. The polymeric composite having a particles-in-matrix microstructure and the production process thereof are also disclosed.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: October 26, 1999
    Assignee: Fujitsu Limited
    Inventors: Motaki Tani, Eiji Horikoshi, Isao Watanabe, Shoichi Miyahara, Takashi Ito, Makoto Sasaki